System for receiving and retaining a substrate

Abstract

The invention refers to a receiving and supporting system for a substrate ( 17 ) in an exposure system, which is provided with a handling system for the supply of the substrate ( 17 ), with an electrostatic chuck arrangement ( 1 ) moveable in X, Y coordinates, for the support of the substrate ( 17 ) during the exposure, and with an exposure optic, from which a right angled particle radiation, in Z-direction is directed toward the substrate surface. In regard to the respective supporting system, at least a second electrostatic chuck arrangement ( 6 ) is provided, which—similar to the first chuck arrangement ( 1 ), for the support of the substrate ( 17 ) during the exposure, provides a bearing surface for the substrate, whereby the bearing surface of this second chuck arrangement ( 6 ) is positioned movable in Z coordinate. In regard to their supporting force, both chuck arrangements ( 1, 6 ) are arranged in such a manner, that the substrate ( 17 ) is securely positioned when being supported either on the first chuck arrangement ( 1 ) or when being supported exclusively on the second chuck arrangement ( 6 ).

What is claimed is:  
     
       1. Receiving and supporting system for a substrate ( 17 ) in an exposure system, provided with an electrostatic chuck arrangement ( 1 ), moveable in X, Y coordinate, for supporting of the substrate ( 17 ) on a bearing surface ( 5 ) during exposure, characterized in that at least a second electro-static chuck arrangement ( 6 ) is provided, supplied with an additional bearing surface ( 7 ) for the substrate ( 17 ), whereby the second chuck arrangement ( 6 ) with its bearing surface ( 7 ) is positioned moveable in direction Z-coordinate relatively to the bearing surface ( 5 ) of the first chuck arrangement ( 1 ). 
     
     
       2. Receiving and supporting system according to  claim 1 , characterized in that the sum of the two bearing surfaces ( 5 , 7 ) correspond approximately to the surface expansion of the substrate ( 17 ) to be supported. 
     
     
       3. Receiving and supporting system according to  claim 1 , characterized in that the second chuck arrangement ( 6 ) is moveable in Z-direction up to the back position Z 2  in front of the bearing surface ( 5 ), which corresponds to a receiving position for the substrate ( 17 ). 
     
     
       4. Receiving and supporting system according to  claim 1 , characterized in that the second chuck arrangement ( 6 ) is moveable in a Position Z 1 , in which the bearing surfaces ( 5 , 7 ) are on a mutual plane, whereby the position Z 1  corresponds to the supporting position of the substrate ( 17 ) during the exposure. 
     
     
       5. Receiving and supporting system according to  claim 1 , characterized in that the second chuck arrangement ( 6 ) is moveable in a position Z 2 , in which the bearing surface ( 7 ) is positioned behind the bearing surface ( 5 ). 
     
     
       6. Receiving and supporting system according to  claim 1 , characterized in that the bearing surfaces ( 5 , 7 ) are built as circular areas, positioned centric to one another, whereby the bearing surface ( 7 ) is encircled by the bearing surface ( 5 ), having an expansion of less than ⅓, preferably ¼ of the bearing surface ( 5 ). 
     
     
       7. Receiving and supporting system according to  claim 1 , characterized in that the Y coordinate is positioned parallel to gravity direction and the coordinates X, Z right angled to the direction of gravity influence. 
     
     
       8. Receiving and supporting system according to  claim 1 , characterized in that the two chuck arrangements ( 1 , 6 ) are connected to a lifting device ( 3 ), linearly moveable in Y coordinate, whereby the first chuck arrangement ( 1 ) is firmly attached to the lifting device ( 3 ) and the second chuck arrangement ( 6 ) is coupled to the lifting device ( 3 ) via a linear drive, that serves as Z motion of the second chuck arrangement ( 6 ). 
     
     
       9. Receiving and supporting system according to  claim 8 , characterized in that the first chuck arrangement ( 1 ) is connected to the lifting device ( 3 ) by means of a mounting plate ( 2 ). 
     
     
       10. Receiving and supporting system according to  claim 8 , characterized in that the lifting device ( 3 ) is attached to a column ( 4 ) positioned parallel to Y coordinate, and along this column ( 4 ) is movable straight-guided by means of skids and/or rollers ( 18 ), whereby in addition to the skids and/or rollers ( 18 ), electrically driven clamp devices for occasional click-stop detents of the lifting device ( 3 ) are provided. 
     
     
       11. Receiving and supporting system according to  claim 10 , characterized in that the clamp devices are coupled with piezo-electric drives. 
     
     
       12. Receiving and supporting system according to  claim 1 , characterized in that the column ( 4 ) is connected with at least one X carriage. 
     
     
       13. Receiving and supporting system according to  claim 1 , characterized in that a pneumatic drive ( 11 ) is provided as linear drive of the second chuck arrangement ( 6 ). 
     
     
       14. Receiving and supporting system according to  claim 1 , characterized in that each of the two chuck arrangements ( 1 , 6 ) is composed of a basic body ( 8 , 9 ), having at least partly electrically conductive layers ( 13 , 15 ) each with an insulation layer ( 14 , 16 ) above it, whereby the insulation layers ( 14 , 16 ) form the bearing surfaces ( 5 , 7 ) for the substrate ( 17 ). 
     
     
       15. Receiving and supporting system according to  claim 1 , characterized in that the mounting plate ( 2 ) and the basic bodies ( 8 , 9 ) are manufactured from glass ceramic, having a thermal expansion coefficient α T =0±0.05*10 −6 K −1  and modulus of elasticity of E≈90.6 GPa. 
     
     
       16. Receiving and supporting system according to  claim 1 , characterized in that the skids and/or rollers ( 18 ) and the column ( 4 ) are made of a solid glass ceramic with a modulus of elasticity of approximately 300 to 400 GPa. 
     
     
       17. Receiving and supporting system according to  claim 1 , characterized in that firstly during the receiving of the substrate ( 17 ), the electrically conductive layer ( 15 ) of the second chuck arrangement ( 6 ) on the one hand side, and the substrate ( 17 ) on the other hand side, and secondly during the support of the substrate ( 17 ) in exposure position, the electrically conductive layer ( 13 ) of the first chuck arrangement ( 1 ) as well as the substrate ( 17 ) are connected to an electric potential of up to 5000 Volts. 
     
     
       18. Receiving and supporting system according to  claim 1 , characterized in that two mirrors ( 19 , 20 ) are attached to the mounting plate ( 2 ) and/or the first chuck arrangement ( 1 ), serving as reference mirrors for a metrology system, and of which respectively one of them is directed to X, Y coordinates. 
     
     
       19. Receiving and supporting system according to  claim 1 , characterized in that the mounting plate ( 2 ) and/or the basic bodies ( 8 , 9 ) are provided with material recesses for weight reduction. 
     
     
       20. Receiving and supporting system according to  claim 1 , characterized in that the insulation layers ( 14 , 16 ) are provided with channels for a coolant, whereby the channels lead to inlets/outlets for the coolant and as a coolant, preferably helium is applied.