Membrane

Abstract

A membrane is suitable to be mounted on a polishing head of a chemical mechanical polishing apparatus and includes a main portion and an edge portion. The edge portion is located at an edge of the main portion, wherein a first included angle between the main portion and the edge portion is an obtuse angle.

1 . A membrane, suitable to be mounted on a polishing head of a chemical mechanical polishing apparatus, the membrane comprising:
 a main portion; and   an edge portion, located at an edge of the main portion, wherein a first included angle between the main portion and the edge portion is an obtuse angle.   
     
     
         2 . The membrane as claimed in  claim 1 , wherein a frame of the polishing head comprises a frame main body and a retainer ring, the membrane is mounted on the frame main body, and the retainer ring surrounds and is connected to the frame main body, when the retainer ring presses against a polishing pad, the polishing pad in the retainer ring forms a protruding portion, a second included angle is formed between a planar portion of the polishing pad and the protruding portion, and the first included angle is substantially equal to the second included angle. 
     
     
         3 . The membrane as claimed in  claim 2 , wherein an area within which the edge portion operates is substantially equal to the area within which the protruding portion of the polishing pad is located. 
     
     
         4 . The membrane as claimed in  claim 2 , wherein the second included angle is from 90 degrees to 180 degrees. 
     
     
         5 . The membrane as claimed in  claim 1 , wherein the first included angle is from 90 degrees to 180 degrees. 
     
     
         6 . The membrane as claimed in  claim 1 , wherein a material of the membrane comprises rubber. 
     
     
         7 . The membrane as claimed in  claim 1 , wherein the main portion and the edge portion are integrally formed.