P
US9312231B2ActiveUtilityPatentIndex 84

Method and apparatus for high temperature semiconductor device packages and structures using a low temperature process

Assignee: VISWANATHAN LAKSHMINARAYANPriority: Oct 31, 2013Filed: Oct 31, 2013Granted: Apr 12, 2016
Est. expiryOct 31, 2033(~7.3 yrs left)· nominal 20-yr term from priority
Inventors:VISWANATHAN LAKSHMINARAYAN
H10P 14/46H10W 90/756H10W 90/754H10W 90/753H10W 90/736H10W 76/67H10W 76/10H10W 74/00H10W 72/07331H10W 72/5445H10W 72/01323H10W 72/952H10W 72/884H10W 72/352H10W 72/325H10W 99/00H10W 95/00H10W 90/00H10W 76/157H10W 74/114H10W 72/50H10W 72/20H10W 70/6875H10W 70/479H10W 70/098H10W 70/095H10W 70/66H10W 70/24H10W 40/228H10W 40/22H10W 76/134H10W 72/30H01L 2224/05599H01L 23/142H01L 2924/16598H01L 2924/171H01L 24/48H01L 2924/181H01L 23/057H01L 24/32H01L 2224/45099H01L 24/13H01L 2924/00014H01L 24/80H01L 2224/48137H01L 2224/48247H01L 2224/29339H01L 2224/8384H01L 23/3121H01L 21/50H01L 2924/16152H01L 2224/83447H01L 2224/48091H01L 2924/00H01L 23/3677
84
PatentIndex Score
10
Cited by
10
References
5
Claims

Abstract

A semiconductor device package that incorporates a combination of ceramic, organic, and metallic materials that are coupled using silver is provided. The silver is applied in the form of fine particles under pressure and a low temperature. After application, the silver forms a solid that has a typical melting point of silver, and therefore the finished package can withstand temperatures significantly higher than the manufacturing temperature. Further, since the silver is an interfacial material between the various combined materials, the effect of differing material properties between ceramic, organic, and metallic components, such as coefficient of thermal expansion, is reduced due to low temperature of bonding and the ductility of the silver.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
       1. A semiconductor device package comprising:
 a first material portion of the semiconductor device package, wherein the first material comprises one of a ceramic or an organic material, wherein the first material portion comprises a printed circuit board; 
 a second material portion of the semiconductor device package, wherein the second material comprises a metallic slug; and 
 a sintered silver region disposed to couple the first and second material portions of the semiconductor device package, wherein
 the sintered silver region is disposed within a hole formed in the printed circuit board, and 
 the second material portion is disposed within the sintered silver region. 
 
 
     
     
       2. The semiconductor device package of  claim 1  further comprising:
 a semiconductor device die thermally coupled to the metallic slug, wherein the metallic slug comprises copper. 
 
     
     
       3. The semiconductor device package of  claim 1  further comprising:
 a second metallic slug disposed within the sintered silver, wherein the sintered silver thermally and electrically couples the metallic slug and the second metallic slug. 
 
     
     
       4. A semiconductor device package comprising:
 a first material portion of the semiconductor device package, wherein the first material comprises one of a ceramic or an organic material, wherein the first material portion comprises a printed circuit board; 
 a second material portion of the semiconductor device package, wherein the second material portion comprises a passive electronic device disposed within the sintered silver region, wherein the sintered silver electrically couples the passive electronic device to an interconnect formed on the printed circuit board; 
 a sintered silver region disposed to couple the first and second material portions of the semiconductor device package, wherein
 the sintered silver region is disposed within a hole formed in the printed circuit board, and 
 the second material portion is disposed within the sintered silver region. 
 
 
     
     
       5. The semiconductor device package of  claim 4 , wherein the passive semiconductor device comprises a high capacitance material.

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References (0)

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