Exposure apparatus and device manufacturing method

Abstract

An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage, a supply mechanism, a recovery mechanism and an auxiliary recovery mechanism. The substrate stage mounts the substrate and moves within a two-dimensional plane while holding the substrate. The supply mechanism supplies liquid to a space between the projection optical system and the substrate on the substrate stage. The recovery mechanism recovers the liquid, and the auxiliary recovery mechanism recovers the liquid which could not be recovered by the recovery mechanism.

1 . An exposure apparatus that illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system, the exposure apparatus comprising:
 a substrate stage on which the substrate is mounted that moves within a two-dimensional plane holding the substrate;   a supply mechanism that supplies liquid to a space between the projection optical system and the substrate on the substrate stage;   a recovery mechanism that recovers the liquid; and   an auxiliary recovery mechanism that recovers the liquid which could not be recovered by the recovery mechanism.