Inventor · disambiguated record
Wesley P. Graff
Also filed as: GRAFF WESLEY · GRAFF WESLEY P · GRAFF WESLEY PHILLIP
8 granted patents·3 pending applications·373 citations·filing 1997–2021
89Inventor score
Files withGRAFF WESLEY P3NOVELLUS SYSTEMS INC3SEASTAR CHEMICALS ULC3MOTOROLA INC1SEASTAR CHEMICALS INC1
Top patents by PatentIndex Score
11 records- 0196US6796314B1Using hydrogen gas in a post-etch radio frequency-plasma contact cleaning processNOVELLUS SYSTEMS INC·Filed 2001·Granted Sep 28, 2004·244 cites·16 claims
- 0294US8664124B2Method for etching organic hardmasksGRAFF WESLEY P·Filed 2012·Granted Mar 4, 2014·35 cites·18 claims
- 0394US7399712B1Method for etching organic hardmasksNOVELLUS SYSTEMS INC·Filed 2005·Granted Jul 15, 2008·30 cites·3 claims
- 0490US8569179B2Method for etching organic hardmasksGRAFF WESLEY P·Filed 2012·Granted Oct 29, 2013·12 cites·8 claims
- 0588US8114782B2Method for etching organic hardmasksGRAFF WESLEY P·Filed 2008·Granted Feb 14, 2012·13 cites·15 claims
- 0684US11643422B2Organometallic compounds and purification of such organometallic compoundsSEASTAR CHEMICALS ULC·Filed 2020·Granted May 9, 2023·2 cites·21 claims
- 0779US6955177B1Methods for post polysilicon etch photoresist and polymer removal with minimal gate oxide lossNOVELLUS SYSTEMS INC·Filed 2001·Granted Oct 18, 2005·28 cites·45 claims
- 0866US2021214379A1Organometallic compounds and purification of such organometallic compoundsSEASTAR CHEMICALS ULC·Filed 2021·Application pending·0 cites
- 0954US2019337969A1Organometallic compounds and methods for the deposition of high purity tin oxideSEASTAR CHEMICALS INC·Filed 2019·Application pending·0 cites
- 1050US2022306657A1Organometallic compounds for the deposition of high purity tin oxide and dry etching of the tin oxide films and deposition reactorsSEASTAR CHEMICALS ULC·Filed 2020·Application pending·0 cites
- 1133US6008129AProcess for forming a semiconductor deviceMOTOROLA INC·Filed 1997·Granted Dec 28, 1999·9 cites·29 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →