Non-contact angle measuring apparatus, mission critical inspection apparatus, non-invasive diagnosis/treatment apparatus, method for filtering matter wave from a composite particle beam, non-invasive measuring apparatus, apparatus for generating a virtual space-time lattice, and fine atomic clock

Abstract

A non-contact angle measuring apparatus includes a matter-wave and energy (MWE) particle source and a detector. The MWE particle source is used for generating boson or fermion particles. The detector is used for detecting a plurality peaks or valleys of an interference pattern generated by 1) the boson or fermion particles corresponding to a slit, a bump, or a hole of a first plane and 2) matter waves' wavefront-split associated with the boson or fermion particles reflected by a second plane, wherein angular locations of the plurality peaks or valleys of the interference pattern, a first distance between a joint region of the first plane and the second plane, and a second distance between the detector and the slit are used for deciding an angle between the first plane and the second plane.

What is claimed is: 
     
         1 . A non-contact angle measuring apparatus, comprising:
 a matter-wave and energy (MWE) particle source for generating boson or fermion particles; and   a detector for detecting a plurality peaks or valleys of an interference pattern generated by the boson or fermion particles corresponding to a slit, a bump, or a hole of a first plane and matter waves associated with the boson or fermion particles reflected by a second plane, wherein angular locations of the plurality peaks or valleys of the interference pattern, a first distance between a joint region of the first plane and the second plane, and a second distance between the detector and the slit are used for deciding an angle between the first plane and the second plane.   
     
     
         2 . The non-contact angle measuring apparatus of  claim 1 , wherein the second plane is composed of transparent materials, dark materials, dielectric materials, semi-conductive materials, or conductive materials. 
     
     
         3 . The non-contact angle measuring apparatus of  claim 1 , wherein the angle is defined by the joint region of the first plane and the second plane. 
     
     
         4 . The non-contact angle measuring apparatus of  claim 1 , wherein the boson or fermion particles emitted by the matter-wave and energy particle source are associated with one or more equivalent MW wavelengths, wherein the one equivalent wavelength is in between 0.1 to 400 nm. 
     
     
         5 . The non-contact angle measuring apparatus of  claim 4 , wherein the slit has a short side length dimension with a third distance, and the one equivalent wave length is less than 1/10˜ 1/20 of the first distance or less than ⅕˜ 1/10 of the third distance. 
     
     
         6 . The non-contact angle measuring apparatus of  claim 4 , wherein the slit has a short side length dimension with a third distance, and the more equivalent wavelengths are less than 1/10˜ 1/20 of the first distance or less than ⅕- 1/10 of the third distance. 
     
     
         7 . The non-contact angle measuring apparatus of  claim 1 , wherein the matter-wave and energy particle source placed at a first side of the first plane, the detector placed at a second side of the first plane, and the second side of the first plane is opposite to the first side of the first plane. 
     
     
         8 . The non-contact angle measuring apparatus of  claim 1 , wherein the angle is between 15 to 165 degrees, and the detector is located on a third plane or along an arc line directions. 
     
     
         9 . The non-contact angle measuring apparatus of  claim 1 , wherein the non-contact angle measuring apparatus operates in a partial vacuum and low humidity environment. 
     
     
         10 . The non-contact angle measuring apparatus of  claim 1 , wherein the first plane is placed along a first direction and the second plan is placed along a second direction, wherein the second direction is different from the first direction. 
     
     
         11 . A mission critical inspection apparatus, comprising:
 an MWE particle source for emitting particles, wherein the particles comprise a first particle beam and a second particle beam;   a beam splitter for making MW of a first particle beam and MWE of a second particle beam toward a first path, and making MW of the second particle beam and MWE of the first particle beam toward a second path;   an MW filter located at the first path for tilting the MWE of the second particle beam and let the MW of the first particle beam passing through the first path to hit a sample, wherein the MWE of the first particle beam and the MW of the first particle beam being reflected from or transmitted through the sample are used forming an interference pattern; and   a detector for detecting a plurality of peaks or valleys of the interference pattern.   
     
     
         12 . The mission critical inspection apparatus of  claim 11 , further comprising:
 a source lens for making the particles being parallel movement particles.   
     
     
         13 . The mission critical inspection apparatus of  claim 11 , further comprising:
 a first mirror located at the first path for reflecting the MW of the first particle beam to the sample;   a first phase compensator located at the first path for compensating a temporal or spatial phase of the reflected MW of the first particle beam; and   an object lens located between the first mirror and the sample for focusing the MW of the first particle beam on the sample.   
     
     
         14 . The mission critical inspection apparatus of  claim 11 , further comprising:
 a second mirror located at the second path for reflecting the MWE of the first particle beam; and   a second phase compensator located at the second path for compensating a temporal or spatial phase of the MWE of the first particle beam.   
     
     
         15 . The mission critical inspection apparatus of  claim 11 , further comprising:
 a display and signal processing unit coupled to the detector for processing and displaying the image of interference pattern detected by the detector to generate a 2D or 3D image.   
     
     
         16 . The mission critical inspection apparatus of  claim 15 , wherein the display and signal processing unit comprising:
 a display; and   a computing unit for processing and displaying the interference pattern to generate the 2D or 3D image to the display;   wherein the display displays the 2D or 3D image.   
     
     
         17 . The mission critical inspection apparatus of  claim 11 , wherein the MW filter tilts the MWE of the second particle beam when a voltage bias condition is applied to the MW filter. 
     
     
         18 . The mission critical inspection apparatus of  claim 11 , wherein the MWE of the first particle beam and the reflected MW of the first particle beam from the sample form the interference pattern via an interaction with the beam splitter. 
     
     
         19 . The mission critical inspection apparatus of  claim 11 , wherein the particles emitted from the MWE particle source are associated with one or more equivalent wavelengths, wherein the MWE particle source forms a continuous beam of particles, temporal- or spatial-multiplexed beam of particles via a time-domain or spatial-domain multiplexer. 
     
     
         20 . The mission critical inspection apparatus of  claim 19 , wherein the one or more equivalent wavelengths is shorter than about 1-10 nm. 
     
     
         21 . The mission critical inspection apparatus of  claim 19 , wherein one edge dimension of the beam splitter is larger than 10,000 to 20,000 times the one or more equivalent wavelengths. 
     
     
         22 . The mission critical inspection apparatus of  claim 11 , wherein the particles emitted by the MWE particle source are coherent and associated with a single wavelength or a plurality of wavelengths. 
     
     
         23 . The mission critical inspection apparatus of  claim 11 , wherein the particles emitted by the MWE particle source are partially coherent and associated with a single wavelength or a plurality of wavelengths. 
     
     
         24 . The mission critical inspection apparatus of  claim 11 , wherein the MW filter is further coated with one or more layers of anti-reflection coating to reduce scattered residual MW or MWE interference effects, and to reduce imaging defect due to a surface of the MW filter being not orthogonal to an incident direction of the MWE of the second particle beam. 
     
     
         25 . The mission critical inspection apparatus of  claim 11 , wherein the particles are fermion particles when the MWE particle source is a fermion particle source associated with one or more equivalent wavelength, wherein the MWE particle source forms a continuous beam of particles, temporal- or spatial-multiplexed beam of particles via a time-domain or spatial-domain multiplexer. 
     
     
         26 . The mission critical inspection apparatus of  claim 25 , further comprising:
 a fermion condense/scan module for making the particles being parallel movement particles.   
     
     
         27 . The mission critical inspection apparatus of  claim 11 , wherein the mission critical inspection apparatus is a part of precision overlay measurement or alignment system. 
     
     
         28 . The mission critical inspection apparatus of  claim 11 , wherein the mission critical inspection apparatus is a part of semiconductor wafer, packaged integrated circuit (IC) or mask inspection/repairing systems. 
     
     
         29 . The mission critical inspection apparatus of  claim 11 , wherein a part of the mission critical inspection apparatus operates in a partial vacuum and low humidity environment 
     
     
         30 . A non-invasive diagnosis/treatment apparatus, comprising:
 an MWE particle source for emitting particles, wherein the particles comprises a first particle beam and a second particle beam;   a first beam splitter for making MW of a first particle beam and MWE of a second particle beam toward a first path, and making MW of the second particle beam and MWE of the first particle beam toward a second path;   an MW filter located at the first path for tilting the MWE of the second particle beam and let the MW of the first particle beam transmit a sample located on the first path;   a second beam splitter for outputting an interference pattern, wherein the interference pattern is comprised of transmitting MW of the first particle beam from the sample and the MWE of the first particle beam; and   a first detector for detecting a plurality of peaks or valleys of the first interference pattern.   
     
     
         31 . The non-invasive diagnosis/treatment apparatus of  claim 30 , further comprising:
 a wave-plate or polarization unit, wherein the wave-plate or the polarization unit is used for adjusting polarization direction of the particles.   
     
     
         32 . The non-invasive diagnosis/treatment apparatus of  claim 30 , further comprising:
 a second detector for detecting a plurality of peaks or valleys of the second interference pattern.   
     
     
         33 . The non-invasive diagnosis/treatment apparatus of  claim 30 , wherein the second beam splitter further outputs a second interference pattern, wherein the second interference pattern is composed of the transmitting MW of the first particle beam from the sample and the MWE of the first particle beam, and the second interference pattern is conjugate to the first interference pattern. 
     
     
         34 . A method for filtering matter wave (MW) from a composite particle beam:
 obtaining the composite particle beam from a first particle path comprising an MWE particle component and an MW component, wherein the MW component is not corresponding to the MWE particle component;   directing the composite particle beam toward a unit having a distribution of a non-uniform spatial field;   tilting the MWE particle component of the composite particle beam toward a second path away from the first path;   generating an output beam of the MW component along the first path going through the non-uniform spatial field; and   receiving the output beam of the MW component for processing a following step.   
     
     
         35 . The method of  claim 34 , wherein the following step comprising getting mixed with another coherent beam of MWE particle component to form an interference pattern, wherein the interference pattern is detectable by a detector. 
     
     
         36 . The method of  claim 34 , wherein the non-uniform spatial field comprises at least one of the materials or structures characterized with having non-uniform electric or magnetic field by forming the non-uniform spatial field. 
     
     
         37 . The method of  claim 34 , wherein the non-uniform spatial field comprising a method of at least one of the material or structure which is characterized with having the tilting action for the MWE particle component of the composite particle beam. 
     
     
         38 . The method of  claim 34 , wherein the non-uniform spatial field comprising a non-uniform electric field or structure and is characterized with having the tilting action for a boson MWE particle component of the composite particle beam, or the non-uniform spatial field comprises a non-uniform magnetic field or structure and is characterized with having the tilting action for a fermion MWE particle component of the composite particle beam. 
     
     
         39 . A non-invasive measuring apparatus, comprising:
 an MWE particle source for emitting MWE particles, wherein the particles at least comprises a first particle beam toward a first path and a second particle beam toward a second path;   an MW filter located at the first path for tilting an MWE of the second particle beam and let an MW wavefront of the first particle beam transmit a sample located on the first path;   an entanglement device for coupling an interaction between the MW wavefront of the first particle beam and an MWE of the first particle beam emitted toward the second path to generate an interference pattern; and   a detector for detecting the interference pattern.   
     
     
         40 . The non-invasive measuring apparatus of  claim 39 , wherein the particles are associated with one equivalent wave length or more equivalent wave lengths and the one equivalent wave length is shorter than about 0.1 to 10 nm. 
     
     
         41 . The non-invasive measuring apparatus of  claim 40 , wherein one edge of the entanglement device is larger than 10 times to 20 times the one equivalent wave length or the more equivalent wave lengths. 
     
     
         42 . The non-invasive measuring apparatus of  claim 39 , wherein the detector detects a plurality of temporal/spatial phase shifts, or a plurality of peaks or valleys of the interference pattern through a mechanism including fluorescent, exposure film, or particle multiplication methods. 
     
     
         43 . The non-invasive measuring apparatus of  claim 39 , wherein when the MWE particle source is a boson source, the entanglement unit comprises an optical bi-prism, and when the MWE particle source is a fermion source, the entanglement unit comprises magnetic/electric bi-prism. 
     
     
         44 . The non-invasive measuring apparatus of  claim 39 , further comprising:
 an MWE detector for monitoring intensity of MWE of the first particle beam tilted from the first path.   
     
     
         45 . The non-invasive measuring apparatus of  claim 39 , wherein when the MWE particle source is a fermion source, the MWE particle source comprises a plurality or array of Field Emission (FE) tips, wherein each of the FE tips is coupled with a plurality of bias voltages and electrodes to select desired QM spins states for each FE tips to forming a selected QM spin configurations for each groups of the particles. 
     
     
         46 . An apparatus for generating a virtual space-time lattice, comprising:
 an MWE particle source for emitting particles; and   an MW filter for receiving the particles and generating a plurality of coherent MW of particle beams, wherein the plurality of coherent MW of particle beams is used for forming the virtual space-time lattice in an enclosed space, and the MWE particle source along with the MW filter shrinks a size of the virtual space-time lattice by a plurality cycles of shortening or extending the wave lengths of the plurality of coherent MW of particle beams to cool down a sample captured by the virtual space-time lattice.   
     
     
         47 . The apparatus of  claim 46 , wherein the plurality of coherent MW of particle beams are temporal coherent MW of particle beams, or spatial coherent MW of particle beams. 
     
     
         48 . The apparatus of  claim 46 , wherein the virtual space-time lattice is one-dimensional space, two-dimensional space, or three-dimensional space. 
     
     
         49 . A fine atomic clock, comprising:
 an MWE particle source for emitting particles;   an MW filter for receiving the particles and generating a plurality of coherent MW of particle beams, wherein the plurality of coherent MW of particle beams is used for forming a virtual space-time lattice in an enclosed space;   an atomic gun for emitting a sample;   an MMT unit for utilizing a magnetic field to trap the sample in the virtual space-time lattice, and utilizing the plurality of coherent MW of particle beams to cool down the sample, wherein the sample corresponds to fermion particles or Molecules;   an energy injection unit for injecting energy into the sample to activate the sample into an excitation state; and   a probing unit for activating emission of the sample, wherein an emission frequency of the sample corresponding to a characteristic emission frequency of the sample, and the emission frequency is utilized to generate a standard time signal.   
     
     
         50 . The fine atomic clock of  claim 49 , further comprising:
 an emission detector for detecting and outputting the emission frequency or phase property of the sample;   a reference cell for providing a reference frequency or phase property;   a differential amplifier unit to sense the difference of the emission detector output property and the reference property providing by the reference cell;   a phase-sensitive detector unit;   a frequency modulation oscillator;   a voltage-controlled crystal oscillator;   a frequency synthesizer; and   a frequency stabilized output unit;   wherein the differential amplifier, the frequency modulation oscillator, the phase-sensitive detector unit, the voltage-controlled crystal oscillator, and the frequency synthesizer co-work together and are characterized as a feedback loop to lock into a stable state which can deliver a frequency stabilized output signal to the frequency stabilized output unit, and the frequency stabilized output unit outputs the standard time signal.   
     
     
         51 . The fine atomic clock of  claim 50 , wherein the standard time signal corresponding to 1 second. 
     
     
         52 . The fine atomic clock of  claim 50 , wherein the emission detector, the MMT unit, the energy injection unit, the probing unit, and the atomic gun are located in a partial vacuum, low humidity, enclosed chamber.