Substrate stage, substrate processing apparatus, and temperature control method

Abstract

A substrate stage includes: a base portion having a mounting surface; an annular support configured to support a substrate; an annular partition wall configured to divide the mounting surface into an outer region and an inner region in a radial direction of the substrate; a plurality of protrusions provided on the mounting surface and configured to support the substrate with a gap left between an upper end surface of the partition wall and the substrate; an outer flow path in communication with the outer region, and configured to allow a heat transfer gas supplied to a space between the substrate and the mounting surface to flow therethrough; an inner flow path in communication with the inner region, and configured to allow the heat transfer gas to flow therethrough; and an annular diffusion portion configured to diffuse the heat transfer gas along a circumferential direction of the partition wall.

1 - 13 . (canceled) 
     
     
         14 . A substrate stage, comprising:
 a body having a top surface;   an annular partition wall protruding from the top surface so as to divide the top surface into an outer region and an inner region;   a plurality of first protrusions protruding from the outer and inner regions of the top surface, each first protrusion having a columnar shape;   a sealing band protruding from the top surface and extending along a circumference of the top surface;   first and second outer annular grooves formed in the outer region of the top surface;   first and second inner annular grooves formed in the inner region of the top surface;   at least one outer gas channel formed in the body and in communication with the first outer annular groove; and   at least one inner gas channel formed in the body and in communication with the first inner annular groove.   
     
     
         15 . The substrate stage of  claim 14 , wherein the second outer annular groove has a first blind bottom, and the second inner annular groove has a second blind bottom. 
     
     
         16 . The substrate stage of  claim 14 , wherein the second outer annular groove has a blind bottom. 
     
     
         17 . The substrate stage of  claim 14 , wherein the second inner annular groove has a blind bottom. 
     
     
         18 . The substrate stage of  claim 15 , wherein the at least one outer gas channel includes a plurality of outer gas channels arranged in a circumferential direction. 
     
     
         19 . The substrate stage of  claim 15 , wherein the first outer annular groove surrounds the second outer annular groove. 
     
     
         20 . The substrate stage of  claim 19 , wherein the second inner annular groove surrounds the first inner annular groove. 
     
     
         21 . The substrate stage of  claim 15 , wherein the second inner annular groove surrounds the first inner annular groove. 
     
     
         22 . The substrate stage of  claim 15 , wherein the at least one inner gas channel includes a plurality of inner gas channels arranged in a circumferential direction. 
     
     
         23 . The substrate stage of  claim 14 , wherein a height of the annular partition wall is lower than a height of the sealing band. 
     
     
         24 . The substrate stage of  claim 23 , further comprising a plurality of second protrusions protruding from the annular partition wall. 
     
     
         25 . A substrate stage, comprising:
 a body having a top surface;   an annular partition wall protruding from the top surface so as to divide the top surface into an outer region and an inner region;   a plurality of first protrusions protruding from the outer and inner regions of the top surface, each first protrusion having a columnar shape;   a sealing band protruding from the top surface and extending along a circumference of the top surface;   first and second outer annular grooves formed in the outer region of the top surface; and   at least one outer gas channel formed in the body and in communication with the first outer annular groove.   
     
     
         26 . The substrate stage of  claim 25 , wherein the second outer annular groove has a first blind bottom. 
     
     
         27 . The substrate stage of  claim 26 , wherein the first outer annular groove surrounds the second outer annular groove. 
     
     
         28 . The substrate stage of  claim 25 , wherein a height of the annular partition wall is lower than a height of the sealing band. 
     
     
         29 . A substrate stage, comprising:
 a body having a top surface;   an annular partition wall protruding from the top surface so as to divide the top surface into an outer region and an inner region;   a plurality of first protrusions protruding from the outer and inner regions of the top surface, each first protrusion having a columnar shape;   a sealing band protruding from the top surface and extending along a circumference of the top surface;   first and second inner annular grooves formed in the inner region of the top surface; and   at least one inner gas channel formed in the body and in communication with the first inner annular groove.   
     
     
         30 . The substrate stage of  claim 29 , wherein the second inner annular groove has a blind bottom. 
     
     
         31 . The substrate stage of  claim 30 , wherein the second inner annular groove surrounds the first inner annular groove. 
     
     
         32 . The substrate stage of  claim 29 , wherein a height of the annular partition wall is lower than a height of the sealing band.