US2011168554A1PendingUtilityA1
Apparatus for treatment of samples for auger electronic spectrometer (aes) in the manufacture of integrated circuits
Assignee: SEMICONDUCTOR MFG INT SHANGHAIPriority: Dec 27, 2005Filed: Mar 24, 2011Published: Jul 14, 2011
Est. expiryDec 27, 2025(expired)· nominal 20-yr term from priority
H10P 74/203G01N 23/2276
47
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Claims
Abstract
An apparatus for treatment of a sample for the manufacture of integrated circuits includes a holder apparatus and a stage which is coupled to the holder apparatus. The stage is capable of holding a portion of a sample to be analyzed. The apparatus also includes a shield that is operably coupled to the stage to block a portion of the sample. The shield is capable of movement relative to the sample to block one or more portions of the sample. The shield is provided on a track member and is movable from a first spatial location to a second spatial location on the track member. The apparatus further includes an enclosure surrounding an entirety of the sample and the shield.
Claims
exact text as granted — not AI-modified1 - 20 . (canceled)
21 . An apparatus for treatment of a sample for the manufacture of integrated circuits, the apparatus comprising:
a holder apparatus; a stage coupled to the holder apparatus, the stage being capable of holding a portion of a sample to be analyzed; a shield operably coupled to the stage to block a portion of the sample, the shield being capable of movement relative to the sample to block one or more portions of the sample.
22 . The apparatus of claim 21 wherein the shield is provided on a track member, the shield being movable from a first spatial location to a second spatial location on the track member.
23 . The apparatus of claim 21 wherein the shield comprises an aluminum material.
24 . The apparatus of claim 21 wherein the shield comprises a stainless steel material.
25 . The apparatus of claim 21 further comprising an enclosure surrounding an entirety of the sample and the shield.
26 . The apparatus of claim 21 further comprising a sputtering device, the sputtering device being capable of depositing a metal material on one or more exposed portions of the sample, while other portions of the sample are blocked by the shield.
27 . The apparatus of claim 21 wherein the holder apparatus is adapted to rotate the stage in a circular manner.
28 . The apparatus of claim 21 wherein the holder apparatus is adapted to move the stage in an x-y-z manner.Cited by (0)
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