Large-area high-density plasma processing chamber for flat panel displays

Abstract

Embodiments described herein provide a lid assembly of a chamber for independent control of plasma density and gas distribution within the interior volume of the chamber. The lid assembly includes a plasma generation system and a gas distribution assembly. The plasma generation system includes a plurality of dielectric plates having a bottom surface oriented with respect to vacuum pressure and a top surface operable to be oriented with respect to atmospheric pressure. One or more coils are positioned on or over the plurality of dielectric plates. The gas distribution assembly includes a first diffuser and a second diffuser. The first diffuser includes a plurality of first channels intersecting a plurality of second channels of the second diffuser.

1 . A plate for a lid assembly, the plate comprising:
 a plasma generation system, the plasma generation system comprising two or more cavities disposed in parallel in the plate, each cavity of the two or more cavities comprises:
 a plurality of recesses, each recess of the plurality of recesses having a dielectric plate of a plurality of dielectric plates disposed therein; 
   a gas distribution assembly, the gas distribution assembly comprising:
 a first diffuser, the first diffuser comprises:
 one or more first diffuser inlets disposed in the plate; and 
 a plurality of first channels in fluid communication with at least one of the first diffuser inlets, each first channel of the plurality of first channels is disposed in the plate and is adjacent to at least one recess of the plurality of recesses; and 
 
 a second diffuser, the second diffuser comprises:
 one or more second diffuser inlets disposed in the plate and in fluid communication with a plurality of second channels, each of the second channels is intersecting each of the first channels; and 
 each of the dielectric plates is disposed adjacent to adjacent first channels and is disposed adjacent to at least one of the second channels. 
 
   
     
     
         2 . The plate of  claim 1 , wherein the first diffuser is configured to supply one or more first gasses through a plurality of first holes in each first channel. 
     
     
         3 . The plate of  claim 2 , further comprising a first flow controller disposed between each of the one or more first diffuser inlets and a first gas source in fluid connection with the first diffuser. 
     
     
         4 . The plate of  claim 2 , wherein the second diffuser is configured to supply one or more second gasses through a plurality of second holes in each second channel. 
     
     
         5 . The plate of  claim 4 , further comprising a second flow controller disposed between each of the one or more second diffuser inlets and a second gas source in fluid connection with the second diffuser. 
     
     
         6 . The plate of  claim 1 , wherein the plate comprises aluminum-containing materials. 
     
     
         7 . The plate of  claim 1 , wherein the plurality of dielectric plates comprise at least one of aluminum oxide (Al 2 O 3 ), aluminum nitride (AlN), quartz, zirconium dioxide (ZrO 2 ), zirconium nitride (ZrN), quartz, and glass materials. 
     
     
         8 . The plate of  claim 1 , the plasma generation system further comprising one or more coils positioned on or over the plurality of dielectric plates in a respective cavity. 
     
     
         9 . The plate of  claim 1 , wherein one or more of the plurality of first channels are coupled to a first heat exchanger and one or more of the plurality of second channels are coupled to a second heat exchanger. 
     
     
         10 . The plate of  claim 9 , wherein the first heat exchanger is a chiller. 
     
     
         11 . A gas distribution assembly for a lid assembly, the gas distribution assembly comprising:
 a first diffuser, the first diffuser comprises:
 one or more first diffuser inlets disposed in a plate for the lid assembly; and 
 a plurality of first channels in fluid communication with at least one of the first diffuser inlets, each first channel of the plurality of first channels is disposed in the plate; and 
   a second diffuser, the second diffuser comprises:
 one or more second diffuser inlets disposed in the plate and in fluid communication with a plurality of second channels, each of the second channels is intersecting each of the first channels. 
   
     
     
         12 . The gas distribution assembly of  claim 11 , wherein the first diffuser is configured to supply one or more first process gasses through a plurality of first holes in each first channel. 
     
     
         13 . The gas distribution assembly of  claim 12 , further comprising a flow controller disposed between each of the one or more first diffuser inlets and a first gas source in fluid connection with the first diffuser. 
     
     
         14 . The gas distribution assembly of  claim 12 , wherein the second diffuser is configured to supply one or more second gasses through a plurality of second holes in each second channel. 
     
     
         15 . The gas distribution assembly of  claim 14 , further comprising a second flow controller disposed between each of the one or more second diffuser inlets and a second gas source in fluid connection with the second diffuser. 
     
     
         16 . The gas distribution assembly of  claim 11 , wherein one or more of the plurality of first channels are coupled to a first heat exchanger and one or more of the plurality of second channels are coupled to a second heat exchanger. 
     
     
         17 . A gas distribution assembly for a lid assembly, the gas distribution assembly comprising:
 a first diffuser, the first diffuser comprises:
 one or more first diffuser inlets disposed in a plate for the lid assembly; and 
 a plurality of first channels in fluid communication with at least one of the first diffuser inlets, each first channel of the plurality of first channels is disposed in the plate; 
 a first flow controller disposed between each of the one or more first diffuser inlets and a first gas source in fluid connection with the first diffuser; and 
   a second diffuser, the second diffuser comprises:
 one or more second diffuser inlets disposed in the plate and in fluid communication with a plurality of second channels, each of the second channels is intersecting each of the first channels; and 
 a second flow controller disposed between each of the one or more second diffuser inlets and a second gas source in fluid connection with the second diffuser. 
   
     
     
         18 . The gas distribution assembly of  claim 17 , wherein the first diffuser is configured to supply one or more first gasses through a plurality of first holes in each first channel. 
     
     
         19 . The gas distribution assembly of  claim 17 , wherein the second diffuser is configured to supply one or more second gasses through a plurality of second holes in each second channel. 
     
     
         20 . The gas distribution assembly of  claim 17 , wherein one or more of the plurality of first channels are coupled to a first heat exchanger and one or more of the plurality of second channels are coupled to a second heat exchanger.