US2015291753A1PendingUtilityA1

Gas barrier film

Assignee: TORAY INDUSTRIESPriority: Oct 28, 2011Filed: Sep 28, 2012Published: Oct 15, 2015
Est. expiryOct 28, 2031(~5.3 yrs left)· nominal 20-yr term from priority
C08J 7/0423C23C 14/3457C08F 290/068C08L 33/066C23C 16/40C23C 14/0629C23C 14/086C08J 2367/02C08J 2443/04B65D 65/40C23C 14/081C08J 2433/10C08J 2433/12C08J 2433/16C23C 14/10C08J 2433/00C08F 220/14C08F 265/06C23C 16/50C08J 7/045C08F 259/08C08J 7/043C08J 7/048C08J 7/046
57
PatentIndex Score
0
Cited by
0
References
0
Claims

Abstract

[Problem] The purpose of the present invention is to provide a gas barrier film having high gas barrier performance and excellent repeated reproducibility of gas barrier performance. [Solution] A gas barrier film comprising a polymer base, an undercoat layer that contains, as the main component, an acrylic resin having at least one side chain selected from the group consisting of the side chains (I) to (III) mentioned below, and an inorganic layer, wherein the undercoat layer and the inorganic layer are arranged in this order on at least one surface of the polymer base in such a manner that the undercoat layer and the inorganic layer are in contact with each other: (I) a side chain having an acrylic polymer skeleton; (II) a side chain having a dimethylsioxane skeleton; and (III) a side chain having a skeleton containing a fluorine atom.

Claims

exact text as granted — not AI-modified
1 . A polymer base laminated, at least on one surface thereof, with an undercoat layer containing, as the primary component, an acrylic resin having at least one side chain selected from the group consisting of (I) to (III) given below and an inorganic layer stacked in contact with each other in this order:
 (I) a side chain having an acrylic polymer skeleton,   (II) a side chain having a dimethyl siloxane skeleton,   (III) a side chain having a fluorine atom-containing skeleton.   
     
     
         2 . Gas barrier film as described in  claim 1 , wherein the side chain contains at least (II) and/or (III) given above. 
     
     
         3 . Gas barrier film as described in  claim 1 , wherein the acrylic resin has a structure produced by copolymerizing an acrylic monomer and at least one macromonomer selected from the group consisting of (i) to (iii) given below:
 (i) a macromonomer including an acrylic polymer having a radically polymerizable group at an end thereof,   (ii) a macromonomer including a dimethyl siloxane skeleton-based polymer having a radically polymerizable group at an end thereof,   (iii) a macromonomer including a fluorine atom-containing polymer having a radically polymerizable group at an end thereof.   
     
     
         4 . Gas barrier film as described in  claim 3 , wherein the macromonomer contains at least (ii) or (iii) given above. 
     
     
         5 . Gas barrier film as described in  claim 1 , wherein the undercoat layer has a surface free energy of 10 to 45 mN/m. 
     
     
         6 . Gas barrier film as described in  claim 1 , wherein the undercoat layer has a surface free energy of 10 to 25 mN/m. 
     
     
         7 . Gas barrier film as described in  claim 3 , wherein the acrylic resin is one produced by copolymerizing 100 parts by mass of the acrylic monomer having a composition as described below with 3 to 8 parts by mass of a macromonomer;
 1 to 8 mass % of methacrylic acid,   5 to 16 mass % of 2-hydroxyethyl methacrylate, and   76 to 94 mass % of methyl methacrylate and/or dicyclopentanyl methacrylate.   
     
     
         8 . Gas barrier film as described in  claim 1 , wherein the inorganic layer has a thickness of 10 to 1,000 nm and comprises a zinc compound and a silicon oxide. 
     
     
         9 . Gas barrier film as described in  claim 8 , wherein the inorganic layer is either a layer [Bl] or a layer [B2] as specified below:
 layer [Bl]: a layer of a phase in which zinc oxide, silicon dioxide, and aluminum oxide coexist,   layer [B2]: a layer of a phase in which zinc sulfide and silicon dioxide coexist.   
     
     
         10 . Gas barrier film as described in  claim 9 , wherein the inorganic layer is a layer [Bl] as specified above and the layer [Bl] has a, zinc (Zn) atom concentration of 20 to 40 atom %, a silicon (Si) atom concentration of 5 to 20 atom %, an aluminum (A1) atom concentration of 0.5 to 5 atom %, and an oxygen (O) atom concentration of 35 to 70 atom % as determined by ICP emission spectroscopy analysis. 
     
     
         11 . Gas barrier film as described in  claim 9 , wherein the inorganic layer is a layer [B2] as specified above and the layer [B2] has a composition in which zinc sulfide accounts for a mole fraction of 0.7 to 0.9 of the total quantity of zinc sulfide and silicon dioxide. 
     
     
         12 . Gas barrier film as described in  claim 1 , wherein the inorganic layer has a surface roughness Ra of 2 nm or less. 
     
     
         13 . A production method for gas barrier film comprising:
 producing, at least on one of the surfaces of a polymer base, an undercoat layer containing, as the primary component, an acrylic resin produced by copolymerizing an acrylic monomer and at least one macromonomer selected from the group consisting of (i) to (iii) given below, and   forming an inorganic layer on the undercoat layer:   
       (i) a macromonomer including an acrylic polymer having a radically polymerizable group at an end thereof, 
       (ii) a macromonomer including a dimethyl siloxane skeleton-based polymer having a radically polymerizable group at an end thereof, 
       (iii) a macromonomer including a fluorine atom-containing polymer having a radically polymerizable group at an end thereof.

Join the waitlist — get patent alerts

Track US2015291753A1 — get alerts on status changes and closely related new filings.

We store only your email — no account needed. See our privacy policy.