US2015179434A1PendingUtilityA1

Nano-scale structures

Assignee: SK HYNIX INCPriority: Jul 25, 2013Filed: Jan 12, 2015Published: Jun 25, 2015
Est. expiryJul 25, 2033(~7 yrs left)· nominal 20-yr term from priority
H10P 50/696H10P 50/695H10P 50/692H10P 76/20H10P 76/4085Y10T428/24669Y10T428/24802Y10T428/24851H10D 1/716H10D 1/043H01L 21/0271H10B 63/80H10B 12/0335H10B 12/318H10N 70/011
46
PatentIndex Score
0
Cited by
0
References
0
Claims

Abstract

A nanoscale structure includes an array of pillars over an underlying layer, a separation wall layer including first separation walls formed over sidewalls of the pillars, and a block co-polymer (BCP) layer formed over the separation wall layer and filling gaps between the pillars. The BCP layer is phase-separated to include first domains that provide second separation walls formed over the first separation walls and second domains that are separated from each other by the first domains.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A nanoscale structure comprising:
 an array of pillars over an underlying layer;   a separation wall layer including first separation walls formed over sidewalls of the pillars; and   a block co-polymer (BCP) layer formed over the separation wall layer and filling gaps between the pillars,   wherein the BCP layer is phase-separated to include first domains that provide second separation walls formed over the first separation walls and second domains that are separated from each other by the first domains.   
     
     
         2 . The nanoscale structure of  claim 1 , wherein the separation wall layer is disposed to expose top surfaces of the pillars. 
     
     
         3 . The nanoscale structure of  claim 1 , wherein the separation wall layer extends to cover top surfaces of the pillars. 
     
     
         4 . The nanoscale structure of  claim 1 , wherein the BCP layer includes a polystyrene-poly(methyl meta acrylate) (PS-PMMA) co-polymer material or a silicon contained polystyrene-poly(di methyl siloxane) (Si contained PS-PDMS) co-polymer material. 
     
     
         5 . The nanoscale structure of  claim 1 , wherein the BCP layer is disposed to expose top surfaces of the pillars. 
     
     
         6 . The nanoscale structure of  claim 1 , wherein each of the second domains has a post shape. 
     
     
         7 . The nanoscale structure of  claim 6 , wherein each of the first domains has a ‘U’-shaped sectional view that covers a sidewall and a bottom surface of each of the second domains. 
     
     
         8 . The nanoscale structure of  claim 1 ,
 wherein a unit array of the pillars includes four of the pillars which are respectively located at four vertex of a tetragon or three of the pillars which are respectively located at three vertex of a triangle; and   wherein each of the second domains is disposed in a central portion of the tetragon or the triangle.   
     
     
         9 . The nanoscale structure of  claim 8 ,
 wherein the first domain fills gaps between the pillars arrayed in a row direction and between the pillars arrayed in a column direction and extends onto the underlying layer to provide a recessed space in a central portion surrounded by the pillars located at four vertex of the tetragon or at three vertex of the triangle; and   wherein the second domain fills the recessed space which is surrounded by the first domain,   
     
     
         10 . A nanoscale structure comprising:
 an array of first separation walls over an underlying layer, each of the first separation walls having a hollow cylindrical shape; and   a block co-polymer (BCP) layer filling inside regions of the first separation walls and gaps between the first separation walls,   wherein the BCP layer is phase-separated to include first domains that provide second separation walls formed over inner sidewalls and outer sidewalls of the first separation walls and second domains that are separated from each other by the first domains.   
     
     
         11 . The nanoscale structure of  claim 10 , wherein the BCP layer includes a polystyrene-poly(methyl meta acrylate) (PS-PMMA) co-polymer material or a silicon contained polystyrene-poly(di methyl siloxane) (Si contained PS-PDMS) co-polymer material. 
     
     
         12 . The nanoscale structure of  claim 10 , wherein each of the second domains has a post shape. 
     
     
         13 . The nanoscale structure of  claim 12 , wherein each of the first domains has a ‘U’-shaped sectional view that covers a sidewall and a bottom surface of each of the second domains. 
     
     
         14 . The nanoscale structure of  claim 10 ,
 wherein a unit array of the first separation walls includes four of the first separation walls which are located at four vertex of a tetragon or three of the first separation walls which are located at three vertex of a triangle; and   wherein the second domains are disposed in a central portion of the tetragon or the triangle as well as in the first separation walls.

Join the waitlist — get patent alerts

Track US2015179434A1 — get alerts on status changes and closely related new filings.

We store only your email — no account needed. See our privacy policy.