Membrane and substrate polishing device including the same

Abstract

A substrate polishing device includes a carrier head, a membrane connected to the carrier head, and a retainer ring connected to the carrier head to surround an outer side of the membrane. The membrane includes a side wall formed in an annular shape, a bottom flap extending in an inward direction from a lower end of the side wall and intended to come in direct contact with a substrate, and an upper flap extending from an upper end of the side wall and intended to connect to the carrier head.

What is claimed is: 
     
         1 . A substrate polishing device comprising: 
 a carrier head;   a membrane connected to the carrier head; and   a retainer ring connected to the carrier head to surround an outer side of the membrane,   wherein the membrane comprises: 
 a side wall formed in an annular shape; 
 a bottom flap extending in an inward direction from a lower end of the side wall and intended to come in direct contact with a substrate; and 
 an upper flap extending from an upper end of the side wall and intended to connect to the carrier head. 
   
     
     
         2 . The substrate polishing device of  claim 1 , wherein 
       the bottom flap extends from the lower end of the side wall toward a center of the membrane by a designated length so that a hollow is formed in a bottom surface of the membrane. 
     
     
         3 . The substrate polishing device of  claim 2 , wherein, 
       based on a state in which the substrate is in contact with a lower surface of the bottom flap, a pressure chamber is formed between a lower surface of the carrier head, the upper flap, the side wall, the bottom flap, and an upper surface of the substrate. 
     
     
         4 . The substrate polishing device of  claim 3 , wherein 
       the pressure chamber is formed as a single chamber. 
     
     
         5 . The substrate polishing device of  claim 3 , further comprising: 
 a first pressurizing unit configured to control an internal pressure of the pressure chamber in order to control a downward pressure applied to the substrate.   
     
     
         6 . The substrate polishing device of  claim 1 , wherein the bottom flap comprises: 
 a protrusion protruding upward from an inner end portion.   
     
     
         7 . The substrate polishing device of  claim 1 , wherein the upper flap comprises: 
 a first upper flap extending in an upward direction from the upper end of the side wall; and   a second upper flap extending in the inward direction from the upper end of the side wall.   
     
     
         8 . The substrate polishing device of  claim 7 , wherein, 
       based on a state in which the first upper flap and the second upper flap are connected to the carrier head, an upper chamber is formed between the first upper flap, the second upper flap, and the carrier head. 
     
     
         9 . The substrate polishing device of  claim 8 , further comprising: 
 a second pressurizing unit configured to control an internal pressure of the upper chamber in order to control a vertical position of the bottom flap or a degree of contact between the bottom flap and the substrate.   
     
     
         10 . The substrate polishing device of  claim 7 , wherein 
       a length by which the bottom flap extends in the inward direction from the lower end of the side wall is less than a length by which the second upper flap extends in the inward direction from the upper end of the side wall. 
     
     
         11 . The substrate polishing device of  claim 7 , wherein the first upper flap comprises: 
 a bent portion formed bent to be vertically stretchable.   
     
     
         12 . A membrane to be connected to a carrier head, the membrane comprising: 
 a side wall formed in an annular shape;   a bottom flap extending in an inward direction from a lower end of the side wall and intended to come in contact with a substrate; and   an upper flap extending from an upper end of the side wall and intended to connect to a carrier head.   
     
     
         13 . The membrane of  claim 12 , wherein 
       the bottom flap extends from the lower end of the side wall toward a center of the membrane by a designated length so that a hollow is formed in a bottom surface of the membrane. 
     
     
         14 . The membrane of  claim 12 , wherein the bottom flap comprises: 
 a protrusion protruding upward from an inner end portion.   
     
     
         15 . The membrane of  claim 12 , wherein the upper flap comprises: 
 a first upper flap extending in an upward direction from the upper end of the side wall; and   a second upper flap extending in the inward direction from the upper end of the side wall.   
     
     
         16 . The membrane of  claim 15 , wherein 
       a length by which the bottom flap extends in the inward direction from the lower end of the side wall is less than a length by which the second upper flap extends in the inward direction from the upper end of the side wall. 
     
     
         17 . The membrane of  claim 15 , wherein the first upper flap comprises: 
 a bent portion formed bent to be vertically stretchable.