US2014367863A1PendingUtilityA1

Semiconductor device

Assignee: YAMAMICHI SHINTAROPriority: Oct 22, 2007Filed: Aug 26, 2014Published: Dec 18, 2014
Est. expiryOct 22, 2027(~1.2 yrs left)· nominal 20-yr term from priority
H10W 72/9413H10W 70/685H10W 70/65H10W 70/60H10W 70/635H10W 70/614H10W 70/09H10W 20/42H10W 20/43H01L 23/528H01L 23/5226
48
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Claims

Abstract

A semiconductor device comprises: a semiconductor element; a support substrate arranged on a surface of the semiconductor element opposite to a surface thereof provided with a pad, the support substrate being wider in area than the semiconductor element; a burying insulating layer on the support substrate for burying the semiconductor element therein; a fan-out interconnection led out from the pad to an area on the burying insulating layer lying more peripherally outwardly than the semiconductor element; and a reinforcement portion arranged in a preset area on top of outer periphery of the semiconductor element for augmenting the mechanical strength of the burying insulating layer and the fan-out interconnection.

Claims

exact text as granted — not AI-modified
1 . A semiconductor device comprising:
 a semiconductor element;   a support substrate arranged on a surface of said semiconductor element opposite to a surface thereof provided with a pad; said support substrate being bigger in area than said semiconductor element;   a burying insulating layer on said support substrate for burying said semiconductor element therein;   a fan-out interconnection led out from said pad to an area on said burying insulating layer extending to an area lying more peripherally outwardly than said semiconductor element; and   a reinforcement portion via interconnection connected to at least one end of said semiconductor element without being connected to said fan-out interconnection.   
     
     
         2 . The semiconductor device according to  claim 1 , wherein
 said reinforcement portion via interconnection is formed of the same material as that of said fan-out interconnection.   
     
     
         3 . The semiconductor device according to  claim 1 , wherein
 said reinforcement portion via interconnection has a modulus of elasticity higher than that of said fan-out interconnection.   
     
     
         4 . The semiconductor device according to  claim 1 , wherein
 said reinforcement portion is arranged in an area extending outwardly from a location directly above the outer periphery of said semiconductor element.   
     
     
         5 . The semiconductor device according to  claim 1 , wherein
 said reinforcement portion is arranged in an area extending by a distance up to twice a thickness of said semiconductor element from a location lying directly above an outer periphery of said semiconductor element.

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