Ion beam irradiation apparatus and ion beam irradiation method

Abstract

The ion beam irradiation apparatus has a vacuum chamber 10 , an ion source 2 , a substrate driving mechanism 30 , rotation shafts 14 , arms 12 , and a motor. The ion source 2 is disposed inside the vacuum chamber 10 , and emits an ion beam 4 which is larger in width than a substrate 6 , to the substrate 6 . The substrate driving mechanism 30 reciprocally drives the substrate 6 in the vacuum chamber 10 . The center axes 14 a of the rotation shafts 14 are located in a place separated from the ion source 2 toward the substrate, and substantially parallel to the surface of the substrate. The arms 12 are disposed inside the vacuum chamber 10 , and support the ion source 2 through the rotation shafts 14 . The motor is disposed outside the vacuum chamber 10 , and reciprocally rotates the rotation shaft 14.

1. An ion beam irradiation apparatus comprising:
 a vacuum chamber which is to be evacuated to a vacuum; 
 an ion source which is disposed inside said vacuum chamber, and which irradiates a substrate to be processed with an ion beam that is larger in width than the substrate; 
 a substrate driving mechanism which drives the substrate in said vacuum chamber in a direction that is substantially perpendicular to a width direction of the ion beam emitted from said ion source; 
 a rotation shaft which is passed through said vacuum chamber, and a center axis of which is located in a place separated from said ion source toward the substrate, and substantially parallel to a surface of the substrate; 
 an arm which is disposed inside said vacuum chamber, and which supports said ion source through said rotation shaft; and 
 a motor which is disposed outside said vacuum chamber, and which reciprocally rotates said rotation shaft, 
 said ion source being supported to be rotatable about said center axis of said rotation shaft. 
 
   
   
     2. An ion beam irradiation apparatus according to  claim 1 , wherein a distance between said center axis of said rotation shaft and the surface of the substrate is equal to or less about a half of a width of said ion source on a side of a rotation direction, or a width on a side of an outlet of said ion source. 
   
   
     3. An ion beam irradiation apparatus according to  claim 1 , wherein said rotation shaft and said arm are configured by a hollow magnetic member to have a magnetic shielding function, and set to a ground potential, and a conductor through which an electric power is supplied from an outside of said vacuum chamber to said ion source is passed through in said rotation shaft and said arm. 
   
   
     4. An ion beam irradiation apparatus according to  claim 1 ,  2 , or  3 , wherein a beam measuring instrument which measures a current density distribution in the width direction of the ion beam emitted from said ion source is disposed at a position which is inside said vacuum chamber, and which is opposed to said ion source across a passage for the substrate, said ion source being located at a predetermined angle with respect to the substrate. 
   
   
     5. An ion beam irradiation apparatus according to  claim 4 , wherein said beam measuring instrument is disposed at a position opposed to said ion source which is located at an angle that is substantially perpendicular to the substrate.