US2011220511A1PendingUtilityA1

Electrodeposition baths and systems

Assignee: XTALIC CORPPriority: Mar 12, 2010Filed: Mar 12, 2010Published: Sep 15, 2011
Est. expiryMar 12, 2030(~3.7 yrs left)· nominal 20-yr term from priority
C25D 3/64C25D 5/10C25D 5/617C25D 5/18C25D 5/619
44
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Claims

Abstract

Electrodeposition baths and systems. The baths and systems are useful for forming coated articles. The articles may include a base material and a coating comprising silver formed thereon. In some embodiments, the coating comprises a silver-based alloy, such as a silver-tungsten alloy. The coating may, in some instances, include at least two layers. For example, the coating may include a first layer comprising a silver-based alloy and a second layer comprising a precious metal. The coating can exhibit desirable properties and characteristics such as durability (e.g., wear), hardness, corrosion resistance, and high conductivity, which may be beneficial, for example, in electrical and/or electronic applications. In some cases, the coating may be applied using an electrodeposition process.

Claims

exact text as granted — not AI-modified
1 . A bath, comprising:
 silver ionic species;   tungsten and/or molybdenum ionic species; and   at least one complexing agent, wherein the bath is suitable for electrodeposition processes.   
     
     
         2 . The electrodeposition bath of  claim 1 , wherein the at least one complexing agent permits codeposition of silver and tungsten. 
     
     
         3 . The bath of  claim 1 , wherein the at least one complexing agent comprises an alkyl hydroxyl carboxylic acid. 
     
     
         4 . The bath of  claim 1 , wherein the at least one complexing agent comprises a substituted pyridine compound. 
     
     
         5 . The bath of  claim 1 , wherein the at least one complexing agent comprises a compound comprising an imide functional group. 
     
     
         6 . The bath of  claim 1 , wherein the bath has a pH from about 7.0 to 9.0. 
     
     
         7 . The bath of  claim 1 , wherein the bath is an aqueous solution. 
     
     
         8 . The bath of  claim 1 , further comprising a wetting agent. 
     
     
         9 . The bath of  claim 1 , wherein the at least one complexing agent comprises cyanide. 
     
     
         10 . The bath of  claim 1 , wherein the electrodeposition bath is substantially free of cyanide. 
     
     
         11 . An electrodeposition system, comprising:
 a bath;   at least one electrode; and   a power supply, wherein the bath comprises silver ionic species, tungsten and/or molybdenum ionic species, and at least one complexing agent, wherein the bath is associated with the at least one electrode, wherein the power supply is connected to the at least one electrode.   
     
     
         12 . The electrodeposition system of  claim 11 , wherein the at least one complexing agent comprises an alkyl hydroxyl carboxylic acid. 
     
     
         13 . The electrodeposition system of  claim 11 , wherein the at least one complexing agent comprises a substituted pyridine compound. 
     
     
         14 . The electrodeposition system of  claim 11 , wherein the at least one complexing agent comprises a compound comprising an imide functional group. 
     
     
         15 . The electrodeposition system of  claim 11 , wherein the bath has a pH from about 7.0 to 9.0. 
     
     
         16 . The electrodeposition system of  claim 11 , wherein the bath is an aqueous solution. 
     
     
         17 . The electrodeposition system of  claim 11 , further comprising a wetting agent. 
     
     
         18 . The electrodeposition system of  claim 11 , wherein the power supply is capable of generating a waveform having a reverse pulse sequence.

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