Assignee
TOKYO ELECTRON LTD
JP·9,101 granted patents·3,944 pending applications·190,636 citations·filing 1984–2025
Top patents by PatentIndex Score
13,045 records- 0199US11640118B2Method of pattern alignment for field stitchingTOKYO ELECTRON LTD·Filed 2021·Granted May 2, 2023·4 cites·19 claims
- 0299US11527545B2Architecture design and process for 3D logic and 3D memoryTOKYO ELECTRON LTD·Filed 2020·Granted Dec 13, 2022·10 cites·20 claims
- 0399US10707054B1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Jul 7, 2020·41 cites·19 claims
- 0499US10672616B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2015·Granted Jun 2, 2020·40 cites·7 claims
- 0599US10522343B2Method of enhancing high-k film nucleation rate and electrical mobility in a semiconductor device by microwave plasma treatmentTOKYO ELECTRON LTD·Filed 2015·Granted Dec 31, 2019·40 cites·20 claims
- 0699US9922824B2Method of forming silicon filmTOKYO ELECTRON LTD·Filed 2015·Granted Mar 20, 2018·338 cites·18 claims
- 0799USD803802SElectrostatic chuck for semiconductor manufacturing equipmentTOKYO ELECTRON LTD·Filed 2016·Granted Nov 28, 2017·285 cites·1 claims
- 0899USD802472SElectrostatic chuck for semiconductor manufacturing equipmentTOKYO ELECTRON LTD·Filed 2016·Granted Nov 14, 2017·280 cites·1 claims
- 0999US9803926B2Support mechanism and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Oct 31, 2017·280 cites·6 claims
- 1099USD795208SElectrostatic chuck for semiconductor manufacturing equipmentTOKYO ELECTRON LTD·Filed 2016·Granted Aug 22, 2017·445 cites·1 claims
- 1199US9613801B2Integration of absorption based heating bake methods into a photolithography track systemTOKYO ELECTRON LTD·Filed 2015·Granted Apr 4, 2017·464 cites·18 claims
- 1299US8343306B2Plasma processing apparatus and method of plasma distribution correctionTOKYO ELECTRON LTD·Filed 2008·Granted Jan 1, 2013·81 cites·5 claims
- 1399US8041197B2Heating apparatus, heat treatment apparatus, computer program and storage mediumTOKYO ELECTRON LTD·Filed 2008·Granted Oct 18, 2011·562 cites·21 claims
- 1499US8020315B2Substrate processing method, substrate processing apparatus, and program storage mediumTOKYO ELECTRON LTD·Filed 2007·Granted Sep 20, 2011·521 cites·6 claims
- 1599US7994070B1Low-temperature dielectric film formation by chemical vapor depositionTOKYO ELECTRON LTD·Filed 2010·Granted Aug 9, 2011·416 cites·18 claims
- 1699US7897217B2Method and system for performing plasma enhanced atomic layer depositionTOKYO ELECTRON LTD·Filed 2005·Granted Mar 1, 2011·442 cites·22 claims
- 1799US7816278B2In-situ hybrid deposition of high dielectric constant films using atomic layer deposition and chemical vapor depositionTOKYO ELECTRON LTD·Filed 2008·Granted Oct 19, 2010·523 cites·19 claims
- 1899US7767262B2Nitrogen profile engineering in nitrided high dielectric constant filmsTOKYO ELECTRON LTD·Filed 2006·Granted Aug 3, 2010·519 cites·22 claims
- 1999US7723648B2Temperature controlled substrate holder with non-uniform insulation layer for a substrate processing systemTOKYO ELECTRON LTD·Filed 2006·Granted May 25, 2010·551 cites·16 claims
- 2099USD616390SQuartz cover for manufacturing semiconductor wafersTOKYO ELECTRON LTD·Filed 2009·Granted May 25, 2010·419 cites·1 claims
- 2199USD616394SSupport of wafer boat for manufacturing semiconductor wafersTOKYO ELECTRON LTD·Filed 2009·Granted May 25, 2010·446 cites·1 claims
- 2299US7651961B2Method for forming strained silicon nitride films and a device containing such filmsTOKYO ELECTRON LTD·Filed 2007·Granted Jan 26, 2010·528 cites·27 claims
- 2399US7645484B2Method of forming a metal carbide or metal carbonitride film having improved adhesionTOKYO ELECTRON LTD·Filed 2006·Granted Jan 12, 2010·527 cites·25 claims
- 2499US7591601B2Coater/developer, coating/developing method, and storage mediumTOKYO ELECTRON LTD·Filed 2008·Granted Sep 22, 2009·464 cites·20 claims
- 2599USD583395SCover for a heater stage of a plasma processing apparatusTOKYO ELECTRON LTD·Filed 2007·Granted Dec 23, 2008·425 cites·1 claims
- 2699US7422636B2Plasma enhanced atomic layer deposition system having reduced contaminationTOKYO ELECTRON LTD·Filed 2005·Granted Sep 9, 2008·466 cites·21 claims
- 2799US7243610B2Plasma device and plasma generating methodTOKYO ELECTRON LTD·Filed 2002·Granted Jul 17, 2007·226 cites·20 claims
- 2899US6872259B2Method of and apparatus for tunable gas injection in a plasma processing systemTOKYO ELECTRON LTD·Filed 2002·Granted Mar 29, 2005·624 cites·49 claims
- 2999US6740853B1Multi-zone resistance heaterTOKYO ELECTRON LTD·Filed 2000·Granted May 25, 2004·782 cites·43 claims
- 3099US6699003B2Carrying deviceTOKYO ELECTRON LTD·Filed 2002·Granted Mar 2, 2004·522 cites·7 claims
- 3199US6506253B2Photo-excited gas processing apparatus for semiconductor processTOKYO ELECTRON LTD·Filed 2001·Granted Jan 14, 2003·538 cites·20 claims
- 3299US6494998B1Process apparatus and method for improving plasma distribution and performance in an inductively coupled plasma using an internal inductive elementTOKYO ELECTRON LTD·Filed 2000·Granted Dec 17, 2002·504 cites·19 claims
- 3399US6450757B1Conveyor systemTOKYO ELECTRON LTD·Filed 1999·Granted Sep 17, 2002·549 cites·6 claims
- 3499US6433298B1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Aug 13, 2002·428 cites·6 claims
- 3599US6247245B1Processing unit for substrate manufactureTOKYO ELECTRON LTD·Filed 1999·Granted Jun 19, 2001·461 cites·9 claims
- 3699US5718574AHeat treatment apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Feb 17, 1998·581 cites·23 claims
- 3798US11764092B2Substrate transfer apparatus and substrate processing systemTOKYO ELECTRON LTD·Filed 2020·Granted Sep 19, 2023·6 cites·4 claims
- 3898US11501995B2Plasma processing apparatus and mounting table thereofTOKYO ELECTRON LTD·Filed 2020·Granted Nov 15, 2022·7 cites·17 claims
- 3998US11476089B2Control method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Oct 18, 2022·7 cites·27 claims
- 4098US11302587B2Method for fabricating a 3D semiconductor apparatus having two vertically disposed seminconductor devicesTOKYO ELECTRON LTD·Filed 2020·Granted Apr 12, 2022·5 cites·20 claims
- 4198US10998169B2Systems and methods of control for plasma processingTOKYO ELECTRON LTD·Filed 2018·Granted May 4, 2021·44 cites·20 claims
- 4298US10991554B2Plasma processing system with synchronized signal modulationTOKYO ELECTRON LTD·Filed 2018·Granted Apr 27, 2021·49 cites·20 claims
- 4398US10991626B2Method for controlling transistor delay of nanowire or nanosheet transistor devicesTOKYO ELECTRON LTD·Filed 2020·Granted Apr 27, 2021·6 cites·13 claims
- 4498US10978274B2Plasma processing apparatus and method for generating plasmaTOKYO ELECTRON LTD·Filed 2019·Granted Apr 13, 2021·42 cites·10 claims
- 4598US10847363B2Method of selective deposition for forming fully self-aligned viasTOKYO ELECTRON LTD·Filed 2018·Granted Nov 24, 2020·39 cites·20 claims
- 4698US10763139B2Vacuum transfer module and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Sep 1, 2020·338 cites·15 claims
- 4798US10734224B2Method and device for incorporating single diffusion break into nanochannel structures of FET devicesTOKYO ELECTRON LTD·Filed 2018·Granted Aug 4, 2020·20 cites·15 claims
- 4898US10672596B2Ionized physical vapor deposition (IPVD) apparatus and method for an inductively coupled plasma sweeping sourceTOKYO ELECTRON LTD·Filed 2017·Granted Jun 2, 2020·40 cites·28 claims
- 4998US10665434B2Slip ring, support mechanism, and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2016·Granted May 26, 2020·43 cites·15 claims
- 5098US10622196B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Apr 14, 2020·341 cites·13 claims
Showing the top 50 of 13,045 patent records by PatentIndex Score.
Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →