Target supply unit of extreme ultraviolet light source apparatus and method of manufacturing the same
Abstract
In a target supply unit of an extreme ultraviolet light source apparatus for generating extreme ultraviolet light by applying a laser beam to a target material to turn the target material into plasma, clogging of a target nozzle for supplying the target material to a laser beam application point is suppressed. The target supply unit includes: a target container for accommodating the target material; a target nozzle for injecting the target material supplied from the target container; and a reducing gas supply unit for supplying a reducing gas into the target container. Instead of using the reducing gas, a carbon-based material having a reduction action may be provided within the target container for causing reduction reaction.
Claims
exact text as granted — not AI-modified1 - 12 . (canceled)
13 . A method of manufacturing a target supply unit to be used in an extreme ultraviolet light source apparatus for generating extreme ultraviolet light by applying a laser beam to a target material to turn the target material into plasma, said method comprising the steps of:
(a) accommodating the target material within a target container connected to a target nozzle; (b) reducing an oxide contained in the target material accommodated within said target container; and (c) sealing said target container.
14 . The method according to claim 13 , wherein step (a) includes accommodating the target material within a target container including a carbon-based material having a reduction action.
15 . The method according to claim 13 , wherein step (b) includes introducing a reducing gas within said target container.
16 . The method according to claim 13 , wherein step (b) includes exhausting a gas within said target container.
17 . The method according to claim 15 , wherein said reducing gas contains at least one of hydrogen gas, hydrogen radical, and carbon monoxide gas.Join the waitlist — get patent alerts
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