Polishing protocol for zirconium diboride based ceramics to be implemented into optical systems

Abstract

The present disclosure relates to a polishing protocol for ZrB2 ceramics.

What is claimed is: 
     
         1 . A method comprising:
 polishing, using at least a first machine, a ceramic material comprising zirconium diboride to a surface roughness of less than 150 nm root mean square (RMS); and   polishing, using at least a second machine different from the first machine, the ceramic material having a surface roughness of less than 150 nm RMS to a surface roughness of less than 40 nm RMS.   
     
     
         2 . The method of  claim 1 , wherein the ceramic material comprises at least 75 wt % zirconium diboride as measured from a total of 100 wt %. 
     
     
         3 . The method of  claim 1 , wherein the ceramic material comprises silicon carbide. 
     
     
         4 . The method of  claim 3 , wherein the ceramic material comprises 25 wt % or less of silicon carbide as measured from a total of 100 wt %. 
     
     
         5 . The method of  claim 1 , wherein the ceramic material is polished to a surface roughness of less than 10 nm RMS. 
     
     
         6 . The method of  claim 1 , wherein the polishing, using a least a first machine further comprises:
 using a first polishing compound.   
     
     
         7 . The method of  claim 6 , wherein the first polishing compound comprises:
 a diamond disc, an aluminum oxide, and a coolant.   
     
     
         8 . The method of  claim 1 , wherein the polishing, using a least a second machine further comprises:
 using a second polishing compound.   
     
     
         9 . The method of  claim 8 , wherein the second polishing compound comprises:
 diamond powder, vegetable oil, and deionized water.   
     
     
         10 . The method of  claim 1 , wherein the polishing, using a least a first machine further comprises:
 polishing the ceramic material at a first speed.   
     
     
         11 . The method of  claim 1 , wherein the polishing, using a least a second machine further comprises:
 polishing the ceramic material at a second speed.   
     
     
         12 . The method of  claim 1 , wherein the first machine is a computer numerical control (CNC) machine. 
     
     
         13 . The method of  claim 1 , wherein the second machine is a Strasbaugh machine. 
     
     
         14 . An optical system comprising one or more optical components formed from a method comprising:
 polishing, using at least a first machine, a ceramic material comprising zirconium diboride to a surface roughness of less than 150 nm root mean square (RMS); and   polishing, using at least a second machine different from the first machine, the ceramic material having a surface roughness of less than 150 nm RMS to a surface roughness of less than 40 nm RMS.   
     
     
         15 . The system of  claim 14 , wherein the ceramic material comprises at least 75 wt % zirconium diboride as measured from a total of 100 wt %. 
     
     
         16 . The system of  claim 14 , wherein the ceramic material comprises silicon carbide. 
     
     
         17 . The system of  claim 16 , wherein the ceramic material comprises 25 wt % or less of silicon carbide as measured from a total of 100 wt %. 
     
     
         18 . The system of  claim 14 , wherein the first machine is a computer numerical control (CNC) machine. 
     
     
         19 . The system of  claim 14 , wherein the second machine is a Strasbaugh machine. 
     
     
         20 . An optical apparatus formed from a method comprising:
 polishing, using at least a first machine, a ceramic material comprising zirconium diboride to a surface roughness of less than 150 nm root mean square (RMS); and   polishing, using at least a second machine different from the first machine, the ceramic material having a surface roughness of less than 150 nm RMS to a surface roughness of less than 40 nm RMS.