Exposure apparatus, and device manufacturing method

Abstract

A lithographic projection apparatus includes an illumination system that conditions a radiation beam, a support structure that holds a patterning device, the patterning device being capable of imparting the radiation beam with a pattern. a substrate table that holds a substrate, and a projection system that projects the patterned radiation beam onto a target portion of the substrate. In addition, a liquid supply system provides a liquid to a space between the projection system and the substrate, the liquid supply system having a member. A liquid seal device forms a liquid seal between the member and the substrate.

1. A lithographic projection apparatus comprising:
 an illumination system that conditions a radiation beam; 
 a support structure that holds a patterning device, the patterning device imparting the radiation beam with a pattern; 
 a substrate table on which a substrate is held; 
 a projection system that projects the patterned radiation beam onto a target portion of the substrate held by the substrate table; and 
 a liquid supply system that provides a liquid to a space between the projection system and the substrate, wherein 
 the liquid supply system
 comprises a member and a liquid inlet in the member that supplies a liquid between the member and the substrate, and 
 prevents the liquid from leaking from between the member and a part of the substrate, and 
 the liquid held between the member and the part of the substrate moves, as a whole, on the substrate by movement of the substrate table. 
 
 
     
     
       2. Apparatus according to  claim 1 , wherein the inlet is part of a liquid bearing. 
     
     
       3. Apparatus according to  claim 1 , wherein the inlet is part of a hydrostatic bearing. 
     
     
       4. Apparatus according to  claim 1 , wherein the inlet is part of a liquid bearing that at least partially supports the member above a surface of the substrate. 
     
     
       5. Apparatus according to  claim 1 , wherein the member further comprises a shared liquid outlet that removes liquid from the space and liquid supplied from the liquid inlet, the shared liquid outlet located on a surface of the member that faces an upper surface of the substrate. 
     
     
       6. Apparatus according to  claim 5 , wherein the shared liquid outlet is positioned between the space and the liquid inlet. 
     
     
       7. Apparatus according to  claim 5 , wherein the shared liquid outlet has a cross sectional area in a plane substantially parallel to the substrate which is determined in accordance with a cross sectional area of the liquid inlet. 
     
     
       8. Apparatus according to  claim 1 , wherein the liquid supply system further comprises an outlet that prevents leakage of liquid in an outward radial direction relative to an axis of the projection system, the outlet located on a surface of the member which faces an upper surface of the substrate. 
     
     
       9. Apparatus according to  claim 1 , further comprising a support member that supports the member. 
     
     
       10. Apparatus according to  claim 1 , wherein the member further comprises a second liquid inlet, and a liquid outlet. 
     
     
       11. Apparatus according to  claim 1 , wherein the liquid supply system supplies liquid to the space at a pressure which compensates for liquid transported away from the space by relative movement between the substrate and the member. 
     
     
       12. Apparatus according to  claim 1 , further comprising:
 a sensor that determines a distance between the member and the substrate; and 
 a controller that performs a control operation based on the distance determined by the sensor. 
 
     
     
       13. Apparatus according to  claim 12 , wherein the controller maintains a desired distance between a surface of the substrate and the member. 
     
     
       14. A lithographic projection apparatus comprising:
 an illumination system that conditions a radiation beam; 
 a support structure that holds a patterning device, the patterning device imparting the radiation beam with a pattern; 
 a substrate table on which a substrate is held; 
 a projection system that projects the patterned radiation beam onto a target portion of the substrate held by the substrate table; 
 a liquid supply system that provides a liquid to a space between the projection system and the substrate, the liquid supply system comprising a member, wherein the member comprises a liquid inlet located on a surface of the member which extends parallel to and faces the substrate; and 
 a sensor that determines a distance between the substrate and the member. 
 
     
     
       15. Apparatus according to  claim 14 , wherein the liquid supply system further comprises an outlet located on the surface of the member which faces the substrate. 
     
     
       16. Apparatus according to  claim 14 , wherein the liquid supply system further comprises an outlet that prevents leakage of liquid in an outward radial direction relative to an axis of the projection system. 
     
     
       17. Apparatus according to  claim 14 , wherein the liquid supply system further comprises an outlet that prevents leakage of liquid in an outward radial direction relative to an axis of the projection system, the outlet located on the surface of the member which faces the substrate. 
     
     
       18. Apparatus according to  claim 14 , further comprising a support member that supports the member. 
     
     
       19. Apparatus according to  claim 14 , wherein the liquid supply system supplies liquid to the space at a pressure which compensates for liquid transported away from the space by relative movement between the substrate and the member. 
     
     
       20. Apparatus according to  claim 14 , further comprising:
 a controller that performs a control operation based on the distance determined by the sensor. 
 
     
     
       21. Apparatus according to  claim 20 , wherein the controller maintains a desired distance between a surface of the substrate and the member. 
     
     
       22. Apparatus according to  claim 14 , further comprising a liquid bearing on the member. 
     
     
       23. Apparatus according to  claim 14 , further comprising a hydrostatic bearing on the member. 
     
     
       24. A device manufacturing method comprising:
 providing a liquid to a space between a projection system of a lithographic apparatus and a substrate, the space being bounded at least in part by a member; 
 supplying, from an inlet in the member, a liquid between the member and the substrate to prevent the liquid from leaking from between the member and a part of the substrate, the liquid held between the member and the part of the substrate; and 
 projecting a patterned radiation beam, using the projection system, through the liquid onto a target portion of the substrate, wherein 
 the liquid held between the member and the part of the substrate moves, as a whole, on the substrate by movement of the substrate. 
 
     
     
       25. Method according to  claim 24 , further comprising:
 determining a distance between a surface of the substrate and the member; and 
 maintaining a desired distance between the surface of the substrate and the member based on the determined distance. 
 
     
     
       26. Method according to  claim 24 , wherein the inlet is part of a liquid bearing. 
     
     
       27. Method according to  claim 24 , wherein the inlet is part of a hydrostatic bearing. 
     
     
       28. Method according to  claim 24 , wherein the inlet is part of a liquid bearing that at least partially supports the member above a surface of the substrate. 
     
     
       29. Method according to  claim 24 , further comprising preventing leakage of liquid in an outward radial direction relative to an axis of the projection system by using an outlet located on a surface of the member which faces an upper surface of the substrate. 
     
     
       30. A device manufacturing method comprising:
 providing a liquid to a space between a projection system of a lithographic apparatus and a surface of a substrate, the liquid being provided via a liquid inlet provided on a surface of a member that extends parallel to and faces the surface of the substrate, and the liquid inlet facing the surface of the substrate; 
 projecting a patterned radiation beam, using the projection system, through the liquid onto a target portion of the substrate; and 
 determining a distance between the surface of the substrate and the member using a sensor. 
 
     
     
       31. Method according to  claim 30 , further comprising:
 maintaining a desired distance between the surface of the substrate and the member based on the determined distance. 
 
     
     
       32. Method according to  claim 30 , further comprising preventing leakage of liquid in an outward radial direction relative to an axis of the projection system using an outlet located on the surface of the member which faces the substrate.