Load lock fast pump vent

Abstract

A semiconductor processing tool is disclosed, the tool having a frame forming at least one chamber with an opening and having a sealing surface around a periphery of the opening, a door configured to interact with the sealing surface for sealing the opening, the door having sides perpendicular to the door sealing surface and perpendicular to a transfer plane of a substrate, and at least one drive located on the frame to a side of at least one of the sides that are substantially perpendicular to the door sealing surface and substantially perpendicular to the transfer plane of the substrate, the drive having actuators located at least partially in front of the sealing surface and the actuators being coupled to one of the sides of the door for moving the door from a sealed position. The at least one drive is located outside of a substrate transfer zone.

What is claimed is: 
     
         1 . An apparatus comprising:
 a frame forming an isolatable chamber configured to hold at least one substrate, the isolatable chamber including chamber walls having inner and outer wall surfaces; and   at least one heating element integrally embedded within the chamber walls between the inner and outer wall surfaces and configured to heat the chamber walls;   wherein the chamber walls are configured so as to minimize isolatable chamber volume effecting minimized pump down time, of the isolatable chamber, and effecting maximized heat transfer between the at least one heating element, via the chamber walls, and a gas within the isolatable chamber for a given chamber wall surface area to isolatable chamber volume ratio.