Organometallic compounds and purification of such organometallic compounds

Abstract

Disclosed herein are methods of purifying compounds useful for the deposition of high purity tin oxide and high purity compounds purified by those methods. Such compounds are those of the Formula as follows R x —Sn-A 4-x wherein: A is selected from the group consisting of (Y a R′ z ) and a 3- to 7-membered N-containing heterocyclic group; each R group is independently selected from the group consisting of an alkyl or aryl group having from 1 to 10 carbon atoms; each R′ group is independently selected from the group consisting of an alkyl, acyl or aryl group having from 1 to 10 carbon atoms; x is an integer from 0 to 4; a is an integer from 0 to 1; Y is selected from the group consisting of N, O, S, and P; and z is 1 when Y is O, S or when Y is absent and z is 2 when Y is N or P.

1 - 19 . (canceled) 
     
     
         20 . A high purity organometallic compound having a purity greater than 95%, the high purity organometallic compound being a compound of Formula I:
   R x —Sn-A 4-x   Formula I
   wherein:
 A is selected from the group consisting of (YaR′z) and a 3- to 7-membered N-containing heterocyclic group; 
 each R group is independently selected from the group consisting of an alkyl or aryl group having from 1 to 10 carbon atoms; 
 each R′ group is independently selected from the group consisting of an alkyl, acyl or aryl group having from 1 to 10 carbon atoms; 
 x is an integer from 0 to 4; 
 a is an integer from 0 to 1; 
 Y is selected from the group consisting of N, O, S, and P; and 
 z is 1 when Y is O, S or when Y is absent and z is 2 when Y is N or P. 
   
     
     
         21 . The high purity organometallic compound of  claim 20 , wherein the purity is greater than 98%.