Permanent magnetic chuck for oled mask chucking

Abstract

A permanent magnetic mask chuck is described herein. The permanent magnetic mask chuck includes a body with a plurality of permanent magnets positioned therein. The permanent magnets can then deliver a magnetic force to a mask to position and hold the mask over or on the substrate for further deposition.

What is claimed is: 
     
         1 . A processing system comprising:
 a process chamber configured to deposit a material on the substrate; and   a permanent magnetic mask chuck positioned in the process chamber, the permanent magnetic mask chuck comprising:
 a positioning device; 
 a plurality of permanent magnets coupled to the positioning device, the positioning device configured to control a magnitude of magnetic force provided to the mask such that the mask is magnetically chucked in position over the substrate. 
   
     
     
         2 . The processing system of  claim 1 , wherein the positioning device is configured to move the permanent magnets in a sequential fashion. 
     
     
         3 . The processing system of  claim 2 , wherein the positioning device is operable to position permanent magnets in a center portion of the permanent magnetic mask chuck closer to the mask relative to permanent magnets in a peripheral portion of the permanent magnetic mask chuck. 
     
     
         4 . The processing system of  claim 2 , wherein a magnetic field produced by the permanent magnets is greater in a center portion of the permanent magnetic mask chuck relative to a peripheral portion of the permanent magnetic mask chuck. 
     
     
         5 . The processing system of  claim 1 , wherein the positioning device is operable to position permanent magnets at one side of the permanent magnetic mask chuck closer to the mask relative to permanent magnets at an opposite side of the permanent magnetic mask chuck. 
     
     
         6 . The processing system of  claim 1 , further comprising:
 a support base for supporting a substrate, the support base comprising an electrode assembly configured to generate an electrostatic substrate chucking force, the electrode assembly and support base forming a unitary body configured for transport into and out of the processing chamber.   
     
     
         7 . The processing system of  claim 6 , wherein the electrode assembly comprises:
 a plurality of distributed electrodes, the plurality of distributed electrodes further comprises interleaving a first electrode with a second electrode.   
     
     
         8 . A method for chucking a mask in a process chamber, the method comprising:
 transferring a substrate disposed on a substrate supporting surface of a substrate carrier into a process chamber;   moving a magnetic chuck towards the substrate supporting surface such that a plurality of permanent magnets of the magnetic chuck a mask to the substrate disposed on the substrate carrier; and   depositing a layer through the mask onto the substrate.   
     
     
         9 . The method of  claim 8 , wherein the moving the magnetic chuck toward the substrate supporting surface further comprises moving magnetic chuck towards the substrate carrier. 
     
     
         10 . The method of  claim 9 , moving the magnetic chuck toward the substrate supporting surface further comprises moving the permanent magnets closer to a first region of the substrate supporting surface relative to a second region of the substrate supporting surface. 
     
     
         11 . The method of  claim 9 , wherein the plurality of permanent magnets are disposed within the substrate carrier. 
     
     
         12 . The method of  claim 11 , wherein the magnetic chuck is remote from the substrate carrier.