System and method for removing organic residue from a charged particle beam system

Abstract

A system and method for removing an organic residue from a charged particle beam system includes a conduit that is coupled to the column and is for adding oxygen to the column. A heater is coupled to the column and is for increasing the temperature in the column. A pump is coupled to the column and is for removing a gas from the chamber, wherein the gas is a byproduct of a chemical reaction of the organic residue and the oxygen.

1 . A method for removing an organic residue from a charged particle beam system comprising:
 increasing the temperature in the chamber;   adding oxygen to a chamber in the charged particle beam system; and   removing a gas from the chamber, wherein the gas is a byproduct of a chemical reaction of the organic residue and the oxygen.   
     
     
         2 . The method of  claim 1  further comprising:
 waiting for a period of time for the oxygen to react with the organic residue and form the gas. 
 
     
     
         3 . The method of  claim 2  further comprising:
 inserting a heater into the chamber, wherein the temperature in the chamber is increased by the heater. 
 
     
     
         4 . The method of  claim 3  further comprising:
 increasing the pressure in the chamber. 
 
     
     
         5 . The method of  claim 4 , increasing the pressure further comprising:
 adding nitrogen to the chamber.   
     
     
         6 . The method of  claim 4  further comprising:
 positioning the heater in close proximity to the organic residue; and 
 increasing the temperature in an area close to the organic residue. 
 
     
     
         7 . The method of  claim 6  further comprising:
 directing the oxygen to the area of increased temperature. 
 
     
     
         8 . The method of  claim 7 , the oxygen being ozone, wherein the ozone dissociates into a molecularly stable oxygen and an oxygen free radical in the area of increased temperature. 
     
     
         9 . The method of  claim 4 , removing the gas from the chamber further comprising:
 decreasing the pressure in the chamber.   
     
     
         10 . The method of  claim 4 , the chamber further including a beam column with a deflector coupled to a lens, a part of the organic residue on each of the deflector and the lens, the method further comprising:
 positioning the heater in close proximity to the lens and the deflector;   increasing the temperature near the lens and the deflector; and   directing the oxygen to the part of the organic residue on each of the deflector and the lens.   
     
     
         11 . The method of  claim 10 , the oxygen being ozone, wherein the ozone dissociates into a stable oxygen molecule and an oxygen free radical.