Implant material and method for manufacturing the same

Abstract

An implant material includes a base material, and a silicon-containing carbon thin film formed on a surface of the base material. The carbon thin film contains a C—C component in which carbon atoms are bonded, and a SiC component in which carbon and silicon atoms are bonded, and a ratio of the SiC component is 0.06 or higher.

1 . An implant material comprising:
 a base material; and   a carbon thin film which is formed on a surface of the base material, and contains silicon, wherein   the carbon thin film contains a C—C component in which carbon atoms are bonded, and a SiC component in which carbon and silicon atoms are bonded, and   a ratio of the SiC component is 0.06 or higher.   
     
     
         2 . The implant material of  claim 1 , wherein
 the ratio of the SiC component is 0.5 or lower.   
     
     
         3 . The implant material of  claim 1 , wherein
 the base material is metal.   
     
     
         4 . The implant material of  claim 1 , wherein
 the base material is a dental implant, an artificial tooth, or a crown restoration.   
     
     
         5 . A method for manufacturing an implant material comprising:
 preparing a base material for implant;   removing moisture from a chamber in which the base material is placed; and   introducing material gas as a carbon source and a silicon source into the chamber after the preparation of the base material to form a carbon thin film containing a C—C component in which carbon atoms are bonded, and a SiC component in which carbon and silicon atoms are bonded on a surface of the base material by ionized deposition.