Substrate processing apparatus

Abstract

A substrate processing apparatus that includes an outer tank, an inner tank, and opposed electrodes. The inner tank is provided in the outer tank and the opposed electrodes are provided in the inner tank. A distance between the opposed electrodes can be changed in a state in which the inner tank can completely confine plasma therein. The inner tank includes first and second inner tank constituent members, and the state in which the inner tank can completely confine plasma therein is established by superposing a side wall of the second inner tank constituent member on a side wall of the first inner tank constituent member.

What is claimed is:  
     
       1. A substrate processing apparatus, comprising: 
       an outer tank,  
       an inner tank provided in said outer tank, and  
       opposed electrodes provided in said inner tank, wherein  
       a distance between said opposed electrodes can be changed in a state in which said inner tank can completely confine plasma therein, and  
       said inner tank comprises first and second inner tank constituent members, and said state in which said inner tank can completely confine plasma therein is established by superposing a side wall of said second inner tank constituent member on a side wall of said first inner tank constituent member.  
     
     
       2. A substrate processing apparatus according to  claim 1 , wherein said opposed electrodes comprise first and second electrodes which are opposed to each other, 
       said first electrode is disposed closer to said first inner tank constituent member,  
       said second electrode is disposed closer to said second inner tank constituent member, and  
       said second electrode can move in a state in which said side wall of said second inner tank constituent member is superposed on said side wall of said first inner tank constituent member.  
     
     
       3. A substrate processing apparatus according to  claim 2 , wherein a least one of said side wall of said first inner tank constituent member and said side wall of said second inner tank constituent member comprises a plurality of auxiliary side walls, and 
       said state in which said side wall of said second inner tank constituent member is superposed on said side wall of said first inner tank constituent member is a state in which said plurality of auxiliary side walls of one of said side wall of said first inner tank constituent member and said side wall of said second inner tank constituent member, and said side wall of the other of said first inner tank constituent member and said side wall of said second inner tank constituent member are superposed on each other.  
     
     
       4. A substrate processing apparatus according to  claim 1 , further comprising an exhaust located under lower one of the opposed electrodes, thereby a gas after substrate processing flows into under the lower one of the opposed electrodes. 
     
     
       5. A substrate processing apparatus, comprising: 
       an outer tank,  
       an inner tank provided in said outer tank, and  
       opposed electrodes provided in said inner tank, wherein  
       said inner tank can completely confine plasma therein with respect to two or more different distances between said opposed electrodes, and  
       said inner tank comprises first and second inner tank constituent members, and said state in which said inner tank can completely confine plasma therein is established by superposing a side wall of said second inner tank constituent member on a side wall of said first inner tank constituent member.  
     
     
       6. A substrate processing apparatus according to  claim 5 , wherein said opposed electrodes comprise first and second electrodes which are opposed to each other, 
       said first electrode is disposed closer to said first inner tank constituent member,  
       said second electrode is disposed closer to said second inner tank constituent member, and  
       said side wall of said second inner tank constituent member can be superposed on said side wall of said first inner tank constituent member with respect to two or more different positions of said second electrode.  
     
     
       7. A substrate processing apparatus, comprising: 
       an outer tank,  
       an inner tank provided in said outer tank, and  
       opposed electrodes provided in said inner tank, wherein  
       a distance between said opposed electrodes can be changed in a state in which said inner tank is closed,  
       said inner tank comprises first and second inner constituent members, and said inner tank is closed by superposing a side wall of said second inner tank constituent member on a side wall of said first inner tank constituent member,  
       at least one of said side wall of said first inner tank constituent member and said side wall of said second inner tank constituent member comprises a plurality of auxiliary side walls, and  
       said plurality of auxiliary side walls of one of said side wall of said first inner tank constituent member and said side wall of said second inner tank constituent member, and said side wall of the other of said first inner tank constituent member and said side wall of said second inner tank constituent member are superposed on each other, thereby closing said inner tank.  
     
     
       8. A substrate processing apparatus, comprising: 
       an outer tank,  
       an inner tank provided in said outer tank, and  
       opposed electrodes provided in said inner tank wherein  
       said inner tank can be closed with respect to two or more different distances between said opposed electrodes,  
       said inner tank comprises first and second inner constituent members, and said inner tank is closed by superposing a side wall of said second inner tank constituent member on a side wall of said first inner tank constituent member,  
       at least one of said side wall of said first inner tank constituent member and said side wall of said second inner tank constituent member comprises a plurality of auxiliary side walls, and  
       said plurality of auxiliary side walls of one of said side wall of said first inner tank constituent member and said side wall of said second inner tank constituent member, and said side wall of the other of said first inner tank constituent member and said side wall of said second inner tank constituent member are superposed on each other, thereby closing said inner tank.  
     
     
       9. A substrate processing apparatus, comprising: 
       an outer tank,  
       an inner tank provided in said outer tank, and  
       opposed electrodes provided in said inner tank, wherein  
       a distance between said opposed electrodes can be changed in a state in which said inner tank can confine plasma therein,  
       said inner tank comprises first and second inner tank constituent members,  
       said state in which said inner tank can confine plasma therein is established by bringing said second inner tank constituent member into contact with said first inner tank constituent member,  
       said opposed electrodes comprise first and second electrodes which are opposed to each other,  
       said first electrode is disposed closer to said first inner tank constituent member,  
       said second electrode is disposed closer to said second inner tank constituent member,  
       said second electrode can move in a state in which said second inner tank constituent member is in contact with said first inner tank constituent member,  
       said substrate processing apparatus further comprises a further inner tank constituent member coupled to said second electrode, and  
       a further inner tank can be formed in said inner tank by bringing said further inner tank constituent member into abutment against said first inner tank constituent member.  
     
     
       10. A substrate processing apparatus according to  claim 9 , further comprising a heater provided in or coupled to said second electrode. 
     
     
       11. A substrate processing apparatus according to  claim 9 , wherein said further inner tank constituent member is provided around said second electrode. 
     
     
       12. A substrate processing apparatus, comprising: 
       an outer tank,  
       an inner tank provided in said outer tank, and  
       opposed electrodes provided in said inner tank, wherein  
       said inner tank can confine plasma therein with respect to two or more different distances between said opposed electrodes,  
       said inner tank comprises first and second inner tank constituent members,  
       said state in which said inner tank can confine plasma therein is established by bringing said second inner tank constituent member into contact with said first inner tank constituent member,  
       said opposed electrodes comprise first and second electrodes which are opposed to each other,  
       said first electrode is disposed closer to said first inner tank constituent member,  
       said second electrode is disposed closer to said second inner tank constituent member,  
       said second inner tank constituent member can contact said first inner tank constituent member with respect to two or more different distances between said opposed electrodes,  
       said substrate processing apparatus further comprises a further inner tank constituent member coupled to said second electrode, and a further inner tank can be formed in said inner tank by bringing said further inner tank constituent member into abutment against said first inner tank constituent member.  
     
     
       13. A substrate processing apparatus comprising: 
       an outer tank,  
       an inner tank provided in said outer tank, and  
       opposed electrodes provided in said inner tank, wherein  
       a distance between said opposed electrodes can be changed in a state in which said inner tank is closed, and  
       said inner tank comprises first and second inner tank constituent members, and said state in which said inner tank is closed is established by superposing a side wall of said second inner tank constituent member on a side wall of said first inner tank constituent member.  
     
     
       14. A substrate processing apparatus according to  claim 13 , wherein said opposed electrodes comprise first and second electrodes which are opposed to each other, 
       said first electrode is disposed closer to said first inner tank constituent member,  
       said second electrode is disposed closer to said second inner tank constituent member, and  
       said second electrode can move in a state in which said side wall of said second inner tank constituent member is superposed on said side wall of said first inner tank constituent member.  
     
     
       15. A substrate processing apparatus according to  claim 14 , wherein at least one of said side wall of said first inner tank constituent member and said side wall of said second inner tank constituent member comprises a plurality of auxiliary side walls, and 
       said state in which said side wall of said second inner tank constituent member is superposed on said side wall of said first inner tank constituent member is a state in which said plurality of auxiliary side walls of one of said side wall of said first inner tank constituent member and said side wall of said second inner tank constituent member, and said side wall of the other of said first inner tank constituent member and said side wall of said second inner tank constituent member are superposed on each other.  
     
     
       16. A substrate processing apparatus according to  claim 13 , further comprising an exhaust located under lower one of the opposed electrodes, thereby a gas after substrate processing flows into under the lower one of the opposed electrodes. 
     
     
       17. A substrate processing apparatus comprising: 
       an outer tank,  
       an inner tank provided in said outer tank, and  
       opposed electrodes provided in said inner tank, wherein  
       said inner tank can be closed with respect to two or more different distances between said opposed electrodes, and  
       said inner tank comprises first and second inner tank constituent members, and said state in which said inner tank is closed is established by superposing a side wall of said second inner tank constituent member on a side wall of said first inner tank constituent member.  
     
     
       18. A substrate processing apparatus according to  claim 17 , wherein said opposed electrodes comprise first and second electrodes which are opposed to each other, 
       said first electrode is disposed closer to said first inner tank constituent member,  
       said second electrode is disposed closer to said second inner tank constituent member, and  
       said side wall of said second inner tank constituent member can be superposed on said side wall of said first inner tank constituent member with respect to two or more different positions of said second electrode.  
     
     
       19. A substrate processing apparatus according to  claim 18 , wherein at least one of said side wall of said first inner tank constituent member and said side wall of said second inner tank constituent member comprises a plurality of auxiliary side walls, and 
       said state in which said side wall of said second inner tank constituent member is superposed on said side wall of said first inner tank constituent member is a state in which said plurality of auxiliary side walls of one of said side wall of said first inner tank constituent member and said side wall of said second inner tank constituent member, and said side wall of the other of said first inner tank constituent member and said side wall of said second inner tank constituent member are superposed on each other.  
     
     
       20. A substrate processing apparatus according to  claim 17 , further comprising an exhaust located under lower one of the opposed electrodes, thereby a gas after substrate processing flows into under the lower one of the opposed electrodes.