Tuneable uniformity control utilizing rotational magnetic housing

Abstract

Embodiments described herein provide magnetic and electromagnetic housing systems and a method for controlling the properties of plasma generated in a process volume of a process chamber to affect deposition properties of a film. In one embodiment, the method includes rotation of the rotational magnetic housing about a center axis of the process volume to create dynamic magnetic fields. The magnetic fields modify the shape of the plasma, concentration of ions and radicals, and movement of concentration of ions and radicals to control the density profile of the plasma. Controlling the density profile of the plasma tunes the uniformity and properties of a deposited or etched film.

1 . A method, comprising:
 disposing a substrate on a substrate support disposed in a chamber body;   providing RF power to an electrode disposed in the chamber body to generate a plasma;   rotating a rotational magnetic housing around an outside of the chamber body such that magnets of the magnetic housing travel in a path around the chamber body, each of magnets positioned in a retaining bracket coupled to tracks and the retaining brackets are actuated to move on the tracks.   
     
     
         2 . The method of  claim 1 , wherein each of the retaining brackets are movable in a radial distance from a center axis of the chamber body. 
     
     
         3 . The method of  claim 2 , further comprising adjusting at least one of a rotation rate of the magnetic housing, a pitch between each magnet of the plurality of magnets, or the radial distance. 
     
     
         4 . The method of  claim 1 , further comprising raising or lowering the rotational magnetic housing to adjust a vertical position of the magnetic housing. 
     
     
         5 . The method of  claim 4 , wherein the vertical distance is adjusted by a housing lift system coupled to the rotational magnetic housing that raises and lowers the rotational magnetic housing. 
     
     
         6 . The method of  claim 5 , wherein the vertical distance of each of the magnets from the substrate is changed while generating the plasma in the chamber body. 
     
     
         7 . The method of  claim 1 , further comprising adjusting at least one of a rotation rate of the magnetic housing. 
     
     
         8 . The method of  claim 1 , wherein the magnets of a first half of the rotational magnetic housing have a positive pole oriented toward a central opening of the rotational magnetic housing, and the magnets of a second half of the rotational magnetic housing have a negative pole oriented opposite to the central opening. 
     
     
         9 . A method, comprising:
 disposing a substrate on a substrate support disposed in a chamber body;   generating a plasma in the chamber body; and   rotating a rotational magnetic housing around an outside of the chamber body such that magnets of the magnetic housing travel in a path around the chamber body, wherein the rotational magnetic housing is coupled to a drive system comprising:
 a motor coupled to a belt, the belt disposed around the rotational magnetic housing, the belt has a plurality of lugs, each lug corresponds to a groove of a plurality of grooves of an outer sidewall of the rotational magnetic housing. 
   
     
     
         10 . The method of  claim 9 , further comprising adjusting at least one of a rotation rate of the rotational magnetic housing, a pitch between each magnet of the plurality of magnets, or a radial distance of the plurality of magnets to a center axis of the chamber body. 
     
     
         11 . The method of  claim 9 , wherein the magnets of a first half of the rotational magnetic housing have a positive pole oriented toward a central opening of the rotational magnetic housing, and the magnets of a second half of the rotational magnetic housing have a negative pole oriented opposite to the central opening. 
     
     
         12 . The method of  claim 9 , further comprising rotating a second rotational magnetic housing around an outside of a second chamber body, the second rotational magnetic housing coupled to the belt. 
     
     
         13 . The method of  claim 12 , wherein the belt rotates the rotational magnetic housing and the second rotational magnetic housing. 
     
     
         14 . The method of  claim 9 , wherein the magnets are positioned in a retaining bracket operable to slide along a track in a radial direction from the center axis of the chamber body. 
     
     
         15 . The method of  claim 12 , further comprising adjusting at least one of a rotation rate of the magnetic housing. 
     
     
         16 . A method, comprising:
 disposing a substrate on a substrate support disposed in a chamber body;   generating a plasma in the chamber body; and   energizing, with a power source, an electromagnetic housing disposed around a spacer and located an outside of the chamber body, the electromagnetic housing comprising:
 a conductive wire coupled to the power source, wherein the conductive wire is disposed about the spacer, the conductive wire coupled to a track, the track actuated such that each turn of the conductive wire is operable to slide along the track in a radial direction to vary a horizontal distance from to the conductive wire to the center axis of the chamber body; 
 an upper plate; 
 a lower plate disposed opposite the upper plate; 
 an inner sidewall; and 
 an outer sidewall disposed opposite the inner sidewall. 
   
     
     
         17 . The method of  claim 16 , wherein the conductive wire is coiled around a half process volume of the chamber body, a second conductive wire is coiled around a second half process volume of the chamber body. 
     
     
         18 . The method of  claim 17 , wherein a distance between each coil of the first conductive wire differs from a distance between each coil of the second conductive wire. 
     
     
         19 . The method of  claim 16 , wherein the conductive wire is coiled one or more times around a quarter process volume of the chamber body, a second conductive wire is coiled one or more times around a second quarter process volume of the chamber body, a third conductive wire is coiled one or more times around a third quarter process volume of the chamber body, a fourth conductive wire is coiled one or more times around a fourth quarter process volume of the chamber body, each quarter having alternative polarities. 
     
     
         20 . The method of  claim 16 , wherein the spacer is made from polytetrafluoroethylene.