Exposure technique

Abstract

An atmosphere control technique for an exposure apparatus. An exposure apparatus to which this technique is applied includes, for example, a chamber which contains a space through which exposure light passes, a circulation system which has a path and circulates an inert gas through the path and the chamber, at least one valve provided in the path, a supply system which has a supply port at one end of a zone of the path defined by the at least one valve and supplies an inert gas to the supply port, and an exhaust system which has an exhaust port at the other end of the zone and exhausts a gas from the exhaust port.

1. An exposure apparatus for exposing a substrate to light, said exposure apparatus comprising:
 a chamber configured to enclose a space through which the light passes; 
 a circulation system having a path connected to the space and configured to circulate inert gas through the path and the space; 
 at least one valve provided in the path and configured to openably close the path to define both ends of a first zone including the space; 
 a supply system having a supply port at one of the both ends and configured to supply the inert gas to the first zone through said supply port with said valve closed; and 
 an exhaust system having an exhaust port at the other of the both ends and configured to exhaust gas from the first zone through said exhaust port with said valve closed. 
 
   
   
     2. An apparatus according to  claim 1 , wherein said at least one valve is configured to further define a second zone of the path, said supply system being further configured to supply the inert gas to the second zone with said valve closed, said exhaust system being further configured to exhaust gas from the second zone with said valve closed. 
   
   
     3. An apparatus according to  claim 2 , further comprising a filter provided in one of the first and second zones and configured to remove contaminants in the path. 
   
   
     4. An apparatus according to  claim 3 , further comprising a removal system configured to remove moisture in said filter. 
   
   
     5. An apparatus according to  claim 4 , wherein said removal system comprises a heater configured to heat said filter. 
   
   
     6. An apparatus according to  claim 5 , wherein said removal system comprises a drain configured to discharge condensed water. 
   
   
     7. An apparatus according to  claim 4 , wherein said removal system comprises a vacuum pump configured to evacuate the zone in which said filter is provided. 
   
   
     8. An apparatus according to  claim 1 , further comprising a detector configured to detect a concentration of an impurity in gas in the first zone. 
   
   
     9. An apparatus according to  claim 8 , wherein said valve is configured to be opened based on a detection performed by said detector. 
   
   
     10. An apparatus according to  claim 1 , further comprising at least one of a blower configured to blow gas in the path, a filter configured to remove contaminants in the path, and a temperature control system configured to control the temperature of gas in the path. 
   
   
     11. A method according to  claim 10 , further comprising a step of detecting, by a detector, a concentration of an impurity in gas in the zone. 
   
   
     12. A method according to  claim 11 , further comprising a step of opening the at least one valve based on the detection performed in the detecting step. 
   
   
     13. A device manufacturing method comprising steps of:
 exposing a substrate to a pattern using an exposure apparatus as defined in  claim 1 ; 
 developing the exposed substrate; and 
 processing the developed substrate to manufacture the device. 
 
   
   
     14. An atmosphere control method adapted to an exposure apparatus for exposing a substrate to light, the exposure apparatus including a chamber configured to enclose a space through which the light passes and a circulation system having a path connected to the space and configured to circulate inert gas through the path and the space, said method comprising steps of:
 closing at least one valve provided in the path to define both ends of a zone including the space; 
 supplying inert gas to one of the both ends with the valve closed; and 
 exhausting gas from the other of the both ends with the valve closed.