Coating compositions for use with an overcoated photoresist

Abstract

Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more uracil moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.

What is claimed is: 
     
         1 . A coated substrate comprising:
 (a) a layer of a coating composition on a substrate, the coating composition comprising a component that comprises one or more uracil moieties; and   (b) a photoresist layer over the coating composition layer.   
     
     
         2 . The substrate of  claim 1  wherein the component that comprises the one or more uracil moieties is a resin. 
     
     
         3 . The substrate of  claim 2  wherein the resin comprises polyester linkages. 
     
     
         4 . The substrate of  claim 2  or  3  wherein the resin further comprises one or more cyanurate groups. 
     
     
         5 . The substrate of any one of  claims 1  through  4  wherein the coating composition comprises phenyl or anthracene groups. 
     
     
         6 . A method of forming a photoresist relief image, comprising:
 (a) applying a coating composition on a substrate, the coating composition comprising a component that comprises one or more uracil moieties:   (b) applying a photoresist composition above the coating composition layer; and   (c) exposing and developing the photoresist layer to provide a resist relief image.   
     
     
         7 . The method of  claim 6  wherein the component that comprises the one or more uracil moieties is a resin. 
     
     
         8 . The method of  claim 7  wherein the resin comprises polyester linkages. 
     
     
         9 . The method of any one of  claims 6  through  8  wherein the coating composition comprises a component that comprises phenyl or anthracene groups. 
     
     
         10 . The method of any one of  claims 6  through  9  wherein the photoresist is exposed with 193 nm radiation. 
     
     
         11 . The method of any one of  claims 6  through  10  wherein the applied coating composition is crosslinked prior to applying the photoresist composition. 
     
     
         12 . An antireflective composition for use with an overcoated photoresist composition, the antireflective composition comprising a resin that comprises one or more uracil linkages. 
     
     
         13 . The antireflective composition of  claim 12  wherein the resin comprises polyester linkages. 
     
     
         14 . The antireflective composition of  claim 12  or  13  wherein the resin comprises phenyl groups. 
     
     
         15 . The antireflective composition of any one of  claims 12  through  14  wherein the composition comprises a crosslinker component.