Chemical Mechanical Polishing (CMP) of Cobalt-Containing Substrate

Abstract

Chemical mechanical polishing (CMP) compositions, methods and systems for polish cobalt or cobalt-containing substrates are provided. Dual, or at least two chelators were used in the CMP polishing compositions as complexing agents for achieving the unique synergetic effects to afford high, tunable Co removal rates and with low static etch rates on Co film surface for the efficient Co corrosion protection during CMP process. The cobalt chemical mechanical polishing compositions also provide very high selectivity of Co film vs. other barrier layers, such as Ta, TaN, Ti, and TiN, and dielectric film, such as TEOS, SiNx, low-k, and ultra low-k films.

1 . A chemical mechanical polishing (CMP) polishing composition for cobalt-containing substrate, consisting essentially of:
 0.005 wt. % to 25 wt. % of an abrasive;   0.05 wt. % to 10 wt. % of at least two chelators selected from the group consisting of glycine, alanine selected from the group consisting of DL-Alanine, D-Alanine, and L-Alanine, and combinations thereof;   water; and   at least one selected from the group consisting of:   0.0005 wt. % to 0.25 wt. % of a chemical additive as corrosion inhibitor or a defect reducing agent;   0.005 wt. % to 0.5 wt. % of a pH adjusting agent;   0.1 wt. % to 10 wt. % of an oxidizing agent;   0.0001 wt. % to 0.10 wt. % of biocide; and   0.0005 wt. % to 0.15 wt. % of a surfactant;   wherein the chemical mechanical polishing (CMP) polishing composition having a pH from 3.5 to 8.5.   
     
     
         2 . The chemical mechanical polishing (CMP) polishing composition for cobalt-containing substrate of  claim 1 , wherein the abrasive is selected from the group consisting of nano-sized colloidal silica or colloidal silica particles; nano-sized inorganic metal oxide particles selected from the group consisting of alumina, titania, zirconia, ceria and combinations thereof; nano-sized diamond particles; nano-sized silicon nitride particles; mono-modal, bi-modal, or multi-modal colloidal abrasive particles; organic polymer-based soft abrasives; surface-coated or modified abrasives; and combinations thereof. 
     
     
         3 . The chemical mechanical polishing (CMP) polishing composition for cobalt-containing substrate of  claim 1 , wherein
 the corrosion inhibitor is selected from the group consisting of 1,2,4-triazole and its derivatives, benzotriazole and its derivatives, 1,2,3-triazole and its derivatives, pyrazole and its derivatives, imidazole and its derivatives, benzoimidazole and its derivatives, benzoimidazole and its derivatives, isocyanurate and its derivatives, and mixtures thereof.   
     
     
         4 . The chemical mechanical polishing (CMP) polishing composition for cobalt-containing substrate of  claim 1 , wherein
 the pH adjusting agent is selected from the group consisting of nitric acid, hydrochloric acid, sulfuric acid, phosphoric acid, sodium hydride, potassium hydroxide, ammonium hydroxide, tetraalkylammonium hydroxide, organic amines, and mixtures thereof.   
     
     
         5 . The chemical mechanical polishing (CMP) polishing composition for cobalt-containing substrate of  claim 1 , wherein
 the oxidizing agent is selected from the group consisting of periodic acid, hydrogen peroxide, potassium iodate, potassium permanganate, ammonium persulfate, ammonium molybdate, ferric nitrate, nitric acid, potassium nitrate, and mixtures thereof.   
     
     
         6 . The chemical mechanical polishing (CMP) polishing composition for cobalt-containing substrate of  claim 1 , wherein
 the biocide is selected from the group consisting of methylisothiazolinone, methylchloroisothiazolinone, and quaternary ammonium compound selected from the group consisting of tetramethylammonium chloride, tetraethylammonium chloride, tetrapropylammonium chloride, alkylbenzyldimethylammonium chloride and alkylbenzyldimethylammonium hydroxide, wherein the alkyl chain ranges from 1 to about 20 carbon atoms; chloro-containing compound selected from the group consisting of chlorite and sodium hypochlorite; biguanide; aldehyde; ethylene oxide; metallic salt, isothiazolinone; indophor; and combinations thereof.   
     
     
         7 . The chemical mechanical polishing (CMP) polishing composition for cobalt-containing substrate of  claim 1 , wherein
 the surfactant is selected from the group consisting of non-ionic surfactant selected from the group consisting of alcohol ethoxylates, acetylenic diol surfactants, and combinations thereof; anionic surfactant selected from the group consisting of secondary alkane sulfonates, dodecyl sulfate, sodium salt, lauryl sulfate, potassium salt, and combinations thereof; cationic surfactant selected from the group consisting of quaternary ammonium based surfactant; and amphoteric surfactant selected from the group consisting of betaine and amino acid derivatives based surfactant; and   combinations thereof.   
     
     
         8 . The chemical mechanical polishing (CMP) polishing composition for cobalt-containing substrate of  claim 1  consisting essentially of colloidal silica particles; glycine; and alanine selected from the group consisting of DL-Alanine, D-Alanine, and L-Alanine. 
     
     
         9 . The chemical mechanical polishing (CMP) polishing composition for cobalt-containing substrate of  claim 1  consisting essentially of colloidal silica particles; glycine; DL-alanine; methylisothiazolinone; methylchloroisothiazolinone; ethylinediamine; 1,3,5-Tris(2-hydroxyethyl)isocyanurate; 3-amino-1,2,4-triazole; ethoxylated acetylenic diol surfactant; potassium hydroxide; and H 2 O 2 . 
     
     
         10 . A chemical mechanical polishing (CMP) system comprising:
 a semiconductor substrate having a surface containing a first material and at least one second material;
 wherein the first material is Co and the second material is selected from the group consisting of dielectric film, low-k and ultra low-k film, and barrier film; 
   a polishing pad;   a chemical mechanical polishing composition comprising
 0.005 wt. % to 25 wt. % of an abrasive; 
 0.05 wt. % to 10 wt. % of at least two chelators; 
 water; and 
 at least one selected from the group consisting of: 
 0.0005 wt. % to 0.25 wt. % of a chemical additive as corrosion inhibitor or a defect reducing agent; 
 0.005 wt. % to 0.5 wt. % of a pH adjusting agent; 
 0.1 wt. % to 10 wt. % of an oxidizing agent; 
 0.0001 wt. % to 0.10 wt. % of biocide; and 
 0.0005 wt. % to 0.15 wt. % of a surfactant;
 wherein the chemical mechanical polishing (CMP) polishing composition having a pH from 3.5 to 8.5; and the at least two chelators are amino acids independently selected from the group consisting of DL-Alanine, D-Alanine, L-Alanine, Glycine, Serine, Proline, Histidine, Isoleucine, Lysine, Methionine, Phenylalanine, Threonine, Tryptophan, Valine, Asparagine, Aspartic acid, Glutamine, Ornithine, Selenocystein, Tyrosine, Sarcosine, Bicine, Tricine, Aceglutamide, N-Acetylaspartic acid, Acetylcarnitine, Acetylcysteine, N-Acetylglutamic acid, Acetylleucine, Acivicin, S-Adenosyl-L-homocysteine, Agaritine, Alanosine, Aminohippuric acid, L-Arginine ethyl ester, Aspartame, Aspartylglucosamine, Benzylmercapturic acid, Biocytin, Brivanib alaninate, Carbocisteine, N(6)-Carboxymethyllysine, Carglumic acid, Cilastatin, Citiolone, Coprine, Dibromotyrosine, Dihydroxyphenylglycine, Eflornithine, Fenclonine, 4-Fluoro-L-threonine, N-Formylmethionine, Gamma-L-Glutamyl-L-cysteine, 4-(γ-Glutamylamino)butanoic acid, Glutaurine, Glycocyamine, Hadacidin, Hepapressin, Lisinopril, Lymecycline, N-Methyl-D-aspartic acid, N-Methyl-L-glutamic acid, Milacemide, Nitrosoproline, Nocardicin A, Nopaline, Octopine, Ombrabulin, Opine, Orthanilic acid, Oxaceprol, Polylysine, Remacemide, Salicyluric acid, Silk amino acid, Stampidine, Tabtoxin, Tetrazolylglycine, Thiorphan, Thymectacin, Tiopronin, Tryptophan tryptophylquinone, Valaciclovir, Valganciclovir, and combinations thereof; 
 
   wherein Co is a metal inter-connection material; and at least a portion of the surface is in contact with both the polishing pad and the chemical mechanical polishing composition.   
     
     
         11 . The chemical mechanical polishing (CMP) system of  claim 10 , wherein the abrasive is selected from the group consisting of nano-sized colloidal silica or colloidal silica particles; nano-sized inorganic metal oxide particles selected from the group consisting of alumina, titania, zirconia, ceria and combinations thereof; nano-sized diamond particles; nano-sized silicon nitride particles; mono-modal, bi-modal, or multi-modal colloidal abrasive particles; organic polymer-based soft abrasives; surface-coated or modified abrasives; and combinations thereof. 
     
     
         12 . The chemical mechanical polishing (CMP) system of  claim 10 , wherein
 the corrosion inhibitor is selected from the group consisting of 1,2,4-triazole and its derivatives, benzotriazole and its derivatives, 1,2,3-triazole and its derivatives, pyrazole and its derivatives, imidazole and its derivatives, benzoimidazole and its derivatives, benzoimidazole and its derivatives, isocyanurate and its derivatives, and mixtures thereof.   
     
     
         13 . The chemical mechanical polishing (CMP) system of  claim 10 , wherein
 the pH adjusting agent is selected from the group consisting of nitric acid, hydrochloric acid, sulfuric acid, phosphoric acid, sodium hydride, potassium hydroxide, ammonium hydroxide, tetraalkylammonium hydroxide, organic amines, and mixtures thereof.   
     
     
         14 . The chemical mechanical polishing (CMP) system of  claim 10 , wherein
 the oxidizing agent is selected from the group consisting of periodic acid, hydrogen peroxide, potassium iodate, potassium permanganate, ammonium persulfate, ammonium molybdate, ferric nitrate, nitric acid, potassium nitrate, and mixtures thereof.   
     
     
         15 . The chemical mechanical polishing (CMP) system of  claim 10 , wherein
 the biocide is selected from the group consisting of methylisothiazolinone, methylchloroisothiazolinone, quaternary ammonium compound selected from the group consisting of tetramethylammonium chloride, tetraethylammonium chloride, tetrapropylammonium chloride, alkylbenzyldimethylammonium chloride and alkylbenzyldimethylammonium hydroxide, wherein the alkyl chain ranges from 1 to about 20 carbon atoms; chloro-containing compound selected from the group consisting of chlorite and sodium hypochlorite; biguanide; aldehyde; ethylene oxide; metallic salt, isothiazolinone; indophor; and combinations thereof.   
     
     
         16 . The chemical mechanical polishing (CMP) system of  claim 10 , wherein
 the surfactant is selected from the group consisting of non-ionic surfactant selected from the group consisting of alcohol ethoxylates, acetylenic diol surfactants, and combinations thereof; anionic surfactant selected from the group consisting of secondary alkane sulfonates; dodecyl sulfate, sodium salt, lauryl sulfate, potassium salt, and combinations thereof; cationic surfactant selected from the group consisting of quaternary ammonium based surfactant; and amphoteric surfactant selected from the group consisting of betaine and amino acid derivatives based surfactant; and combinations thereof.   
     
     
         17 . The chemical mechanical polishing (CMP) system of  claim 10 , wherein the chemical mechanical polishing composition comprising colloidal silica particles; glycine; and alanine selected from the group consisting of DL-Alanine, D-Alanine, and L-Alanine. 
     
     
         18 . The chemical mechanical polishing (CMP) system of  claim 10 , wherein the chemical mechanical polishing composition comprising colloidal silica particles; glycine; DL-alanine; methylisothiazolinone; methylchloroisothiazolinone; ethylinediamine; 1,3,5-Tris(2-hydroxyethyl)isocyanurate; 3-amino-1,2,4-triazole; ethoxylated acetylenic diol surfactant; potassium hydroxide; and H 2 O 2 .