Isothermal vapor chamber and support structure thereof
Abstract
In an isothermal vapor chamber and its support structure, the isothermal vapor chamber includes a casing, a capillary wick, a support structure and a working fluid. The capillary wick is disposed in the casing. The support structure is contained in the capillary wick for supporting the capillary wick and the support structure includes two side panels and a plurality of wavy plates are connected between the two side panels. The wavy plate is formed by a plurality of wave peak sections and a plurality of wave valley sections, and the wave peak sections of any two adjacent wavy plates are installed alternately with each other, and any two adjacent wavy plates are partitioned to form a partition channel. The working fluid is filled into the casing and flowed through the partition channel for improving the heat conducting efficiency of the isothermal vapor chamber.
Claims
exact text as granted — not AI-modified1 . An isothermal vapor chamber, comprising:
a casing; a working fluid, filled into the casing; a capillary wick, disposed in the casing; and a support structure, contained in the capillary wick, for supporting the capillary wick, and including two side panels and a plurality of wavy plates connected between the two side panels, and the wavy plate being comprised of a plurality of wave peak sections and a plurality of wave valley sections, and the wave peak sections of any two adjacent wavy plates being installed alternately with each other.
2 . The isothermal vapor chamber of claim 1 , wherein the casing comprises a lower casing panel and an upper casing panel sealed and coupled to the lower casing panel.
3 . The isothermal vapor chamber of claim 2 , wherein the lower casing panel is formed by a bottom panel and a plurality of surrounding panels disposed around the periphery of the bottom panel.
4 . The isothermal vapor chamber of claim 2 , wherein the capillary wick comprises a lower-layer capillary wick and an upper-layer capillary wick connected onto the lower-layer capillary wick, and the upper-layer capillary wick is attached onto a surface of the upper casing panel, and the lower-layer capillary wick is attached onto a surface of the lower casing panel.
5 . The isothermal vapor chamber of claim 1 , wherein the capillary wick is a metal wire mesh.
6 . The isothermal vapor chamber of claim 1 , wherein any two adjacent wavy plates are installed alternately with each other to form a partition channel.
7 . The isothermal vapor chamber of claim 1 , wherein the wave peak section is higher than the top surface of the side panel.
8 . The isothermal vapor chamber of claim 1 , wherein the wave valley section is lower than the bottom surface of the side panel.
9 . The isothermal vapor chamber of claim 1 , wherein the wave valley sections of any two adjacent wavy plates are installed alternately with each other.
10 . A support structure of an isothermal vapor chamber, comprising:
two side panels; and a plurality of wavy plates, coupled between the two side panels, and formed by a plurality of wave peak sections and a plurality of wave valley sections, and the wave peak sections of any two adjacent wavy plates being installed alternately with each other.
11 . The support structure of an isothermal vapor chamber of claim 10 , wherein any two adjacent wavy plates are installed alternately with each other to form a partition channel.
12 . The support structure of an isothermal vapor chamber of claim 10 , wherein the wave peak section is higher than the top surface of the side panel.
13 . The support structure of an isothermal vapor chamber of claim 10 , wherein the wave valley section is lower than the bottom surface of the side panel.
14 . The support structure of an isothermal vapor chamber of claim 10 , wherein the wave valley sections of any two adjacent wavy plates are installed alternately with each other.Cited by (0)
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