Apparatus and methods for heating tunability in processing chambers

Abstract

Embodiments herein are generally directed to electronic device manufacturing and, more particularly, to systems and methods for lamp heating in thermal processing chambers. In an embodiment, an adjustable reflector includes a plurality of reflector elements. Each of the plurality of elements as a first surface, a second surface, and a plurality of sidewalls. The first surface is a reflective surface and is configured to face a lamp. The adjustable reflector includes one or more actuation mechanisms coupled to the plurality of elements. A method of thermally processing a substrate includes measuring a thermal intensity of a thermal profile of an area of a substrate under or over a lamp and the adjustable reflector, and in response to the thermal intensity being outside of desired parameters, adjusting the reflector profile of the reflector assembly along a centerline path.

What is claimed is: 
     
         1 . An adjustable reflector assembly, comprising:
 a plurality of reflector elements, each of the plurality of reflector elements having a first surface, a second surface, and a plurality of sidewalls, wherein the first surface is a reflective surface and is configured to face a lamp; and   one or more actuation mechanisms coupled to the plurality of reflector elements.   
     
     
         2 . The adjustable reflector assembly of  claim 1 , wherein the adjustable reflector assembly is an edge reflector assembly configured to reflect heat to an outer edge of a substrate. 
     
     
         3 . The adjustable reflector assembly of  claim 1 , wherein a portion of an inner sidewall of each of the plurality of sidewalls and the first surface of each of the plurality of reflector elements comprises a reflective coating. 
     
     
         4 . The adjustable reflector assembly of  claim 1 , wherein the one or more actuation mechanisms is configured to align a center point of each of the plurality of reflector elements along a centerline path. 
     
     
         5 . The adjustable reflector assembly of  claim 4 , wherein the centerline path is convex, concave, or asymmetrically configured. 
     
     
         6 . The adjustable reflector assembly of  claim 1 , wherein each of the plurality of reflector elements further comprises at least one aperture extending through each element to form a cooling channel through the adjustable reflector assembly. 
     
     
         7 . The adjustable reflector assembly of  claim 1 , wherein the lamp is a polygon, linear, or small horizontal or vertical lamp. 
     
     
         8 . A substrate processing chamber, comprising:
 a chamber body comprising a lid, a floor, and a processing volume disposed between the lid and the floor;   an upper window disposed between the lid and the processing volume;   a lower window disposed between the floor and the processing volume;   a substrate support disposed in the processing volume;   a lamp head positioned either below the lower window or above the upper window;   at least one lamp disposed within the lamp head; and   a reflector assembly disposed on one side of the at least one lamp, the reflector assembly comprising a plurality of elements, and one or more actuation mechanisms coupled to the plurality of elements, wherein a first surface of each of the plurality of elements is a reflective surface.   
     
     
         9 . The substrate processing chamber of  claim 8 , wherein the reflector assembly is an edge reflector assembly configured to reflect heat to an outer edge of a substrate. 
     
     
         10 . The substrate processing chamber of  claim 8 , wherein each of the plurality of elements comprises an inner sidewall having a reflective coating, and wherein the first surface comprises a reflective coating. 
     
     
         11 . The substrate processing chamber of  claim 8 , wherein the one or more actuation mechanisms are configured to align a center point of each of the plurality of elements along a centerline path. 
     
     
         12 . The substrate processing chamber of  claim 11 , wherein the centerline path is convex, concave, or angled. 
     
     
         13 . The substrate processing chamber of  claim 8 , wherein each of the plurality of elements further comprises at least one aperture extending through each element. 
     
     
         14 . The substrate processing chamber of  claim 13 , wherein the at least one aperture of each of the plurality of elements forms a cooling channel through the reflector assembly. 
     
     
         15 . The substrate processing chamber of  claim 14 , wherein the cooling channel is configured to allow a fluid flow through the reflector assembly. 
     
     
         16 . A method of thermally processing a substrate, comprising:
 measuring a thermal intensity of a thermal profile, using a system of pyrometers, of an area of a substrate under or over a lamp and a reflector assembly comprising a plurality of elements, wherein a first surface of the plurality of elements provide a reflector profile;   determining if the thermal intensity is outside of desired parameters; and   in response to the thermal intensity being outside of desired parameters, adjusting the reflector profile of the reflector assembly along a centerline path using an actuation mechanism coupled to the reflector assembly.   
     
     
         17 . The method of  claim 16 , further comprising:
 in response to adjusting the reflector profile, measuring the thermal intensity and determining if the thermal intensity is within desired parameters.   
     
     
         18 . The method of  claim 16 , wherein adjusting the reflector profile comprises receiving input from a user interface. 
     
     
         19 . The method of  claim 16 , wherein adjusting the reflector profile comprises receiving instructions from a controller coupled to the actuation mechanism and the system of pyrometers to adjust to a pre-determined reflector profile. 
     
     
         20 . The method of  claim 16 , further comprising:
 receiving an input from a user interface; and   in response to receiving the input, adjusting the reflector profile based on the input.