US2019165108A1PendingUtilityA1
Reconstituted wafer structure
Est. expiryNov 30, 2037(~11.4 yrs left)· nominal 20-yr term from priority
H10W 74/40H10W 72/60H10W 70/635H10W 70/611H10W 42/20H10W 44/251H10W 44/20H10W 76/60H10W 76/12H10W 95/00H10W 70/68H05K 3/3426H05K 1/183H01L 23/552H01L 23/29H01L 29/20H01L 23/4822H01L 23/5384H10D 62/85
42
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Claims
Abstract
A reconstituted wafer includes a plurality of apertures defined in a first substrate. A module is positioned in each aperture and coupled to circuit traces on the first substrate by operation of beam leads extending from the module. A second substrate is positioned over the first substrate and each module is hermetically sealed in a space defined by the respective aperture and the second substrate. One or more vias are provided to access I/O signals at a surface of the first or second substrates. The modules may include an invariant die where different technologies are stacked together.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A wafer structure comprising:
a first planar structure having a plurality of apertures defined therein; at least one module positioned with respect to one of the apertures, the at least one module having a plurality of beam leads coupled to the first planar structure; and a second planar structure disposed on a first surface of the first planar structure to define a closed space about the at least one module, wherein the at least one module comprises:
a first circuit layer; and
a second circuit layer coupled to the first circuit layer,
wherein at least one of the first and second circuit layers is coupled to at least one of the plurality of beam leads.
2 . The wafer structure of claim 1 , wherein:
the first circuit layer is manufactured by a first type of manufacturing process; and the second circuit layer is manufactured by a second type of manufacturing process different from the first type of manufacturing process.
3 . The wafer structure of claim 1 , wherein the closed space is hermetically sealed.
4 . The wafer structure of claim 1 , wherein the at least one module comprises:
a lid; and at least one mode suppression circuit disposed in the lid.
5 . The wafer structure of claim 4 , wherein the at least one mode suppression circuit comprises a plurality of active elements configured to form an active electronic band gap circuit.
6 . The wafer structure of claim 5 , wherein the suppression circuit further comprises at least one resistor and at least one transistor,
whereby the at least one mode suppression circuit provides dynamic mode suppression.
7 . The wafer structure of claim 4 , wherein the at least one mode suppression circuit comprises:
a plurality of passive elements configured to form a passive electronic band gap surface; and at least one cavity, whereby the at least one mode suppression circuit provides passive mode suppression.
8 . The wafer structure of claim 7 , wherein each passive element comprises:
a cell structure comprising:
a top layer comprising an electrically conductive pad;
a middle layer comprising a plurality of electrically resistive pads;
a lower layer comprising electrically conductive material; and
a via electrically coupling the top layer electrically conductive pad to the lower layer electrically conductive material.
9 . The wafer structure of claim 8 , wherein each electrically conductive pad comprises Au.
10 . The wafer structure of claim 8 , wherein each electrically resistive pad comprises NiCr.
11 . The wafer structure of claim 8 , wherein the electrically conductive material comprises Au.
12 . The wafer structure of claim 1 , further comprising:
a suspended stripline structure coupling the at least one of the first and second circuit layers to the at least one of the plurality of beam leads.
13 . The wafer structure of claim 12 , wherein the suspended stripline structure comprises:
a first conductive layer; a second conductive layer spaced apart from the first conductive layer; and a plurality of vias electrically coupling the first conductive layer to the second conductive layer.
14 . The wafer structure of claim 13 , wherein the suspended stripline structure further comprises:
an air space disposed between the first and second conductive layers.
15 . The wafer structure of claim 13 , wherein the suspended stripline structure further comprises:
a first conductive trace provided on the first conductive layer; and a second conductive trace provided on the second conductive layer, wherein the plurality of vias electrically couple the first conductive trace to the second conductive trace.
16 . The wafer structure of claim 13 , wherein the suspended stripline structure further comprises:
a cover layer defining a first cavity disposed adjacent the first conductive layer; and a base layer defining a second cavity disposed adjacent the second conductive layer.
17 . The wafer structure of claim 16 , wherein each of the cover and base layers comprises a low-loss dielectric material.
18 . The wafer structure of claim 16 , wherein the first and second cavities are longitudinally aligned with one another.
19 . The wafer structure of claim 18 , wherein the plurality of vias are arranged in alignment with the first and second cavities.
20 . A device, comprising:
a first planar structure having a first surface; a first aperture defined in the first surface of the first planar structure; a first module having a plurality of co-planar leads extending therefrom, wherein the plurality of co-planar leads is coupled to the first surface of the first planar structure to position the first module in the first aperture; a second planar structure disposed on the first surface of the first planar structure, wherein a closed space is defined about the first module by the first and second planar structures and the first aperture.
21 . The device of claim 20 , further comprising:
at least one signal path trace disposed on the first planar structure, wherein at least one of the co-planar leads is coupled to the at least one signal path trace.
22 . The device of claim 20 , further comprising:
a first signal path trace disposed on the first planar structure; a second signal path trace disposed on the second planar structure; and a via disposed in the second planar structure, the via coupled to the second signal path trace, wherein the via is coupled to a node on the first signal path trace, and wherein at least one of the co-planar leads is coupled to the at least one signal path trace.
23 . The device of claim 22 , wherein the closed space is hermetically sealed.
24 . The device of claim 20 , wherein the first module comprises:
a lid; and at least one mode suppression circuit disposed in the lid.
25 . The device of claim 24 , wherein the at least one mode suppression circuit comprises a plurality of active elements configured to form an active electronic band gap circuit.
26 . The device of claim 25 , wherein the suppression circuit further comprises at least one resistor and at least one transistor,
whereby the at least one mode suppression circuit provides dynamic mode suppression.
27 . The device of claim 24 , wherein the at least one mode suppression circuit comprises:
a plurality of passive elements configured to form a passive electronic band gap surface; and at least one cavity, whereby the at least one mode suppression circuit provides passive mode suppression.
28 . The device of claim 27 , wherein each passive element comprises:
a cell structure comprising:
a top layer comprising an electrically conductive pad;
a middle layer comprising a plurality of electrically resistive pads;
a lower layer comprising electrically conductive material; and
a via electrically coupling the top layer electrically conductive pad to the lower layer electrically conductive material.
29 . The device of claim 28 , wherein each electrically conductive pad comprises Au.
30 . The device of claim 28 , wherein each electrically resistive pad comprises NiCr.
31 . The device of claim 28 , wherein the electrically conductive material comprises Au.
32 . The device of claim 20 , wherein the first module comprises:
a first circuit layer; and a second circuit layer coupled to the first circuit layer, wherein at least one of the first and second circuit layers is coupled to at least one of the co-planar leads.
33 . The device of claim 32 , wherein the first and second circuit layers are electrically and mechanically coupled to one another.
34 . The device of claim 32 , wherein at least one of the first and second circuit layers is electrically coupled to at least one of the co-planar leads.
35 . The device of claim 32 , wherein:
the first circuit layer is manufactured by a first type of manufacturing process; and the second circuit layer is manufactured by a second type of manufacturing process different from the first type of manufacturing process.
36 . The device of claim 32 , further comprising:
a suspended stripline structure coupling the at least one of the first and second circuit layers to the at least one of the plurality of beam leads.
37 . The device of claim 36 , wherein the suspended stripline structure comprises:
a first conductive layer; a second conductive layer spaced apart from the first conductive layer; and a plurality of vias electrically coupling the first conductive layer to the second conductive layer.
38 . The device of claim 37 , wherein the suspended stripline structure further comprises:
an air space disposed between the first and second conductive layers.
39 . The device of claim 37 , wherein the suspended stripline structure further comprises:
a first conductive trace provided on the first conductive layer; and a second conductive trace provided on the second conductive layer, wherein the plurality of vias electrically couple the first conductive trace to the second conductive trace.
40 . The device of claim 37 , wherein the suspended stripline structure further comprises:
a cover layer defining a first cavity disposed adjacent the first conductive layer; and a base layer defining a second cavity disposed adjacent the second conductive layer.
41 . The device of claim 40 , wherein each of the cover and base layers comprises a low-loss dielectric material.
42 . The device of claim 40 , wherein the first and second cavities are longitudinally aligned with one another.
43 . The device of claim 42 , wherein the plurality of vias are arranged in alignment with the first and second cavities.Cited by (0)
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