Method for manufacturing solar cell with high photoelectric conversion efficiency

Abstract

A method for manufacturing a solar cell, including the steps of: forming unevenness on both of main surfaces of a semiconductor substrate of a first conductivity type; forming a base layer on a first main surface of the semiconductor substrate; forming a diffusion mask on the base layer; removing the diffusion mask in a pattern; forming an emitter layer on the portion of the first main surface where the diffusion mask have been removed; removing the remaining diffusion mask; forming a dielectric film on the first main surface; forming a base electrode on the base layer; and forming an emitter electrode on the emitter layer.

1 . A method for manufacturing a solar cell, comprising the steps of:
 forming unevenness on both of main surfaces of a semiconductor substrate of a first conductivity type;
 forming a base layer of the first conductivity type, having a dopant concentration higher than in the semiconductor substrate, on a first main surface of the semiconductor substrate; 
 forming a diffusion mask on the base layer; 
 removing the diffusion mask in a pattern to have a remaining diffusion mask at other than a portion where the diffusion mask have been removed; 
 forming an emitter layer of a second conductivity type which is an opposite conductivity type to the first conductivity type, on the portion of the first main surface where the diffusion mask have been removed; 
 removing the remaining diffusion mask; 
 forming a dielectric film on the first main surface; 
 forming a base electrode on the base layer; and 
 forming an emitter electrode on the emitter layer. 
   
     
     
         2 . The method for manufacturing a solar cell according to  claim 1 , wherein the surface of the semiconductor substrate is subjected to etching on the portion where the diffusion mask have been removed after the step of removing the diffusion mask in a pattern and before the step of forming the emitter layer. 
     
     
         3 . The method for manufacturing a solar cell according to  claim 1 , wherein, after forming the emitter layer, the film thickness of a silicon oxide film on the emitter layer is 95 nm or less. 
     
     
         4 . The method for manufacturing a solar cell according to  claim 1 , wherein the first conductivity type is P-type, and the second conductivity type is N-type; in the step of forming the base layer, a glass layer is formed on the first main surface simultaneously with forming the base layer; and in the step of forming the diffusion mask, the diffusion mask is formed on the base layer with the glass layer being left. 
     
     
         5 . The method for manufacturing a solar cell according to  claim 1 , wherein the first conductivity type is P-type, and the second conductivity type is N-type; and the base electrode and the emitter electrode are formed after forming the dielectric film without removing the dielectric film. 
     
     
         6 . The method for manufacturing a solar cell according to  claim 1 , wherein the first conductivity type is N-type, and the second conductivity type is P-type; and the step of forming the dielectric film is a step of forming an aluminum oxide film to cover the base layer and the emitter layer and forming a silicon nitride film on the aluminum oxide film. 
     
     
         7 . The method for manufacturing a solar cell according to  claim 1 , wherein the base layer is formed on an entire surface of the first main surface in the step of forming the base layer. 
     
     
         8 . The method for manufacturing a solar cell according to  claim 1 , wherein the unevenness is texture.