US2010109121A1PendingUtilityA1

Microelectromechanical system

42
Assignee: MEMSMART SEMICONDUCTOR CORPPriority: Aug 27, 2007Filed: Jan 5, 2010Published: May 6, 2010
Est. expiryAug 27, 2027(~1.1 yrs left)· nominal 20-yr term from priority
B81C 1/00246B81C 2203/0728
42
PatentIndex Score
0
Cited by
0
References
0
Claims

Abstract

A micro electromechanical system and a fabrication method thereof, which has trenches formed on a substrate to prevent circuits from interfering each other, and to prevent over-etching of the substrate when releasing a microstructure.

Claims

exact text as granted — not AI-modified
1 . A microelectromechanical system, comprising:
 a microstructure;   a circuit; and   a trench located between the microstructure and the circuit for separating the microstructure and the circuit to prevent over-etching from occurring when releasing the microstructure and protect properties of the circuit from deteriorating, as well as preventing the microstructure and the circuit from interfering each other;   wherein the trench is generated during the process of releasing the microstructure.   
   
   
       2 . A microelectromechanical system, comprising:
 a microstructure;   a circuitry region having two circuits side by side; and   a trench located between the two circuits for separating the two circuits to prevent the two circuits from interfering each other;   wherein the trench is generated during the process of releasing the microstructure.

Cited by (0)

No later patents cite this yet.

References (0)

No backward citations on record.