Semiconductor Device

Abstract

A semiconductor device includes a semiconductor layer of a first conductivity type having a first surface and a second surface, a source region disposed on the first surface, a gate region disposed on the first surface adjacent the source region, and a drain region disposed on the first surface. The semiconductor device also includes a pair of charge control trenches disposed between the gate region and the drain region. Each of the pair of charge control trenches is characterized by a width and includes a first dielectric material disposed therein and a second material disposed internal to the first dielectric material. Additionally, a concentration of doping impurities present in the semiconductor layer of the first conductivity type and a distance between the pair of charge control trenches define an electrical characteristic of the semiconductor device that is independent of the width of each of the pair of charge control trenches.

1 . A semiconductor device comprising:
 a semiconductor layer of a first conductivity type having a first surface and a second surface;   a source region disposed on the first surface; a gate region disposed on the first surface adjacent the source region;   a drain region disposed on the first surface;   and at least a pair of charge control trenches disposed between the gate region and the drain region, wherein each of the at least a pair of charge control trenches is characterized by a width and includes a first dielectric material disposed therein and a second material disposed internal to the first dielectric material and wherein a concentration of doping impurities present in the semiconductor layer of the first conductivity type and a distance between the at least a pair of charge control trenches define an electrical characteristic of the semiconductor device that is independent of the width of each of the at least a pair of charge control trenches.   
     
     
         2 - 31 . (canceled)