US2014262801A1PendingUtilityA1
Method of filling through-holes
Est. expiryMar 14, 2033(~6.7 yrs left)· nominal 20-yr term from priority
H05K 3/423C25D 3/38C25D 5/02C25D 5/34C23C 18/1653C25D 5/10
45
PatentIndex Score
0
Cited by
0
References
0
Claims
Abstract
The methods inhibit or reduce dimpling and voids during copper electroplating of through-holes with flash copper layers in substrates such as printed circuit boards. An acid solution containing disulfide compounds is applied to the through-holes of the substrate followed by filling the through-holes with copper using an acid copper electroplating bath which includes additives such as brighteners and levelers.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A method comprising:
a) providing a substrate with a plurality of through-holes and a layer of copper flash on a surface of the substrate and walls of the plurality of through-holes; b) applying an aqueous acid solution to at least the plurality of through-holes, the aqueous acid solution comprising one or more disulfide compounds having a formula:
wherein X is sodium, potassium or hydrogen, R is independently hydrogen or an alkyl, n and m are integers of 1 or greater, the one or more disulfide compounds are in amounts of 50 ppb to 10 ppm; and
c) electroplating at least the through-holes with copper using an acid copper electroplating bath comprising one or more brighteners and one or more levelers.
2 . The method of claim 1 , wherein the disulfide compounds are in amounts of 50 ppb to 500 ppb.
3 . The method of claim 1 , wherein X is sodium or hydrogen.
4 . The method of claim 1 , wherein R is independently hydrogen or (C 1 -C 6 )alkyl.
5 . The method of claim 1 , wherein m and n are independently integers of 1-6.
6 . The method of claim 1 , wherein the disulfide compound is bis(3-sulfopropyl)disulfide.
7 . The method of claim 1 , wherein the one or more levelers of the copper electroplating bath are reaction products of one or more imidazole compounds and one or more epoxy compounds.Cited by (0)
No later patents cite this yet.
References (0)
No backward citations on record.