US2020340120A1PendingUtilityA1

Gold plating method and plating film

Assignee: UEMURA KOGYO KKPriority: Apr 10, 2019Filed: Apr 9, 2020Published: Oct 29, 2020
Est. expiryApr 10, 2039(~12.7 yrs left)· nominal 20-yr term from priority
C23C 18/1651C23C 18/1637C23C 18/1831C23C 28/023C23C 18/42C23C 18/1653C25D 5/10C23C 18/1692C23C 18/1879C23C 18/30H10W 72/50H10W 20/4424H10W 70/465
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Claims

Abstract

The purpose of the present invention is to provide a gold plating method and a plating film for preventing a decrease of wire bonding characteristic by a thermal hysteresis by implementation and else. In addition, the purpose of the present invention is to provide a gold plating method and a plating film for preventing a decrease of wire bonding characteristic by a thermal hysteresis by implementation and else, even when a film thickness of a gold plating film is thin. A gold plating method for wire bonding connection by plating using a silver catalyst on a copper or copper alloy film, comprising: a silver catalyst forming step for forming a silver film as the silver catalyst for forming a palladium film; a palladium film forming step for forming the palladium film on the silver catalyst; a gold plating film forming step for forming a gold plating film on the palladium film, wherein a film thickness of the silver film is 0.05 μm to 0.5 μm.

Claims

exact text as granted — not AI-modified
1 . A gold plating method for wire bonding connection by plating using a silver catalyst on a copper or copper alloy film, comprising:
 a silver catalyst forming step for forming a silver film as the silver catalyst for forming a palladium film;   a palladium film forming step for forming the palladium film on the silver catalyst;   a gold plating film forming step for forming a gold plating film on the palladium film,   wherein a film thickness of the silver film is 0.05 μm to 0.5 μm.   
     
     
         2 . The gold plating method according to  claim 1 , wherein a particle size of the palladium film is 0.09 μm or more. 
     
     
         3 . The gold plating method according to  claim 1 , wherein a film thickness of the gold plating film is 0.2 μm or less. 
     
     
         4 . The gold plating method according to  claim 1 , wherein a film thickness of the palladium film is 0.04 μm to 0.6 μm. 
     
     
         5 . A plating film for wire bonding connection by plating using a silver catalyst on a copper or copper alloy film, comprising:
 the copper or copper alloy film;   a silver film as the silver catalyst formed on the copper or copper alloy film;   a palladium film formed on the silver catalyst; and   a gold film formed on the palladium film,   wherein a film thickness of the silver film is 0.05 μm to 0.5 μm.   
     
     
         6 . The plating film according to  claim 5 , wherein a particle size of the palladium film is 0.09 μm or more. 
     
     
         7 . The plating film according to  claim 5 , wherein a wire pull average strength after heat treatment is 10.0 g or more.

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