Surface properties of polymeric materials with nanoscale functional coating

Abstract

An electronic device comprising a substrate having a component-side surface and a moisture protection film covering the component-side surface. The moisture protection film includes a first water layer bonded to component-side surface that is an activated surface, wherein the activated surface has a lower water contact angle than the substrate surface before the surface activation. The film includes a first graphed layer of a plasma-reacted first set of precursor molecules graphed to the first water layer, wherein the first water layer forms a first bonding link between the substrate surface and the reacted first set precursor molecules. The film includes a second water layer bonded to the first graphed layer. The film includes a second graphed layer of a plasma-reacted second set of precursor molecules graphed to the second water layer, wherein the second water layer forms a second bonding link between the second water layer and the reacted second set of precursor molecules.

What is claimed is: 
     
         1 . A electronic device, comprising:
 a substrate having a component-side surface; and   a moisture protection film covering the component-side surface, the moisture protection film including:
 a first water layer bonded to component-side surface that is an activated surface, wherein the activated surface has a lower water contact angle than the substrate surface before the surface activation; 
 a first graphed layer of a plasma-reacted first set of precursor molecules graphed to the first water layer, wherein the first water layer forms a first bonding link between the substrate surface and the reacted first set precursor molecules; 
 a second water layer bonded to the first graphed layer; and 
 a second graphed layer of a plasma-reacted second set of precursor molecules graphed to the second water layer, wherein the second water layer forms a second bonding link between the second water layer and the reacted second set of precursor molecules. 
   
     
     
         2 . The device of  claim 1 , wherein:
 the component-side surface was exposed a first plasma treatment having plasma reactants in a plasma chamber to form the activated substrate surface;   the first water layer was formed after removing the plasma reactants from the plasma chamber and then introducing water vapor into the plasma chamber to form the first water layer bonded to the activated surface; and then   the plasma-reacted first set of precursor molecules was formed in a second plasma treatment that includes introducing the precursor molecules of the first set into the plasma chamber at a plasma chamber pressure that is in a range from 100 mTorr to 500 mTorr.   
     
     
         3 . The device of  claim 2 , wherein the precursor molecules of the first set include olefinic hydrocarbon of 4-15 carbon atoms. 
     
     
         4 . The device of  claim 2 , wherein the olefinic precursor molecules includes paracyclophanes. 
     
     
         5 . The device of  claim 2 , wherein the olefinic precursor molecules includes parylene. 
     
     
         6 . The device of  claim 2 , wherein the precursor molecules of the first set include tetraethyloxyorthosilane. 
     
     
         7 . The device of  claim 2 , wherein:
 the second water layer was formed after removing the precursor molecules of the first set from the plasma chamber and then introducing water vapor into the plasma chamber to form the second water layer bonded to the the plasma-reacted first set of precursor molecules; and then   the plasma-reacted second set of precursor molecules was formed in a third plasma treatment that includes introducing the precursor molecules of the second set into the plasma chamber at a plasma chamber pressure that is in a range from 100 mTorr to 500 mTorr.   
     
     
         8 . The device of  claim 7 , wherein the precursor molecules of the first set include olefinic hydrocarbon of 4-15 carbon atoms. 
     
     
         9 . The device of  claim 7 , wherein the olefinic precursor molecules includes paracyclophanes. 
     
     
         10 . The device of  claim 7 , wherein the olefinic precursor molecules includes parylene. 
     
     
         11 . The device of  claim 7 , wherein the precursor molecules of the first set include tetraethyloxyorthosilane. 
     
     
         12 . The device of  claim 1 , wherein the component-side surface includes a borosilicate glass surface. 
     
     
         13 . The device of  claim 1 , wherein the component-side surface includes a surface of a thermal vapor coating of parylene. 
     
     
         14 . The device of  claim 1 , wherein the component-side surface includes a surface of electrically conductive polymer. 
     
     
         15 . The device of  claim 1 , wherein the first graphed layer of the plasma-reacted first set of precursor molecules is a parylene layer and the second graphed layer of the plasma-reacted second set of precursor molecules is a parylene layer. 
     
     
         16 . The device of  claim 1 , wherein the first graphed layer of the plasma-reacted first set of precursor molecules is a silicon oxide layer and the second graphed layer of the plasma-reacted second set of precursor molecules is a silicon oxide layer. 
     
     
         17 . The device of  claim 1 , wherein the first graphed layer of the plasma-reacted first set of precursor molecules is a silicon oxide layer and the second graphed layer of the plasma-reacted second set of precursor molecules is a parylene layer. 
     
     
         18 . The device of  claim 1 , wherein the first graphed layer of the plasma-reacted first set of precursor molecules is a parylene layer and the second graphed layer of the plasma-reacted second set of precursor molecules is a silicon oxide layer. 
     
     
         19 . The device of  claim 1 , wherein the moisture protection film covering the component-side surface is a conformal coating.