B2f4 manufacturing process

Abstract

A reaction system and method for preparing compounds or intermediates from solid reactant materials is provided. In a specific aspect, a reaction system and methods are provided for preparation of boron-containing precursor compounds useful as precursors for ion implantation of boron in substrates. In another specific aspect, a reactor system and methods are provided for manufacture of boron precursors such as B2F4.

1 .- 31 . (canceled) 
     
     
         32 . A method of forming B 2 F 4  comprising:
 reacting BF 3  gas and boron-containing solids to form a first gaseous mixture comprising BF and unreacted BF 3  gas;   cooling the first gaseous mixture under temperature and pressure conditions effective to condense the first gaseous mixture to form a first condensed product;   volatilizing the first condensed product to form a second gaseous mixture comprising B 2 F 4  and BF 3 ;   cooling the second gaseous mixture under temperature and pressure conditions effective to condense the second gaseous mixture to form a second condensed product and a third gaseous mixture comprising B 2 F 4  and BF 3 ;   filtering the third gaseous mixture to remove particulates; and   recovering B 2 F 4  from the third gaseous mixture.   
     
     
         33 . The method of  claim 32 , further comprising, when the second condensed product comprises unwanted B x F y  species, removing the B x F y  species from the second condensed product by reacting the B x F y  species with an active compound selected from XeF 2 , F 2 , NF 3 , O 2  or O 3 , to form a residue, and mechanically removing the residue. 
     
     
         34 . The method of  claim 32 , further comprising, when the second condensed product comprises B x F y  species, removing the B x F y  species from the second condensed product by reacting the B x F y  species with an active compound selected from XeF 2 , F 2 , NF 3 , O 2  or O 3 , to form a residue, and reacting the residue with a halogen-containing agent to volatilize the residue.