Substrate treatment apparatus and substrate treatment method

Abstract

A substrate treatment apparatus is provided which is used for removing a resist from a front surface of a substrate. The apparatus includes a substrate holding unit which holds the substrate, and a sulfuric acid ozone/water mixture supplying unit which supplies a sulfuric acid ozone/water mixture to the front surface of the substrate held by the substrate holding unit, the sulfuric acid ozone/water mixture being a mixture which is prepared by mixing water with sulfuric acid ozone prepared by dissolving ozone gas in sulfuric acid.

What is claimed is: 
     
         1 . A substrate treatment apparatus to be used for removing a resist from a front surface of a substrate, the apparatus comprising:
 a substrate holding unit which holds the substrate; and   a sulfuric acid ozone/water mixture supplying unit which supplies a sulfuric acid ozone/water mixture to the front surface of the substrate held by the substrate holding unit, the sulfuric acid ozone/water mixture being a mixture which is prepared by mixing water with sulfuric acid ozone prepared by dissolving ozone gas in sulfuric acid.   
     
     
         2 . The substrate treatment apparatus according to  claim 1 , wherein the sulfuric acid ozone/water mixture supplying unit includes a liquid mixture nozzle which spouts the sulfuric acid ozone/water mixture toward the front surface of the substrate held by the substrate holding unit. 
     
     
         3 . The substrate treatment apparatus according to  claim 2 , wherein the sulfuric acid ozone/water mixture supplying unit further includes:
 a mixing portion which mixes the sulfuric acid ozone and the water together;   a sulfuric acid ozone supplying portion which feeds the sulfuric acid ozone to the mixing portion; and   a liquid mixture supply pipe which supplies the sulfuric acid ozone/water mixture prepared by the mixing in the mixing portion to the liquid mixture nozzle.   
     
     
         4 . The substrate treatment apparatus according to  claim 3 , wherein the sulfuric acid ozone supplying portion includes a sulfuric acid ozone retaining portion which retains the sulfuric acid ozone, and a circulation passage connected to the sulfuric acid ozone retaining portion and the mixing portion to circulate the sulfuric acid ozone from the sulfuric acid ozone retaining portion back into the sulfuric acid ozone retaining portion therethrough. 
     
     
         5 . The substrate treatment apparatus according to  claim 2 , wherein the liquid mixture nozzle includes:
 a mixing chamber in which the sulfuric acid ozone and the water are mixed together;   a sulfuric acid ozone inlet port through which the sulfuric acid ozone is fed into the mixing chamber;   a water inlet port through which the water is fed into the mixing chamber; and   a liquid mixture outlet port from which the sulfuric acid ozone/water mixture prepared by the mixing in the mixing chamber is spouted.   
     
     
         6 . The substrate treatment apparatus according to  claim 1 , wherein the sulfuric acid ozone/water mixture supplying unit includes a sulfuric acid ozone nozzle which spouts the sulfuric acid ozone toward the front surface of the substrate held by the substrate holding unit, and a water nozzle which spouts the water toward the front surface of the substrate held by the substrate holding unit. 
     
     
         7 . A substrate treatment method to be used for removing a resist from a substrate front surface, the method comprising a sulfuric acid ozone/water mixture supplying step of supplying a sulfuric acid ozone/water mixture to a front surface of a substrate held by a substrate holding unit, the sulfuric acid ozone/water mixture being a mixture which is prepared by mixing water with sulfuric acid ozone prepared by dissolving ozone gas in sulfuric acid.