Inventor · disambiguated record
Suhail Anwar
Also filed as: ANWAR SUHAIL
53 granted patents·24 pending applications·1,813 citations·filing 2002–2025
98Inventor score
Top patents by PatentIndex Score
77 records- 0198US9397380B2Guided wave applicator with non-gaseous dielectric for plasma chamberKUDELA JOZEF·Filed 2012·Granted Jul 19, 2016·191 cites·26 claims
- 0298US8992723B2RF bus and RF return bus for plasma chamber electrodeSORENSEN CARL A·Filed 2010·Granted Mar 31, 2015·157 cites·7 claims
- 0398US8083853B2Plasma uniformity control by gas diffuser hole designCHOI SOO YOUNG·Filed 2004·Granted Dec 27, 2011·753 cites·106 claims
- 0496US9382621B2Ground return for plasma processesCHOI SOO YOUNG·Filed 2010·Granted Jul 5, 2016·27 cites·33 claims
- 0596US9214340B2Apparatus and method of forming an indium gallium zinc oxide layerAPPLIED MATERIALS INC·Filed 2015·Granted Dec 15, 2015·313 cites·20 claims
- 0696US7665951B2Multiple slot load lock chamber and method of operationAPPLIED MATERIALS INC·Filed 2006·Granted Feb 23, 2010·53 cites·18 claims
- 0796US7514936B2Detection and suppression of electrical arcingAPPLIED MATERIALS INC·Filed 2007·Granted Apr 7, 2009·59 cites·13 claims
- 0895US7292045B2Detection and suppression of electrical arcingAPPLIED MATERIALS INC·Filed 2005·Granted Nov 6, 2007·45 cites·24 claims
- 0994US7845891B2Decoupled chamber bodyAPPLIED MATERIALS INC·Filed 2006·Granted Dec 7, 2010·29 cites·21 claims
- 1091US10262837B2Plasma uniformity control by gas diffuser hole designAPPLIED MATERIALS INC·Filed 2015·Granted Apr 16, 2019·5 cites·14 claims
- 1190US8883269B2Thin film deposition using microwave plasmaWON TAE KYUNG·Filed 2011·Granted Nov 11, 2014·6 cites·5 claims
- 1290US8061949B2Multiple slot load lock chamber and method of operationKURITA SHINICHI·Filed 2010·Granted Nov 22, 2011·11 cites·13 claims
- 1389US8272830B2Scissor lift transfer robotKURITA SHINICHI·Filed 2008·Granted Sep 25, 2012·15 cites·13 claims
- 1488US9200368B2Plasma uniformity control by gas diffuser hole designCHOI SOO YOUNG·Filed 2011·Granted Dec 1, 2015·6 cites·95 claims
- 1586US9068262B2Tightly fitted ceramic insulator on large area electrodeKUDELA JOZEF·Filed 2011·Granted Jun 30, 2015·6 cites·16 claims
- 1685US7822324B2Load lock chamber with heater in tubeAPPLIED MATERIALS INC·Filed 2007·Granted Oct 26, 2010·10 cites·25 claims
- 1784US10312058B2Plasma uniformity control by gas diffuser hole designAPPLIED MATERIALS INC·Filed 2017·Granted Jun 4, 2019·3 cites·20 claims
- 1884US9922854B2Vertical inline CVD systemKURITA SHINICHI·Filed 2011·Granted Mar 20, 2018·7 cites·10 claims
- 1984US9187827B2Substrate support with ceramic insulationAPPLIED MATERIALS INC·Filed 2013·Granted Nov 17, 2015·2 cites·11 claims
- 2081US10312475B2CVD thin film stress control method for display applicationAPPLIED MATERIALS INC·Filed 2017·Granted Jun 4, 2019·3 cites·19 claims
- 2181US8070408B2Load lock chamber for large area substrate processing systemBEHDJAT MEHRAN·Filed 2008·Granted Dec 6, 2011·8 cites·16 claims
- 2280US9758869B2Anodized showerheadCHOI SOO YOUNG·Filed 2010·Granted Sep 12, 2017·4 cites·23 claims
- 2380US6824343B2Substrate supportAPPLIED MATERIALS INC·Filed 2002·Granted Nov 30, 2004·20 cites·28 claims
- 2479US8216422B2Substrate support bushingKURITA SHINICHI·Filed 2005·Granted Jul 10, 2012·6 cites·9 claims
- 2578US8124907B2Load lock chamber with decoupled slit valve door seal compartmentLEE JAE-CHULL·Filed 2007·Granted Feb 28, 2012·8 cites·20 claims
- 2678US2025349522A1Impedance control of local areas of a substrate during plasma deposition thereon in a large pecvd chamberAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 2777US7589031B2Method of avoiding haze formation on surfaces of silicon-containing PECVD-deposited thin filmsAPPLIED MATERIALS INC·Filed 2006·Granted Sep 15, 2009·6 cites·5 claims
- 2876US9048518B2Transmission line RF applicator for plasma chamberKUDELA JOZEF·Filed 2012·Granted Jun 2, 2015·5 cites·20 claims
- 2975US9818580B2Transmission line RF applicator for plasma chamberAPPLIED MATERIALS INC·Filed 2015·Granted Nov 14, 2017·2 cites·19 claims
- 3072US10903048B2Substrate processing method and apparatus for controlling phase angles of harmonic signalsAPPLIED MATERIALS INC·Filed 2018·Granted Jan 26, 2021·2 cites·20 claims
- 3170US9425026B2Systems and methods for improved radio frequency matching networksAPPLIED MATERIALS INC·Filed 2015·Granted Aug 23, 2016·1 cites·20 claims
- 3269US12394606B2Impedance control of local areas of a substrate during plasma deposition thereon in a large PECVD chamberAPPLIED MATERIALS INC·Filed 2022·Granted Aug 19, 2025·0 cites·20 claims
- 3369US10468221B2Shadow frame with sides having a varied profile for improved deposition uniformityAPPLIED MATERIALS INC·Filed 2018·Granted Nov 5, 2019·0 cites·20 claims
- 3469US9691650B2Substrate transfer robot with chamber and substrate monitoring capabilityKURITA SHINICHI·Filed 2010·Granted Jun 27, 2017·2 cites·24 claims
- 3568US7735710B2Substrate supportAPPLIED MATERIALS INC·Filed 2004·Granted Jun 15, 2010·10 cites·11 claims
- 3667US10453718B2Slit valve door with moving mating partAPPLIED MATERIALS INC·Filed 2013·Granted Oct 22, 2019·1 cites·6 claims
- 3767US2023272530A1Large-area high-density plasma processing chamber for flat panel displaysANWAR SUHAIL·Filed 2023·Application pending·0 cites
- 3867US2025372347A1Low profile and embedded gas diffusers in an inductively coupled plasma chamber employing antenna arraysAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 3966US12080516B2High density plasma enhanced process chamberAPPLIED MATERIALS INC·Filed 2021·Granted Sep 3, 2024·0 cites·22 claims
- 4066US8872428B2Plasma source with vertical gradientKUDELA JOZEF·Filed 2012·Granted Oct 28, 2014·2 cites·19 claims
- 4165US2009114153A1Method and apparatus for sealing an opening of a processing chamberAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 4264US9458538B2Method and apparatus for sealing an opening of a processing chamberKURITA SHINICHI·Filed 2012·Granted Oct 4, 2016·0 cites·9 claims
- 4363US2013068161A1Gas delivery and distribution for uniform process in linear-type large-area plasma reactorWHITE JOHN M·Filed 2012·Application pending·0 cites
- 4462US8567756B2Slit valve door able to compensate for chamber deflectionBEHDJAT MEHRAN·Filed 2009·Granted Oct 29, 2013·1 cites·6 claims
- 4561US2016208380A1Gas delivery and distribution for uniform process in linear-type large-area plasma reactorAPPLIED MATERIALS INC·Filed 2016·Application pending·0 cites
- 4658USD680946SGas flow diffuser faceplateANWAR SUHAIL·Filed 2010·Granted Apr 30, 2013·11 cites·1 claims
- 4758US8033245B2Substrate support bushingAPPLIED MATERIALS INC·Filed 2004·Granted Oct 11, 2011·5 cites·36 claims
- 4858US2016032451A1Remote plasma clean source feed between backing plate and diffuserAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 4958US2009107955A1Offset liner for chamber evacuationTINER ROBIN L·Filed 2008·Application pending·0 cites
- 5057US2006236934A1Plasma uniformity control by gas diffuser hole designCHOI SOO Y·Filed 2006·Application pending·0 cites
Showing the top 50 of 77 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →