Method and system for utilizing perovskite material for charge storage and as a dielectric
Abstract
A memory device is disclosed. In a first aspect the memory comprises a first doped awell; two wells of opposite doping implanted in the first doped well; and two bitlines located on top of the two wells. The memory includes a Perovsite material on top of the first doped well and located between two bitlines; and a wordline located above the Perovskite material. In a second aspect the memory comprises a first doped well; two wells of opposite doping implanted in the first doped well; and two bitlines located on top of the two wells. The memory includes a Perovskite material located within one of the bitlines and a wordline located above the first doped well and located between the two bitlines.
Claims
exact text as granted — not AI-modified1 . A memory comprising:
a first doped well; two wells of opposite doping implanted in the first doped well; two bitlines located on top of the two wells; a Perovskite material on top of the first doped well and located between two biltines; and a wordline located above the Perovskite material.
2 . The memory of claim 1 , wherein the first doped well comprises a Pwell and the two wells comprise two Nwells.
3 . The memory of claim 1 , wherein the first doped well comprises an Nwell and the two wells comprise two Pwells.
4 . The memory of claim 1 , wherein the Perovskite material comprises a PCMO layer.
5 . A memory comprising:
a first doped well; two Nwells implanted in the Pwell; two bitlines located on top of the two Nwells; a Perovskite material located within one of the two Nwells; and a wordline located between the two bitlines.
6 . The memory of claim 5 , wherein the first doped well comprises a Pwell and the two wells comprises two Nwells.
7 . The memory of claim 5 , wherein the first doped well comprises an Nwell and the two wells comprise two Pwells.
8 . The memory of claim 5 , wherein the Perovskite material comprises a PCMO layer.
9 . A system comprising one or more of the memory of claim 1 .
10 . A system comprising one or more of the memory of claim 5 .
11 . A memory comprising:
a first doped well; two wells of opposite doping implanted in the first doped well; two bitlines located on top of the two wells; a Perovskite material connected to one of the bitlines; and a wordline located above the two wells of opposite doping.
12 . The memory of claim 11 , wherein the first doped well comprises a Pwell and the two wells comprise two Nwells.
13 . The memory of claim 11 , wherein the first doped well comprises an Nwell and the two wells comprise two Pwells.
14 . The memory of claim 11 , wherein the Perovskite material comprises a PCMO layer.
15 . A system comprising one or more of the memory of claim 11 .
16 . A method for providing a memory, comprising
providing a transistor; providing a capacitor comprising Perovskite material, wherein the capacitor is connected to a side of the transistor; providing a wordline, connected to a gate of the transistor; providing a bitline, connected to a side of the transistor not connected to the capacitor; and providing a driveline, connected to the capacitor.
17 . The method of claim 16 , comprising
writing the memory by: applying a positive voltage to the bitline; connecting the driveline to ground; and asserting the wordline.
18 . The method of claim 16 , comprising
writing the memory by: applying a positive voltage to the driveline; connecting the bitline to ground; and asserting the wordline.
19 . The method of claim 16 , comprising
reading the memory by: floating the bitline; applying a positive voltage to the driveline; and asserting the wordline.
20 . A circuit for a memory, comprising
a transistor; a capacitor comprising Perovskite material, wherein the capacitor is connected to a side of the transistor; a wordline, connected to a gate of the transistor; a bitline, connected to a side of the transistor not connected to the capacitor; and a driveline, connected to the capacitor.Cited by (0)
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