Inventor · disambiguated record
Owendi Ongayi
Also filed as: ONGAYI OWENDI
25 granted patents·4 pending applications·80 citations·filing 2007–2023
94Inventor score
Files withROHM & HAAS ELECT MAT13DOW GLOBAL TECHNOLOGIES LLC5ZAMPINI ANTHONY4ONGAYI OWENDI3THACKERAY JAMES W3
Top patents by PatentIndex Score
29 records- 0196US9442377B1Wet-strippable silicon-containing antireflectantROHM & HAAS ELECT MAT·Filed 2015·Granted Sep 13, 2016·19 cites·14 claims
- 0295US10031420B2Wet-strippable silicon-containing antireflectantROHM & HAAS ELECT MAT·Filed 2016·Granted Jul 24, 2018·13 cites·14 claims
- 0395US8932797B2Photoacid generatorsTHACKERAY JAMES W·Filed 2011·Granted Jan 13, 2015·17 cites·18 claims
- 0488US10114288B2Silicon-containing underlayersROHM & HAAS ELECT MAT·Filed 2016·Granted Oct 30, 2018·3 cites·16 claims
- 0588US8900792B2Polymerizable photoacid generatorsTHACKERAY JAMES W·Filed 2011·Granted Dec 2, 2014·6 cites·10 claims
- 0687US8968981B2Coating compositions for use with an overcoated photoresistJAIN VIPUL·Filed 2011·Granted Mar 3, 2015·5 cites·5 claims
- 0786US8501383B2Coating compositions for use with an overcoated photoresistZAMPINI ANTHONY·Filed 2010·Granted Aug 6, 2013·4 cites·10 claims
- 0884US12139595B2Low coefficient of friction ethylene-based compositionsDOW GLOBAL TECHNOLOGIES LLC·Filed 2023·Granted Nov 12, 2024·0 cites·12 claims
- 0980US9581901B2Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic deviceROHM & HAAS ELECT MAT·Filed 2014·Granted Feb 28, 2017·2 cites·16 claims
- 1078US10007184B2Silicon-containing underlayersROHM & HAAS ELECT MAT·Filed 2016·Granted Jun 26, 2018·1 cites·10 claims
- 1178US9182669B2Copolymer with acid-labile group, photoresist composition, coated substrate, and method of forming an electronic deviceROHM & HAAS ELECT MAT·Filed 2014·Granted Nov 10, 2015·2 cites·10 claims
- 1270US9459533B2Polymer composition, photoresist comprising the polymer composition, and coated article comprising the photoresistDOW GLOBAL TECHNOLOGIES LLC·Filed 2013·Granted Oct 4, 2016·2 cites·10 claims
- 1370US9244352B2Coating compositions for use with an overcoated photoresistZAMPINI ANTHONY·Filed 2010·Granted Jan 26, 2016·2 cites·17 claims
- 1469US9206276B2Photosensitive copolymer, photoresist comprising the copolymer, and method of forming an electronic deviceROHM & HAAS ELECT MAT·Filed 2014·Granted Dec 8, 2015·1 cites·9 claims
- 1566US11879056B2Low coefficient of friction ethylene-based compositionsDOW GLOBAL TECHNOLOGIES LLC·Filed 2018·Granted Jan 23, 2024·0 cites·13 claims
- 1665US9182662B2Photosensitive copolymer, photoresist comprising the copolymer, and articles formed therefromONGAYI OWENDI·Filed 2013·Granted Nov 10, 2015·1 cites·11 claims
- 1763US9323154B2Coating compositions for photolithographyZAMPINI ANTHONY·Filed 2007·Granted Apr 26, 2016·1 cites·7 claims
- 1863US2019354015A1Coating compositions for use with an overcoated photoresistONGAYI OWENDI·Filed 2019·Application pending·0 cites
- 1962US8703383B2Photosensitive copolymer and photoresist compositionTHACKERAY JAMES W·Filed 2011·Granted Apr 22, 2014·1 cites·20 claims
- 2062US2018253006A1Silicon-containing underlayersROHM & HAAS ELECT MAT·Filed 2018·Application pending·0 cites
- 2159US10754249B2Coating compositions for photolithographyROHM & HAAS ELECT MAT·Filed 2017·Granted Aug 25, 2020·0 cites·20 claims
- 2258US10481494B1Coating compositions for use with an overcoated photoresistROHM & HAAS ELECT MAT·Filed 2015·Granted Nov 19, 2019·0 cites·12 claims
- 2358US9690199B2Coating compositions for photolithographyROHM & HAAS ELECT MAT·Filed 2016·Granted Jun 27, 2017·0 cites·16 claims
- 2455US8455178B2Coating compositions for photolithographyZAMPINI ANTHONY·Filed 2007·Granted Jun 4, 2013·0 cites·7 claims
- 2555US2014030653A1Coating compositions for photolithographyROHM & HAAS ELECT MAT·Filed 2013·Application pending·0 cites
- 2654US10365562B2Coating compositions for use with an overcoated photoresistONGAYI OWENDI·Filed 2011·Granted Jul 30, 2019·0 cites·22 claims
- 2751US9229319B2Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic deviceROHM & HAAS ELECT MAT·Filed 2014·Granted Jan 5, 2016·0 cites·11 claims
- 2842US2021079311A1Low Coefficient of Friction Ethylene-Based CompositionsDOW GLOBAL TECHNOLOGIES LLC·Filed 2018·Application pending·0 cites
- 2933US12098313B2Low coefficient of friction laminatesDOW GLOBAL TECHNOLOGIES LLC·Filed 2018·Granted Sep 24, 2024·0 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →