Plasma Processing Apparatus

Abstract

A plasma processing apparatus includes an upper electrode which allows a source gas to flow into a vacuum chamber via a shower plate, a lower electrode facing the upper electrode, on which a sample to be processed is placed, and a detector which detects light from the surface of the sample to be processed via the shower plate. The detector includes at least one light introducing section made up of a transparent body to which the light is input and a spectroscope which analyzes the light obtained at the light introducing section. A plurality of the light-introducing through holes are provided in the shower plate for the at least one light introducing section, and the at least one light introducing section is made up of two members.

1 . A plasma processing apparatus comprising:
 an upper electrode which allows a source gas to flow into a vacuum chamber via a shower plate;   a lower electrode facing the upper electrode, on which a sample to be processed is placed; and   a detector which detects light from the surface of the sample to be processed via the shower plate;   wherein at least the upper and lower electrodes enable generation of plasma between the shower plate and the lower electrode for processing of the sample to be processed;   wherein the detector comprises at least one light introducing section made up of a transparent body to which the light is input and a spectroscope which analyzes the light obtained at the light introducing section; and   wherein the shower plate comprises a plurality of gas through holes through which the source gas passes and light-introducing through holes through which light from the sample to be processed passes;   wherein the upper electrode is a multilayered structure made up of the shower plate, a gas passage member in which a passage for the source gas is formed so as to communication with the gas through holes of the shower plate, and a discharge member connected to a high-frequency power supply;   wherein a plurality of the light-introducing through holes of the shower plate are provided for the at least one light introducing section; and   wherein the at least one light introducing section is made up of two members.   
   
   
       2 . The plasma processing apparatus according to  claim 1 , wherein at least one of the two members of the at least one light introducing section on the shower plate side is made of anyone of quartz, sapphire, YAG (yttrium-aluminum-garnet) and yttria crystal (Y 2 O 3 ).