Methods and apparatuses for roll-on coating

Abstract

Coating rollers accepting liquid media provide liquid chemicals to substrates for depositing a thin coating layer on the flat substrates, such as semiconductors or panels. The liquid media is cooled to a life-preserving temperature while shielded from the thermal energy heating the substrates to prevent degrading the liquid media. Physical barrier or temperature barrier can be established in vicinities of the rollers to further limit exposing the liquid media to high temperature.

What is claimed is: 
     
         1 . A deposition system for coating a substrate, comprising:
 at least one coating roller, wherein the at least one coating roller is configured to form a liquid coating on the substrate;   a liquid reservoir comprising a liquid, wherein the liquid is configured to have a path of fluid communication between the liquid reservoir and the at least one coating roller;   a first temperature controlling device coupled to the path of fluid communication to establish a temperature difference between two portions of the liquid.   
     
     
         2 . A deposition system as in  claim 1  further comprising
 a heating mechanism to heat the substrate. 
 
     
     
         3 . A deposition system as in  claim 1   wherein the heating mechanism is shielded from the liquid reservoir.   
     
     
         4 . A deposition system as in  claim 1   wherein the at least one coating roller comprises a porous layer for accepting and retaining the liquid to transfer to the substrate by rollingly contact.   
     
     
         5 . A deposition system as in  claim 1   wherein the at least one coating roller contacts the liquid in the liquid reservoir.   
     
     
         6 . A deposition system as in  claim 1  further comprising
 a second temperature controlling device coupled to the liquid to control a temperature of the liquid to be below room temperature, 
 
     
     
         7 . A deposition system as in  claim 6   wherein the temperature of the liquid is less than 10 C.   
     
     
         8 . A deposition system as in  claim 1  further comprising
 a stirrer mechanism for equalizing the temperature of the liquid in the liquid reservoir. 
 
     
     
         9 . A deposition system as in  claim 1  further comprising
 a recirculation system recirculating and filtering the liquid in the liquid reservoir. 
 
     
     
         10 . A deposition system for coating a substrate, comprising:
 at least one coating roller, wherein the at least one coating roller is configured to form a liquid coating on the substrate;   a liquid reservoir comprising a liquid, wherein the liquid is configured to have a fluid communication between the liquid reservoir and the at least one coating roller;   a barrier disposed in a path of the fluid communication, wherein the barrier partitions the liquid into two portions;   a first temperature controlling device coupled to the barrier to establish a temperature difference at the barrier.   
     
     
         11 . A deposition system as in  claim 10   wherein the barrier comprises a physical barrier with holes.   
     
     
         12 . A deposition system as in  claim 10   wherein the barrier is configured to partially block the fluid communication.   
     
     
         13 . A deposition system as in  claim 10   wherein the barrier is disposed in the liquid reservoir.   
     
     
         14 . A deposition system as in  claim 10   wherein the barrier surrounds the at least one coating roller.   
     
     
         15 . A deposition system as in  claim 10   wherein the barrier is disposed in a vicinity of the at least one coating roller.   
     
     
         16 . A deposition system for coating a substrate, comprising:
 at least one coating roller, wherein the at least one coating roller is configured to form a liquid coating on the substrate;   a liquid reservoir comprising a liquid, wherein the liquid is configured to have a fluid communication between the liquid reservoir and the at least one coating roller;   a first temperature controlling device coupled to the liquid reservoir, wherein the temperature controlling device comprises a device having a heated area and a cooling area with the heated area facing the at least one coating roller and the cooling area facing the liquid in the liquid reservoir.   
     
     
         17 . A deposition system as in  claim 16  further comprising
 a heating mechanism to heat the substrate, wherein the heating mechanism is shielded from the liquid reservoir. 
 
     
     
         18 . A deposition system as in  claim 16   wherein the at least one coating roller contacts the liquid in the liquid reservoir for accepting the liquid.   
     
     
         19 . A deposition system as in  claim 16  further comprising
 a second temperature controlling device coupled to the liquid to control a temperature of the liquid to be below room temperature, 
 
     
     
         20 . A deposition system as in  claim 16   wherein the liquid comprises a chemical having a degradation characteristic when exposed to temperature above room temperature.