Layout pattern

Abstract

A layout pattern is disclosed. The layout pattern includes: a polygon pattern having at least one segment; and at least one notch formed in the polygon pattern, wherein at least one side of the notch is less than the length of the segment.

1 . A layout pattern, comprising:
 a polygon pattern having at least one segment; and   at least one notch formed in the polygon pattern, wherein at least one side of the notch is less than the length of the segment.   
     
     
         2 . The layout pattern of  claim 1 , wherein the length of the segment is between 60 nm to 70 nm. 
     
     
         3 . The layout pattern of  claim 1 , wherein the notch connects the segment. 
     
     
         4 . The layout pattern of  claim 1 , wherein the notch comprises right angled segments connecting the segment. 
     
     
         5 . The layout pattern of  claim 1 , wherein the segment is modified through an optical proximity correction. 
     
     
         6 . The layout pattern of  claim 5 , wherein widths, line ends, and corners of the segment are modified through the optical proximity correction. 
     
     
         7 . The layout pattern of  claim 1 , wherein the polygon pattern is composed of multiple segments and each segment is modified by an optical proximity correction. 
     
     
         8 . The layout pattern of  claim 1 , wherein the polygon pattern is composed of multiple segments and the width of each segment is modified by an optical proximity correction.