Substrate treating apparatus with parallel substrate treatment lines

Abstract

A substrate treating apparatus for treating substrates includes a plurality of substrate treatment lines arranged vertically for carrying out plural types of treatment on the substrates while transporting the substrates substantially horizontally, and a controller for changing processes of treatment carried out on the substrates for each of the substrate treatment lines. By changing the processes of treatment carried out for the substrates for each substrate treatment line, the processes of treatment carried out for the substrates can be changed for each substrate conveniently. Thus, a plurality of different processes of treatment corresponding to the number of substrate treatment lines can be carried out in parallel for the respective substrates.

What is claimed is: 
     
         1 . A substrate treating apparatus comprising:
 a treating block;   the treating block including:
 a plurality of stories for performing coating treatment of substrates; and 
 a plurality of stories for performing developing treatment of the substrates; 
   each of the stories for performing coating treatment of the substrates having:
 coating units for performing coating treatment of the substrates; 
 heat-treating units for performing heat treatment of the substrates; and 
 a first main transport mechanism disposed in a transporting space for transporting the substrates to the coating units and the heat-treating units; and 
   each of the stories for performing developing treatment of the substrates having:
 developing units for performing developing treatment of the substrates; 
 heat-treating units for performing heat treatment of the substrates; and 
 a second main transport mechanism disposed in a transporting space for transporting the substrates to the developing units and the heat-treating units. 
   
     
     
         2 . The apparatus according to  claim 1 , wherein the treating block is rectangular in plan view. 
     
     
         3 . The apparatus according to  claim 1 , wherein:
 the first main transport mechanism, the coating units and the heat-treating units are in same layout in plan view for the respective stories for performing coating treatment;   the coating units are in same layout in side view for the respective stories for performing coating treatment;   the heat-treating units are in same layout in side view for the respective stories for performing coating treatment;   the second main transport mechanism, the developing units and the heat-treating units are in same layout in plan view for the respective stories for performing developing treatment;   the developing units are in same layout in side view for the respective stories for performing developing treatment; and   the heat-treating units are in same layout in side view for the respective stories for performing developing treatment.   
     
     
         4 . The apparatus according to  claim 1 , wherein:
 processes for treating the substrates are the same for the respective stories for performing coating treatment; and   processes for treating the substrates are the same for the respective stories for performing developing treatment.   
     
     
         5 . The apparatus according to  claim 1 , further comprising:
 a first gas supply pipe for supplying a clean gas into the transporting space of each of the stories for performing coating treatment of the substrates; and   a second gas supply pipe for supplying the clean gas into the coating units;   wherein the second gas supply pipe has an end thereof connected to the first gas supply pipe.   
     
     
         6 . The apparatus according to  claim 5 , wherein the end of the second gas supply pipe is connected to the first gas supply pipe in a position lower than any one of the stories for performing coating treatment of the substrates. 
     
     
         7 . The apparatus according to  claim 1 , further comprising:
 a first gas exhaust pipe for exhausting gas from the transporting space of each of the stories for performing coating treatment of the substrates; and   a second gas exhaust pipe for exhausting gas from the coating units;   wherein the second gas exhaust pipe has an end thereof connected to the first gas exhaust pipe.   
     
     
         8 . The apparatus according to  claim 1 , further comprising:
 a gas supply pipe for supplying a clean gas into the coating units; and   a pit portion formed laterally of the coating units and extending vertically;   wherein the pit portion accommodates the gas supply pipe extending vertically, and at least one of treating solution piping or electric wiring.   
     
     
         9 . The apparatus according to  claim 1 , further comprising:
 a gas exhaust pipe for exhausting gas from the coating units; and   a pit portion formed laterally of the coating units and extending vertically;   wherein the pit portion accommodates the gas exhaust pipe extending vertically, and at least one of treating solution piping or electric wiring.   
     
     
         10 . The apparatus according to  claim 1 , wherein the first main transport mechanism provided on each of the stories for performing coating treatment of the substrates includes:
 third guide rails;   a fourth guide rail;   a base;   a turntable; and   two holding arms;   wherein the third guide rails are arranged to guide the fourth guide rail vertically;   wherein the fourth guide rail is arranged to guide the base horizontally;   wherein the turntable is mounted on the base to be rotatable about a vertical axis;   wherein the two holding arms are each mounted on the turntable to be horizontally movable for holding the substrates; and   wherein the third guide rails are arranged adjacent to the coating units.   
     
     
         11 . The apparatus according to  claim 1 , further comprising an exhaust unit disposed at a bottom of the transporting space of each of the stories for performing coating treatment of the substrates, for exhausting gas from the transporting space of each of the stories for performing coating treatment of the substrates. 
     
     
         12 . The apparatus according to  claim 1 , wherein:
 the coating units are arranged on one side of the transporting space of each of the stories for performing coating treatment of the substrates; and   the heat-treating units of each of the stories for performing coating treatment of the substrates are arranged on the other side of the transporting space of each of the stories for performing coating treatment of the substrates.   
     
     
         13 . The apparatus according to  claim 1 , further comprising:
 a first gas supply pipe for supplying a clean gas into the transporting space of each of the stories for performing developing treatment of the substrates; and   a second gas supply pipe for supplying the clean gas into the developing units;   wherein the second gas supply pipe has an end thereof connected to the first gas supply pipe.   
     
     
         14 . The apparatus according to  claim 13 , wherein the end of the second gas supply pipe is connected to the first gas supply pipe in a position lower than any one of the stories for performing developing treatment of the substrates. 
     
     
         15 . The apparatus according to  claim 1 , further comprising:
 a first gas exhaust pipe for exhausting gas from the transporting space of each of the stories for performing developing treatment of the substrates; and   a second gas exhaust pipe for exhausting gas from the developing units;   wherein the second gas exhaust pipe has an end thereof connected to the first gas exhaust pipe.   
     
     
         16 . The apparatus according to  claim 1 , further comprising:
 a gas supply pipe for supplying a clean gas into the developing units; and   a pit portion formed laterally of the developing units and extending vertically;   wherein the pit portion accommodates the gas supply pipe extending vertically, and at least one of treating solution piping or electric wiring.   
     
     
         17 . The apparatus according to  claim 1 , further comprising:
 a gas exhaust pipe for exhausting gas from the developing units; and   a pit portion formed laterally of the developing units and extending vertically;   wherein the pit portion accommodates the gas exhaust pipe extending vertically, and at least one of treating solution piping or electric wiring.   
     
     
         18 . The apparatus according to  claim 1 , wherein the second main transport mechanism provided on each of the stories for performing developing treatment of the substrates includes:
 third guide rails;   a fourth guide rail;   a base;   a turntable; and   two holding arms;   wherein the third guide rails are arranged to guide the fourth guide rail vertically;   wherein the fourth guide rail is arranged to guide the base horizontally;   wherein the turntable is mounted on the base to be rotatable about a vertical axis;   wherein the two holding arms are each mounted on the turntable to be horizontally movable for holding the substrates; and   wherein the third guide rails are arranged adjacent to the developing units.   
     
     
         19 . The substrate treating apparatus according to  claim 1 , further comprising an exhaust unit disposed at a bottom of the transporting space of each of the stories for performing developing treatment of the substrates, for exhausting gas from the transporting space of each of the stories for performing developing treatment of the substrates. 
     
     
         20 . The apparatus according to  claim 1 , wherein:
 the developing units are arranged on one side of the transporting space of each of the stories for performing developing treatment of the substrates; and   the heat-treating units of each of the stories for performing developing treatment of the substrates are arranged on the other side of the transporting space of each of the stories for performing developing treatment of the substrates.