Image processor, method for generating pattern using self- organizing lithographic techniques and computer program

Abstract

An image processor, a method for generating a pattern using self-organizing lithographic techniques, and a computer program are provided to achieve image processing suitable for addressing a sample generated by patterning using Directed Self-Assembly (DSA), and the processor, method, and computer program are characterized in that a template for addressing is prepared on the basis of guide pattern data used for patterning by DSA. The above configuration makes it possible to provide an addressing pattern suitable for visual field positioning in measuring or inspecting a pattern formed through the patterning process using DSA.

1 . An image processor comprising a matching processing unit that performs pattern matching on an image using a template created in advance, wherein
 said matching processing unit performs the pattern matching using a template that is formed based on data indicating a guide pattern used for self-organizing lithography.   
     
     
         2 . The image processor according to  claim 1  wherein
 said matching processing unit performs the pattern matching by using a template in which a pattern, formed through annealing processing during the self-organizing lithography, is selectively arranged within the guide pattern. 
 
     
     
         3 . The image processor according to  claim 2  wherein
 the template indicates a pattern shape obtained by performing the annealing processing for a pattern in which, within the guide pattern, a guide pattern is further formed. 
 
     
     
         4 . The image processor according to  claim 1  wherein
 the template is an image created by removing an image of a high molecular compound outside the guide pattern from an image acquired by a charged particle beam device. 
 
     
     
         5 . The image processor according to  claim 1  wherein
 the template is created by adding an image of a pattern, formed based on a high molecular compound formed within the guide pattern, to image data of the guide pattern. 
 
     
     
         6 . The image processor according to  claim 5  wherein
 the image data of the guide pattern is graphic data, obtained based on design data on the guide pattern, or graphic data obtained based on simulation for the design data. 
 
     
     
         7 . A pattern generation method based on a self-organizing lithography technology for patterning by applying a polymer block copolymer on, and performing annealing for, a sample on which on a guide pattern is formed, wherein
 the patterning is performed by applying the polymer block copolymer on, and then performing the annealing for, a pattern that is created based on an exposure using a photomask created by forming a guide pattern within a pattern that will become a template for pattern matching.   
     
     
         8 . The pattern generation method based on a self-organizing lithography technology according to  claim 7  wherein
 the guide pattern is arranged at equal intervals within the pattern that will become the template. 
 
     
     
         9 . The pattern generation method based on a self-organizing lithography technology according to  claim 8  wherein
 a width and a pitch of the guide is an allowable size and an allowable pitch in the self-organizing technology and a segment is oriented in one direction only. 
 
     
     
         10 . A computer program that causes an arithmetic processing device to execute pattern matching on an image using a template, wherein
 said program causes said arithmetic processing device to perform the pattern matching using a template that is formed based on data indicating a guide pattern used for self-organizing lithography.   
     
     
         11 . The computer program according to  claim 10  wherein
 said program causes said arithmetic processing device to perform the pattern matching by using a template in which a pattern, formed through annealing processing during the self-organizing lithography, is selectively arranged within the guide pattern.