Magnetic-field-distribution tuner, deposition equipment and method of deposition
Abstract
The present disclosure provides a deposition equipment, which includes a reaction chamber, a carrier, a target material, a magnetic device are at least one shield unit. The carrier and the target material are disposed within the containing space, wherein the carrier is for carrying a substrate, also a surface of the target material faces the carrier and the substrate. The magnetic device is disposed on another surface of the target material, to generate a magnetic field within the containing space through the target material. The shield unit is made electrical conductor and is disposed between a portion of the magnetic device and a portion of the target material, wherein the shield unit is for partially blocking and micro-adjusting the magnetic field generated by the magnetic device within the containing space, such that to improve an evenness of thickness for a thin film formed on the substrate.
Claims
exact text as granted — not AI-modifiedWe claim:
1 . A deposition equipment, comprising:
a reaction chamber comprising a containing space; a carrier disposed within the containing space for carrying at least one substrate; a target material disposed within or covering the containing space of the reaction chamber, having a first surface and a second surface, wherein the first surface and the second surface are two opposite surfaces of the target material, and the first surface of the target material faces the carrier; a magnetic device disposed at a side of the second surface of the target material for generating a magnetic field within the containing space; and at least one shield unit disposed between a portion of the magnetic device and a portion of the target material for partially blocking the magnetic field generated by the magnetic device, wherein the at least one shield unit comprises an electrical conductor.
2 . The deposition equipment according to claim 1 , wherein the target material comprises a plurality of pin holes formed on the second surface, and the at least one shield unit comprises a plurality of shield pins entering the pin holes on the second surface of the target material for fastening the at least one shield unit on the second surface of the target material.
3 . The deposition equipment according to claim 1 , comprising a plurality of connectors, wherein the target material comprises a plurality of pin holes formed on the second surface, the at least one shield unit comprises a plurality of through holes, the connectors extend through the through holes of the at least one shield unit and enter the pin holes of the target material for fastening the at least one shield unit on the second surface of the target material.
4 . The deposition equipment according to claim 1 , comprising a back plate that has a first surface and a second surface, wherein the first surface of the back plate is connected to the second surface of the target material, the at least one shield unit is disposed on a side of the second surface of the back plate, and the second surface of the back plate is formed with at least one cavity for containing the at least one shield unit.
5 . The deposition equipment according to claim 1 , wherein the at least one shield unit comprises a plurality of shield holes or a plurality shield cavities.
6 . The deposition equipment according to claim 1 , further comprising a lock unit disposed between the magnetic device and the target material, wherein the lock unit comprises at least one mounting space for containing the at least one shield unit.
7 . The deposition equipment according to claim 6 , further wherein the lock unit is made of an electrical insulator.
8 . The deposition equipment according to claim 6 , wherein the lock unit is a frame formed with a plurality of hollow portions.
9 . The deposition equipment according to claim 6 , wherein the at least one shield unit comprises a plurality of shield cavities or a plurality of shield holes.
10 . A magnetic-field-distribution tuner adapted to a deposition equipment, comprising:
a target material comprising a first surface and a second surface, wherein the first surface and the second surface are two opposite surfaces of the target material; a magnetic device disposed on the second surface of the target material for generating a magnetic field at a side of the first surface of the target material; and at least one shield unit disposed between a portion of the magnetic device and a portion of the target material for partially blocking the magnetic field generated by the magnetic device, wherein the at least one shield unit comprises an electrical conductor.
11 . The magnetic-field-distribution tuner according to claim 10 , further comprising a back plate that has a first surface and a second surface, wherein the first surface of the back plate is connected to the second surface of the target material, and the at least one shield unit is disposed on the second surface of the back plate.
12 . The magnetic-field-distribution tuner according to claim 10 , wherein the second surface of the target material is formed with a plurality of pin holes, and the at least one shield unit comprises a plurality of shield pins for entering the pin holes on the second surface of the target material to fasten the at least one shield unit on the second surface of the target material.
13 . The magnetic-field-distribution tuner according to claim 10 , wherein the at least one shield unit comprises a plurality of shield holes or a plurality of shield cavities.
14 . The magnetic-field-distribution tuner according to claim 10 , further comprising a lock unit disposed between the magnetic device and the target material, wherein the lock unit comprises at least one mounting space for containing the at least one shield unit.
15 . The magnetic-field-distribution tuner according to claim 14 , wherein the lock unit is made of an electrical insulator.
16 . The magnetic-field-distribution tuner according to claim 14 , wherein the lock unit is a frame formed with a plurality of hollow portions.
17 . The magnetic-field-distribution tuner according to claim 14 , wherein the at least one shield unit comprises a plurality of shield cavities or a plurality of shield holes.
18 . A deposition method performed by the deposition equipment according to claim 1 , comprising placing a first substrate on the carrier;
performing a deposition process to the first substrate for forming a thin film on a surface of the first substrate; measuring thicknesses of the thin film on different areas of the first substrate; and disposing the at least one shield unit between a portion of the magnetic device and a portion of the target material in accordance with the thicknesses of the thin film on the areas of the first substrate, to partially blocking the magnetic field of the magnetic device by the at least one shield unit.
19 . The deposition method according to claim 18 , further comprises:
partitioning the areas of the first substrate into first-thickness areas and second-thickness areas in accordance with the thicknesses of the first substrate, wherein thicknesses of the first-thickness areas are thicker than that of the second-thickness areas; disposing the at least one shield unit between the magnetic device and the target material in accordance with the first-thickness areas; and placing a second substrate on the carrier and performing a deposition process to the second substrate.
20 . The deposition method according to claim 18 , further comprising:
partitioning the areas of the first substrate into first-thickness areas and second-thickness areas in accordance with the thicknesses of the first substrate, wherein thicknesses of the first-thickness areas are thicker than that of the second-thickness areas; using a plurality of the at least one shield unit as a first-shield unit and a second-shield unit, then disposing the first-shield unit between the magnetic device and the target material in accordance with the first-thickness areas, and disposing the second-shield unit between the magnetic device and the target material in accordance with the second-thickness areas, wherein each of the first-shield unit and the second-shield unit comprises a plurality of shield holes or a plurality of shield cavities, and wherein the shield holes or the shield cavities of the first-shield unit are distributed in a population less than that of the second-shield unit; and placing a second substrate on the carrier and performing a deposition process to the second substrate.Cited by (0)
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