Inventor · disambiguated record
Xiaobo Shi
Also filed as: SHI XIAOBO
56 granted patents·32 pending applications·105 citations·filing 2001–2023
97Inventor score
Top patents by PatentIndex Score
88 records- 0196US9305806B2Chemical mechanical polishing slurry compositions and method using the same for copper and through-silicon via applicationsAIR PROD & CHEM·Filed 2015·Granted Apr 5, 2016·9 cites·11 claims
- 0289US8974692B2Chemical mechanical polishing slurry compositions and method using the same for copper and through-silicon via applicationsAIR PROD & CHEM·Filed 2013·Granted Mar 10, 2015·5 cites·6 claims
- 0388US10465096B2Metal chemical mechanical planarization (CMP) composition and methods thereforeVERSUM MAT US LLC·Filed 2018·Granted Nov 5, 2019·4 cites·21 claims
- 0488US8999193B2Chemical mechanical polishing composition having chemical additives and methods for using sameAIR PROD & CHEM·Filed 2013·Granted Apr 7, 2015·10 cites·12 claims
- 0587US10032644B2Barrier chemical mechanical planarization slurries using ceria-coated silica abrasivesAIR PROD & CHEM·Filed 2016·Granted Jul 24, 2018·5 cites·18 claims
- 0687US9978609B2Low dishing copper chemical mechanical planarizationAIR PROD & CHEM·Filed 2016·Granted May 22, 2018·6 cites·12 claims
- 0784US10253216B2Additives for barrier chemical mechanical planarizationVERSUM MAT US LLC·Filed 2017·Granted Apr 9, 2019·4 cites·34 claims
- 0884US8008424B2Photovoltaic cell with thiazole-containing polymerKONARKA TECHNOLOGIES INC·Filed 2007·Granted Aug 30, 2011·6 cites·13 claims
- 0981US8058550B2Polymers with low band gaps and high charge mobilityGAUDIANA RUSSELL·Filed 2006·Granted Nov 15, 2011·4 cites·10 claims
- 1080US11078417B2Low oxide trench dishing chemical mechanical polishingVERSUM MAT US LLC·Filed 2019·Granted Aug 3, 2021·2 cites·5 claims
- 1179US11401441B2Chemical mechanical planarization (CMP) composition and methods therefore for copper and through silica via (TSV) applicationsVERSUM MAT US LLC·Filed 2018·Granted Aug 2, 2022·4 cites·2 claims
- 1273US9062230B2Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereofAIR PROD & CHEM·Filed 2014·Granted Jun 23, 2015·2 cites·9 claims
- 1373US8008421B2Photovoltaic cell with silole-containing polymerKONARKA TECHNOLOGIES INC·Filed 2007·Granted Aug 30, 2011·3 cites·18 claims
- 1471US8906123B2CMP slurry/method for polishing ruthenium and other filmsSHI XIAOBO·Filed 2011·Granted Dec 9, 2014·2 cites·10 claims
- 1570US6657224B2Organic light emitting diode devices using thermostable hole-injection and hole-transport compoundsEMAGIN CORP·Filed 2001·Granted Dec 2, 2003·16 cites·79 claims
- 1669US11718767B2Chemical mechanical planarization composition for polishing oxide materials and method of use thereofVERSUM MAT US LLC·Filed 2019·Granted Aug 8, 2023·1 cites·15 claims
- 1769US10109493B2Composite abrasive particles for chemical mechanical planarization composition and method of use thereofAIR PROD & CHEM·Filed 2016·Granted Oct 23, 2018·1 cites·21 claims
- 1868US9224614B2CMP slurry/method for polishing ruthenium and other filmsAIR PROD & CHEM·Filed 2014·Granted Dec 29, 2015·1 cites·10 claims
- 1968US8858819B2Method for chemical mechanical planarization of a tungsten-containing substrateMCCONNELL RACHEL DIANNE·Filed 2011·Granted Oct 14, 2014·4 cites·20 claims
- 2068US8563678B2Photovoltaic cell with thiazole-containing polymerGAUDIANA RUSSELL·Filed 2011·Granted Oct 22, 2013·1 cites·12 claims
- 2167US10669449B2Composite abrasive particles for chemical mechanical planarization composition and method of use thereofVERSUM MAT US LLC·Filed 2018·Granted Jun 2, 2020·0 cites·21 claims
- 2267US8841216B2Method and composition for chemical mechanical planarization of a metalAIR PROD & CHEM·Filed 2013·Granted Sep 23, 2014·2 cites·9 claims
- 2365US9574110B2Barrier chemical mechanical planarization composition and method thereofAIR PROD & CHEM·Filed 2014·Granted Feb 21, 2017·1 cites·11 claims
- 2463US11692110B2Low oxide trench dishing chemical mechanical polishingVERSUM MAT US LLC·Filed 2021·Granted Jul 4, 2023·0 cites·5 claims
- 2563US11667839B2Low oxide trench dishing chemical mechanical polishingVERSUM MAT US LLC·Filed 2021·Granted Jun 6, 2023·0 cites·9 claims
- 2661US10570313B2Dishing reducing in tungsten chemical mechanical polishingAIR PROD & CHEM·Filed 2016·Granted Feb 25, 2020·1 cites·5 claims
- 2761US8252688B2Method and composition for chemical mechanical planarization of a metal or a metal alloySHI XIAOBO·Filed 2009·Granted Aug 28, 2012·1 cites·15 claims
- 2861US2014224331A1Polymers with Low Band Gaps and High Charge MobilityMERCK PATENT GMBH·Filed 2014·Application pending·0 cites
- 2960US9123895B2Photovoltaic cell with thiazole-containing polymerMERCK PATENT GMBH·Filed 2013·Granted Sep 1, 2015·0 cites·18 claims
- 3060US8551887B2Method for chemical mechanical planarization of a copper-containing substrateSHI XIAOBO·Filed 2010·Granted Oct 8, 2013·1 cites·17 claims
- 3158US11104825B2Metal compound chemically anchored colloidal particles and methods of production and use thereofVERSUM MAT US LLC·Filed 2018·Granted Aug 31, 2021·0 cites·8 claims
- 3258US10920106B2Metal chemical mechanical planarization (CMP) composition and methods thereforeVERSUM MAT US LLC·Filed 2019·Granted Feb 16, 2021·0 cites·21 claims
- 3358US8414789B2Method and composition for chemical mechanical planarization of a metalSHI XIAOBO·Filed 2009·Granted Apr 9, 2013·1 cites·8 claims
- 3457US11549034B2Oxide chemical mechanical planarization (CMP) polishing compositionsVERSUM MAT US LLC·Filed 2019·Granted Jan 10, 2023·0 cites·20 claims
- 3556US12091581B2High oxide film removal rate shallow trench (STI) chemical mechanical planarization (CMP) polishingVERSUM MAT US LLC·Filed 2020·Granted Sep 17, 2024·0 cites·6 claims
- 3656US11072726B2Low oxide trench dishing chemical mechanical polishingVERSUM MAT US LLC·Filed 2019·Granted Jul 27, 2021·0 cites·4 claims
- 3756US2025215130A1Polycationic Polymer Or Copolymer Having Different Cation Types For Slurries In Chemical Mechanical PlanarizationMERCK PATENT GMBH·Filed 2023·Application pending·0 cites
- 3855US11326076B2Shallow trench isolation (STI) chemical mechanical planarization (CMP) polishing with low abrasive concentration and a combination of chemical additivesVERSUM MAT US LLC·Filed 2020·Granted May 10, 2022·0 cites·24 claims
- 3955US7449742B2Memory device with active layer of dendrimeric materialSPANSION LLC·Filed 2006·Granted Nov 11, 2008·4 cites·6 claims
- 4055US2019172720A1Chemical Mechanical Polishing (CMP) of Cobalt-Containing SubstrateVERSUM MAT US LLC·Filed 2019·Application pending·0 cites
- 4154US10011741B2Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereofAIR PROD & CHEM·Filed 2016·Granted Jul 3, 2018·0 cites·8 claims
- 4254US8859428B2Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereofAIR PROD & CHEM·Filed 2013·Granted Oct 14, 2014·0 cites·8 claims
- 4354US2024425723A1Pad-in-a-bottle chemical mechanical planarization polishing with cost-effective non-porous solid polishing padsVERSUM MAT US LLC·Filed 2022·Application pending·0 cites
- 4454US2025014911A1Pad-in-a-bottle and single platen chemical mechanical-planarization for back-end applicationsVERSUM MAT US LLC·Filed 2022·Application pending·0 cites
- 4554US2024395558A1Chemical Mechanical Planarization Polishing For Shallow Trench IsolationVERSUM MAT US LLC·Filed 2022·Application pending·0 cites
- 4653US11608451B2Shallow trench isolation (STI) chemical mechanical planarization (CMP) polishing with tunable silicon oxide and silicon nitride removal ratesVERSUM MAT US LLC·Filed 2020·Granted Mar 21, 2023·0 cites·18 claims
- 4753US2024352279A1Pad-in-a-bottle (pib) technology for copper barrier slurriesVERSUM MAT US LLC·Filed 2022·Application pending·0 cites
- 4853US2024247090A1Imidazolium-based poly(ionic liquid)s and use thereforeVERSUM MAT US LLC·Filed 2022·Application pending·0 cites
- 4953US2010180944A1Polymers with low band gaps and high charge mobilityKONARKA TECHNOLOGIES INC·Filed 2010·Application pending·0 cites
- 5053US2007020526A1Polymers with low band gaps and high charge mobilityGAUDIANA RUSSELL·Filed 2006·Application pending·0 cites
Showing the top 50 of 88 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →